High-frame-rate deep-ultraviolet-optimized charge-coupled device for simultaneous measurements of illumination intensity, polarization amplitude, and polarization direction for very high numerical aperture imaging systems

Roderick R. Kunz; Dennis D. Rathman; Steven J. Spector; Michael Rose; Michael S. Yeung

doi:10.1117/1.2032888

1 July 2005 High-frame-rate deep-ultraviolet-optimized charge-coupled device for simultaneous measurements of illumination intensity, polarization amplitude, and polarization direction for very high numerical aperture imaging systems

Roderick R. Kunz, Dennis D. Rathman, Steven J. Spector, Michael Rose, Michael S. Yeung

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 4, Issue 3, 031105 (July 2005). https://doi.org/10.1117/1.2032888

Abstract

Lincoln Laboratory has designed and fabricated a charge-coupled device (CCD) array capable of imaging both polarization and illumination uniformity. The device consists of an 1107-element linear array of UV-optimized silicon photodiodes readout by a three-stage CCD through a single ~1-MHz output amplifier. This yields an effective clock rate for the whole array of ~1 kHz. Each of the active diode surfaces within the 1107-element array is covered by a UV-opaque layer of polysilicon into which are patterned 140-nm, transmissive sampling slits. The orientation and location of the slits enables simultaneous determination of illumination uniformity, degree and direction of polarization, and polarization uniformity. The device is tested with a 193-nm excimer laser equipped with variably polarized illumination and the theoretical performance of the device was supported by finite-difference time domain optical simulations.

©(2005) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Roderick R. Kunz, Dennis D. Rathman, Steven J. Spector, Michael Rose, and Michael S. Yeung "High-frame-rate deep-ultraviolet-optimized charge-coupled device for simultaneous measurements of illumination intensity, polarization amplitude, and polarization direction for very high numerical aperture imaging systems," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(3), 031105 (1 July 2005). https://doi.org/10.1117/1.2032888

Published: 1 July 2005

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE