Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

Ryan Del Re; James Passarelli; Miriam Sortland; Brian Cardineau; Yasin Ekinci; Elizabeth Buitrago; Mark Neisser; Daniel A. Freedman; Robert L. Brainard

doi:10.1117/1.JMM.14.4.043506

9 November 2015 Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

Ryan Del Re, James Passarelli, Miriam Sortland, Brian Cardineau, Yasin Ekinci, Elizabeth Buitrago, Mark Neisser, Daniel A. Freedman, Robert L. Brainard

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 14, Issue 4, 043506 (November 2015). https://doi.org/10.1117/1.JMM.14.4.043506

Abstract

Pure thin films of organotin compounds have been lithographically evaluated using extreme ultraviolet lithography (EUVL, 13.5 nm). Twenty compounds of the type R₂Sn(O₂CR′)₂ were spin-coated from solutions in toluene, exposed to EUV light, and developed in organic solvents. Exposures produced negative-tone contrast curves and dense-line patterns using interference lithography. Contrast-curve studies indicated that the photosensitivity is linearly related to the molecular weight of the carboxylate group bound to tin. Additionally, photosensitivity was found to be linearly related to free radical stability of the hydrocarbon group bound directly to tin (R=phenyl, butyl, and benzyl). Dense-line patterning capabilities varied, but two resists in particular show exceptionally good line edge roughness (LER). A resist composed of an amorphous film of (C₆H₅CH₂)₂Sn(O₂CC(CH₃)₃)₂ (1) achieved 1.4 nm LER at 22-nm half-pitch patterning and a resist composed of (C₆H₅CH₂)₂Sn(O₂CC₆H₅)₂ (2) achieved 1.1 nm LER at 35-nm half-pitch at high exposure doses (600 mJ/cm²). Two photoresists that use olefin-based carboxylates, (C₆H₅CH₂)₂Sn(O₂CCH⏧CH₂)₂ (3) and (C₆H₅CH₂)₂Sn(O₂CC(CH₃)⏧CH₂)₂ (4), demonstrated better photospeeds (5 mJ/cm² and 27 mJ/cm²) but worse LER.

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Ryan Del Re, James Passarelli, Miriam Sortland, Brian Cardineau, Yasin Ekinci, Elizabeth Buitrago, Mark Neisser, Daniel A. Freedman, and Robert L. Brainard "Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(4), 043506 (9 November 2015). https://doi.org/10.1117/1.JMM.14.4.043506

Published: 9 November 2015

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