Meta-optic commercialization and manufacturing readiness is an important topic as optics designers begin evaluating meta-surfaces into optics modules. Moxtek has established a volume production line for visible and NIR wavelength meta-optics with a manufacturing readiness level 8. This provides a unique environment to evaluate the uniformity and capabilities of meta-optic manufacturing techniques. With a statistically significant dataset, mild variations in design concept and lens characteristics can be easily highlighted. We will present baseline MTF and efficiency data related to a variety of metalens characteristics. The goal is to highlight unique meta-optic characteristics that impact performance in volume production. Moxtek has manufactured and characterized metalenses in a wide range of wavelengths, lens diameter, and focal lengths.
Meta-optics have been gaining momentum in the last few years. The meta-atoms for IR range applications are large enough and can be patterned by traditional semiconductor lithography. Making meta-optics in the visible range of 400 to 600nm, the meta-atom structures become too small and the optical lithography falls short. Moxtek has established a manufacturing line enabled by nanoimprint lithography (NIL) that can pattern and build visible range meta-optics. This process has shown proven total efficiency greater than 90% at 532nm wavelength on a baseline over multiple lots. This data set for visible meta-optics, confirms that volume manufacturing of visible wavelength metalens is possible and the patterning barrier has been removed.
Meta-optics have been built in lab settings for years but not on a commercially viable scale. Using electron beam lithography works well in the lab, but this is not an option for volume manufacturing. Patterning subwavelength meta-atom for visible has been just beyond the capabilities of the high-volume deep UV lithography. Due to this patterning barrier, entry into visible meta-optic volume manufacturing has not yet been possible. Moxtek has overcome this barrier and established a volume process line for visible meta-optics utilizing nanoimprint lithography (NIL). Process stability data to qualify the process line for visible meta-optics, confirms that volume manufacturing of metalenses is possible and the patterning barrier has been removed.
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