Dr. Alberto Roncaglia Profile

Dr. Alberto Roncaglia

at Istituto per la Microelettronica e Microsistemi

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Author

Publications (4)

Proceedings Article | 12 March 2024 Presentation + Paper

Characterization of new silicon-based micro-electro-mechanical systems for photoacoustic trace-gas detection

Jacopo Pelini, Stefano Dello Russo, Arianna Elefante, Maria Concetta Canino, Alberto Roncaglia, Inaki Lopez Garcia, Pablo Cancio Pastor, Paolo De Natale, Simone Borri, Mario Siciliani de Cumis

Proceedings Volume 12899, 1289905 (2024) https://doi.org/10.1117/12.3002282

KEYWORDS: Photoacoustic spectroscopy, Microelectromechanical systems, Silicon, Quantum cascade lasers, Transducers, Signal to noise ratio, Quantum systems, Quantum detection, Acoustic waves, Quantum sensors

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Proceedings Article | 8 March 2024 Presentation + Paper

High-performance cavity-enhanced photoacoustic trace-gas sensing

Jacopo Pelini, Mario Siciliani de Cumis, Zhen Wang, Stefano Dello Russo, Iacopo Galli, Inaki Lopez Garcia, Maria Concetta Canino, Alberto Roncaglia, Pablo Cancio Pastor, Naota Akikusa, Wei Ren, Paolo De Natale, Simone Borri

Proceedings Volume 12895, 128950A (2024) https://doi.org/10.1117/12.3002523

KEYWORDS: Optical resonators, Photoacoustic spectroscopy, Quantum sensors, Acoustics, Laser resonators, Quantum cascade lasers, Cavity resonators, Transducers, Quantum sensing, Quantum reading

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Proceedings Article | 31 January 2020 Paper

A compact cantilever-based photoacoustic sensor for trace-gas detection

Mario Siciliani de Cumis, Inaki Lopez Garcia, Mariaconcetta Canino, Pablo Cancio Pastor, Filippo Bonafè, Alberto Roncaglia, Simone Borri, Paolo De Natale

Proceedings Volume 11288, 112882E (2020) https://doi.org/10.1117/12.2545824

KEYWORDS: Sensors, Photoacoustic spectroscopy, Molecules, NOx, Absorption, Molecular lasers, Spectroscopy, Signal to noise ratio, Signal detection

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SPIE Journal Paper | 12 February 2018

Design, modeling, and fabrication of crab-shape capacitive microphone using silicon-on-isolator wafer

Bahram Azizollah Ganji, Sedighe Babaei Sedaghat, Alberto Roncaglia, Luca Belsito, Reza Ansari

JM3, Vol. 17, Issue 01, 015002, (February 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.1.015002

KEYWORDS: Semiconducting wafers, Silicon, Microelectromechanical systems, Etching, Photomasks, Acoustics, Photoresist materials, Oxides, Dry etching, Wet etching

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