Mr. Alex R. Hubbard Profile

Alex R. Hubbard

at IBM Thomas J Watson Research Ctr

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Author

Publications (8)

Proceedings Article | 16 April 2024 Presentation + Paper

Large feature wafer level in-line optical metrology techniques for advanced packaging schemes

Katherine Sieg, Christopher Bottoms, Christopher Waskiewicz, Alejandro Matos Mejia, Junwon Han, Shahid Butt, Daniel Schmidt, Stefan Schoeche, Alexander Hamer, Alex Hubbard

Proceedings Volume 12955, 129551P (2024) https://doi.org/10.1117/12.3012149

KEYWORDS: Semiconducting wafers, Interferometry, Wafer bonding, Metrology

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Proceedings Article | 10 April 2024 Presentation

Controlling patterning uniformity in thick resist lithography

Christopher Bottoms, Alexander Hamer, Alejandro Mejia, Alex Hubbard, Nicholas Latham, Katherine Sieg, Jennifer Fullam, Vinay Pai, Junwon Han, Juan-Manuel Gomez, Christopher Waskiewicz, Shahid Butt

Proceedings Volume PC12956, PC129560E (2024) https://doi.org/10.1117/12.3012541

KEYWORDS: Optical lithography, Lithography, Coating thickness, Semiconducting wafers, Plating, Photoresist processing, Dielectrics, Coating

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Proceedings Article | 13 June 2022 Poster

Coater/developer based techniques to achieve sub-30nm CAR process on EUV stack

Kanzo Kato, Lior Huli, Dave Hetzer, Satoru Shimura, Shinichiro Kawakami, Soichiro Okada, Takahiro Kitano, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Cody Murray, Alex Hubbard

Proceedings Volume PC12055, PC120550L (2022) https://doi.org/10.1117/12.2613805

KEYWORDS: Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Photoresist processing, Optical lithography, Integrated circuits, Etching

Proceedings Article | 28 September 2021 Poster + Presentation

Coater/developer and new underlayer application to sub-30nm process

Kanzo Kato, Naoki Shibata, Lior Huli, Dave Hetzer, Angélique Raley, Christopher Cole, Alexandra Krawicz, Satoru Shimura, Shinichiro Kawakami, Soichiro Okada, Takahiro Kitano, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Cody Murray, Alex Hubbard

Proceedings Volume 11854, 118541D (2021) https://doi.org/10.1117/12.2602829

KEYWORDS: Optical lithography, Extreme ultraviolet, Photoresist processing, Oxides, Metals, Lithography, Integrated circuits, Extreme ultraviolet lithography, Etching

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Proceedings Article | 26 March 2019 Paper

The defect mitigation on EUV stack by track based technology

Naoki Shibata, Lior Huli, Corey Lemley, Yuichiro Miyata, Dave Hetzer, Toshiharu Wada, Akiteru Ko, Shinichiro Kawakami, Akiko Kai, Takahiro Shiozawa, Hidetsugu Yano, Kenichi Ueda, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Nelson Felix, Cody Murray, Alex Hubbard

Proceedings Volume 10957, 109571J (2019) https://doi.org/10.1117/12.2514885

KEYWORDS: Extreme ultraviolet, Optical lithography, Bridges, Extreme ultraviolet lithography, Inspection, Photoresist processing, Coating, Particles, Semiconducting wafers

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Proceedings Article | 19 October 2018 Paper

Track based techniques to improve high-resolution EUV patterning defectivity

Naoki Shibata, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Karen Petrillo, Luciana Meli, Nelson Felix, Cody Murray, Alex Hubbard, Rick Johnson

Proceedings Volume 10809, 1080922 (2018) https://doi.org/10.1117/12.2501668

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Coating, Manufacturing

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Proceedings Article | 16 October 2017 Paper

Coater/developer based techniques to improve high-resolution EUV patterning defectivity

Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Akiteru Ko, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Koichiro Tanaka, Karen Petrillo, Luciana Meli, Anuja De Silva, Yongan Xu, Nelson Felix, Richard Johnson, Cody Murray, Alex Hubbard

Proceedings Volume 10450, 104501U (2017) https://doi.org/10.1117/12.2280506

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Line width roughness, Coating, Manufacturing, Contamination

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Proceedings Article | 28 March 2017 Paper

Driving down defect density in composite EUV patterning film stacks

Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Richard Johnson, Cody Murray, Alex Hubbard, Danielle Durrant, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Shinichiro Kawakami, Koichi Matsunaga

Proceedings Volume 10143, 101430Y (2017) https://doi.org/10.1117/12.2260146

KEYWORDS: Extreme ultraviolet, Optical lithography, Coating, Composites, Manufacturing, Inspection, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet lithography, Defect detection, Laser scattering, Air contamination

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Showing 5 of 8 publications

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