Dr. Akinori Saeki Profile

Dr. Akinori Saeki

Assistant Professor at Osaka Univ

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Author

Publications (4)

Proceedings Article | 30 March 2010 Paper

Dynamics of radical cation of poly(4-hydroxystyrene) generated in thin film upon exposure to electron beam

Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, Akinori Saeki, Seiichi Tagawa

Proceedings Volume 7639, 76391K (2010) https://doi.org/10.1117/12.846699

KEYWORDS: Absorption, Solids, Electron beams, Polymers, Extreme ultraviolet lithography, FT-IR spectroscopy, Absorbance, Chromium, Chemically amplified resists, Extreme ultraviolet

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Proceedings Article | 26 March 2008 Paper

Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithography

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Heidi Cao, Hai Deng, Michael Leeson

Proceedings Volume 6923, 69230S (2008) https://doi.org/10.1117/12.772174

KEYWORDS: Line edge roughness, Monte Carlo methods, Diffusion, Lithography, Chemically amplified resists, Image processing, Electron beams, Extreme ultraviolet, Electron beam lithography, Extreme ultraviolet lithography

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SPIE Journal Paper | 1 October 2007

Exposure dose dependence on line edge roughness of a latent image in electron beam/extreme ultraviolet lithographies studied by Monte Carlo technique

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Heidi Cao, Hai Deng, Michael Leeson

JM3, Vol. 6, Issue 04, 043004, (October 2007) https://doi.org/10.1117/12.10.1117/1.2792178

KEYWORDS: Line edge roughness, Monte Carlo methods, Lithography, Molecules, Diffusion, Image enhancement, Electron beam lithography, Ionization, Electron beams, Polymers

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Proceedings Article | 29 March 2006 Paper

Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist

Takahiro Kozawa, Hiroki Yamamoto, Akinori Saeki, Seiichi Tagawa

Proceedings Volume 6153, 615314 (2006) https://doi.org/10.1117/12.656869

KEYWORDS: Line edge roughness, Diffusion, Polymers, Ionization, Chemically amplified resists, Line width roughness, Electron beams, Lithography, Optical lithography, Monte Carlo methods

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