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Dr. Alan J. Leslie
Director, Technology Enablement at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 24 March 2017 Presentation + Paper
Using heuristic optimization to set SRAF rules
ChangAn Wang, Norman Chen, Chidam Kallingal, William Wilkinson, Jian Liu, Alan Leslie
Proceedings Volume 10147, 1014706 (2017) https://doi.org/10.1117/12.2258233
KEYWORDS: SRAF, Printing, Semiconducting wafers, Matrices, Silicon, Lithography, Manufacturing, Image processing, Optical proximity correction, Genetic algorithms, Optimization (mathematics), Logic, Algorithm development, Photomasks
Proceedings Article | 9 September 2013 Paper
Under-layer effects for block levels: are they under control?
Dongbing Shao, Bidan Zhang, Shayak Banerjee, Hong Kry, Anuja De Silva, Ranee Kwong, Kisup Chung, Yea-Sen Lin, Alan Leslie
Proceedings Volume 8880, 88802L (2013) https://doi.org/10.1117/12.2029356
KEYWORDS: Critical dimension metrology, Silicon, Etching, Semiconducting wafers, Optical proximity correction, Reflectivity, Near field optics, Computational lithography, Optical lithography, Data modeling
Proceedings Article | 1 November 2007 Paper
The effect of the OPC parameters on the performance of the OPC model
Proceedings Volume 6730, 673055 (2007) https://doi.org/10.1117/12.746696
KEYWORDS: Optical proximity correction, Performance modeling, Optimization (mathematics), Critical dimension metrology, Resolution enhancement technologies, Photomasks, Integrated circuits, Lithography, Systems modeling, Optics manufacturing
Conference Committee Involvement (1)
Photomask Technology
18 September 2007 | Monterey, California, United States
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