Fabrication process for multilayer x-ray phase gratings

Toby Sean Ross; Raymond T. Perkins; Larry V. Knight

doi:10.1117/12.55658

1 July 1990 Fabrication process for multilayer x-ray phase gratings

Toby Sean Ross, Raymond T. Perkins, Larry V. Knight

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Optical Engineering, Vol. 29, Issue 7, (July 1990). https://doi.org/10.1117/12.55658

This paper describes a fabrication method for making multilayer coated phase reflection gratings and arbitrary phase patterned reflection optics suitable for soft x-ray imaging. This represents an improvement over previous fabrication methods using anisotropic or ion-beam etching, which were limited to amplitude structures by the induced roughness on the etched portions of the substrate. Included also is a scalar model for multilayer phase grating reflectivity.

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Toby Sean Ross, Raymond T. Perkins, and Larry V. Knight "Fabrication process for multilayer x-ray phase gratings," Optical Engineering 29(7), (1 July 1990). https://doi.org/10.1117/12.55658

Published: 1 July 1990

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