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23 October 2013 Versatile bilayer resist for laser lithography at 405 nm on glass substrates
Quandou Wang, Ulf Griesmann
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Optical Engineering, Vol. 52, Issue 10, 105104 (October 2013). https://doi.org/10.1117/1.OE.52.10.105104
Abstract
We describe a simple bilayer photoresist that is particularly well suited for laser lithography at an exposure wavelength of 405 nm on glass substrates, which are often used for the fabrication of binary diffractive optics and computer-generated holograms. The resist consists of a poly-dimethyl glutarimide (PMGI) bottom layer that is used as an antireflection coating between a glass substrate and a positive or negative photoresist. The optical properties of the PMGI layer at 405 nm result in excellent suppression of reflections into the photoresist and good process latitude.
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
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Quandou Wang and Ulf Griesmann "Versatile bilayer resist for laser lithography at 405 nm on glass substrates," Optical Engineering 52(10), 105104 (23 October 2013). https://doi.org/10.1117/1.OE.52.10.105104
Published: 23 October 2013
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Cited by 4 scholarly publications.
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KEYWORDS
Glasses
Lithography
Photoresist materials
Chromium
Reflectivity
Antireflective coatings
Computer generated holography
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