New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers

Przemyslaw W. Wachulak; Lukasz Urbanski; Maria G. Capeluto; D. Hill; Willie S. Rockward; Claudio C. Iemmi; Erik H. Anderson; Carmen S. Menoni; Jorge J. Rocca; Mario C. Marconi

doi:10.1117/1.3129837

1 April 2009 New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers

Przemyslaw W. Wachulak, Lukasz Urbanski, Maria G. Capeluto, D. Hill, Willie S. Rockward, Claudio C. Iemmi, Erik H. Anderson, Carmen S. Menoni, Jorge J. Rocca, Mario C. Marconi

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 8, Issue 2, 021206 (April 2009). https://doi.org/10.1117/1.3129837

Abstract

The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sources make them a good option for interferometric applications. The combination of these novel sources with interferometric lithography setups brings to the laboratory environment capabilities that so far had been restricted exclusively to large synchrotron facilities.

©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Przemyslaw W. Wachulak, Lukasz Urbanski, Maria G. Capeluto, D. Hill, Willie S. Rockward, Claudio C. Iemmi, Erik H. Anderson, Carmen S. Menoni, Jorge J. Rocca, and Mario C. Marconi "New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(2), 021206 (1 April 2009). https://doi.org/10.1117/1.3129837

Published: 1 April 2009

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