Tunable surface plasmons interference patterns with the same mask in nanolithography

Xia Wan; Qingkang Wang; Haihua Tao

doi:10.1117/1.OE.51.2.028001

29 February 2012 Tunable surface plasmons interference patterns with the same mask in nanolithography

Xia Wan, Qingkang Wang, Haihua Tao

Author Affiliations +

Funded by: National 863 Project of China, Shanghai Committee of Science and Technology of China, State Key Development Program for Basic Research of China

Optical Engineering, Vol. 51, Issue 2, 028001 (February 2012). https://doi.org/10.1117/1.OE.51.2.028001

Abstract

When a transverse magnetic-polarized beam illuminates normally on an Ag grating mask with sub-wavelength slits, the surface plasmon (SP) interference patterns are formed on the Ag surface. According to the dispersion relationship of SPs, the wavelength of SPs (λsp) is tunable by altering the refractive index of the photoresist or the illumination wavelength. Various λsp form interference patterns with different size. The interference patterns are tunable using the same mask with period microns in size, which can save the cost of fabricating a different mask. This method will have potential applications to nanolithography.

Citation Download Citation

Xia Wan, Qingkang Wang, and Haihua Tao "Tunable surface plasmons interference patterns with the same mask in nanolithography," Optical Engineering 51(2), 028001 (29 February 2012). https://doi.org/10.1117/1.OE.51.2.028001

Published: 29 February 2012

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