Journal of Micro/Nanopatterning, Materials, and Metrology

Editor-in-Chief: Harry Levinson, HJL Lithography, USA

The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Formerly the Journal of Micro/Nanolithography, MEMS, and MOEMS, the journal’s key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.

Featured Content

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Andreas Erdmann et al.

Clarifications on the .5 λ/NA resolution limit

Anthony Yen

Particle and pattern discriminant freeze-cleaning method

Kei Hattori et al.

Most Viewed

from the Journal of Micro/Nanopatterning, Materials, and Metrology


Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Andreas Erdmann, Hazem S. Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank J. Timmermans, Markus Bauer (2020) Open Access


Direct comparison of line edge roughness measurements by SEM and a metrological tilting-atomic force microscopy for reference metrology

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda (2020) Open Access


Particle and pattern discriminant freeze-cleaning method

Kei Hattori, Daisuke Matsushima, Kensuke Demura, Masaya Kamiya (2020) Open Access


Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography

Anthony Yen (2020)


Three-state lithography model: an enhanced mathematical approach to predict resist characteristics in grayscale lithography processes

Bassem Badawi, Olfa Sayadi, Ignaz Eisele, Christoph Kutter (2021) Open Access


Review of scanning electron microscope-based overlay measurement beyond 3-nm node device

Osamu Inoue, Kazuhisa Hasumi (2019) Open Access


Retrospective on VLSI value scaling and lithography

Michael L. Rieger (2019) Open Access


Design, simulation, and fabrication of three-dimensional microsystem components using grayscale photolithography

Melissa A. Smith, et al. (2019) Open Access


Resolution enhancement with source-wavelength optimization according to illumination angle in optical lithography

Manabu Hakko, Kanji Suzuki (2020)


Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

Andreas Erdmann, Peter Evanschitzky, Hazem Mesilhy, Vicky Philipsen, Eric Hendrickx, Markus Bauer (2018) Open Access


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