Dr. Alexandre Gatto Profile

Dr. Alexandre Gatto

Global Head of Engineering at Miltenyi Biotec

SPIE Involvement:

Author

Publications (37)

Proceedings Article | 10 October 2019 Paper

Manufacturing method for monolithic freeform Offner-gratings for hyper-spectral imaging

M. Burkhardt, T. Rathje, D. Lehr, L. Erdmann, M. Helgert, P. Triebel, T. Diehl, A. Gatto, N v.d Valk, R. Vink, R. Jansen, J. Day, W. Gielesen

Proceedings Volume 11151, 111510U (2019) https://doi.org/10.1117/12.2532101

KEYWORDS: Manufacturing, Diffraction gratings, Hyperspectral systems, Optics manufacturing, Optical design, Diffraction, Spectroscopy, Polarization, Inspection, Holography

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Proceedings Article | 12 July 2019 Open Access

Tailored dispersive elements for adapted spectrometric sensing

Torsten Diehl, Peter Triebel, Tobias Moeller, Alexandre Gatto, Dennis Lehr, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies, Felix Koch

Proceedings Volume 11180, 111801K (2019) https://doi.org/10.1117/12.2535975

KEYWORDS: Holography, Optical design, Diffraction gratings, Spectrometers, Optics manufacturing, Manufacturing, Wavefronts, Interferometers, Spectroscopy, Photoresist materials

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Proceedings Article | 15 June 2018 Paper

Optical gratings with low wavefront aberrations and low straylight for enhanced spectroscopical applications

Torsten Diehl, Peter Triebel, Tobias Moeller, Alexandre Gatto, Dennis Lehr, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies, Felix Koch

Proceedings Volume 10692, 106920H (2018) https://doi.org/10.1117/12.2313550

KEYWORDS: Holography, Spectrometers, Optical design, Optics manufacturing, Manufacturing, Optical components, Satellites, Diffraction gratings, Wavefront aberrations, Photoresist materials

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The sensing performance of spectroscopic systems can be enhanced by improving their optical core-element: the optical grating. in particular for imaging spectrometers - especially Hyper-Spectral Imagers - beside the polarization sensitivity and efficiency the imaging quality of the diffraction grating is an important parameter. Optical elements within the spectrometer are manufactured while aiming on lowest wave front aberrations. Thus, least imaging aberration quality of the grating is required not to limit the overall imaging quality of the instrument. Different types of spectrometers (Offner, Czerny Turner) lead to different requirements for the grating surface figure. Beside wavefront aberrations the straylight of gratings will impact the optical performance of spectrometers too. Both parameters are crucially influenced by the manufacturing processes. During the manufacturing process of the grating substrate, a sequence of polishing steps can be applied in order to minimize the wavefront aberrations and roughness. Chemical assisted polishing in combination with classical techniques lead to least surface roughness. A good practice for the manufacturing of aspheres and freeform substrates is the generation of an initial figure close to the final shape only by a classical process, followed by a careful applied aspherization. The imaging performance (wavefront and straylight) of the grating is also optimized due to the recording setup of the holography - including all employed optics for the wave forming. Holographically manufactured gratings with adapted wave forming functions are used for transmission or reflection gratings on different types of substrates like prisms, convex and concave spherical and aspherical surface shapes, up to free-form elements. Numerous spectrometer setups (e.g. Offner, Rowland circle, Czerny-Turner system layout) work on the optical design principles of reflection gratings. All those manufactured gratings can be coated with adapted coatings to support their reflection or transmission operation. The present approach can be applied to manufacture high quality reflection gratings for the EUV to the IR. In this paper we report our results on designing and manufacturing high quality gratings based on holographic processes in order to enable diffraction limited complex spectrometric setups over certain wavelength ranges. Most beneficial is an optimization of the grating during spectrometer design phase while regarding the manufacturing as well. However, the initial optical design approach will show that gratings can be tailored to the specific requirements of the spectrometer (in order to enhance the imaging quality). The enhancement of the optical performance may lead to a specific wavefront shape after the grating element. this special capability for aberration reduction can be defined to the grating during the holographic process. In general, holography enables to manufacture gratings with a specific and adapted wavefront error compensation functions. Beside the results of low aberration gratings the results on straylight measurements will be presented. Recent results and optimization will be shown.

Proceedings Article | 17 November 2017 Open Access

Space applications: monolithic diffraction grating elements from EUV to NIR spectral range

Alexandre Gatto, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies, Torsten Diehl, Peter Triebel, Tobias Moeller

Proceedings Volume 10563, 1056315 (2017) https://doi.org/10.1117/12.2304153

KEYWORDS: Diffraction gratings, Manufacturing, Holography, Near infrared, Optics manufacturing, Optical design, Diffraction, Polarization, Extreme ultraviolet, Spectroscopy

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Proceedings Article | 25 September 2017 Open Access

Low aberration monolithic diffraction gratings for high performance optical spectrometers

Peter Triebel, Tobias Moeller, Torsten Diehl, Alexandre Gatto, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies

Proceedings Volume 10562, 1056207 (2017) https://doi.org/10.1117/12.2296116

KEYWORDS: Diffraction gratings, Manufacturing, Polarization, Holography, Spectrometers, Wavefront aberrations, Wavefronts, Reflection, Prisms, Optical design

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Gratings are the core element of the spectrometer. For imaging spectrometers beside the polarization sensitivity and efficiency the imaging quality of the diffraction grating is essential. Lenses and mirrors can be produced with lowest wavefront aberrations. Low aberration imaging quality of the grating is required not to limit the overall imaging quality of the instrument. Different types of spectrometers will lead to different requirements on the wavefront aberrations for their specific diffraction gratings. The wavefront aberration of an optical grating is a combination of the substrate wavefront and the grating wavefront. During the manufacturing process of the grating substrate different processes can be applied in order to minimize the wavefront aberrations. The imaging performance of the grating is also optimized due to the recording setup of the holography.

This technology of holographically manufactured gratings is used for transmission and reflection gratings on different types of substrates like prisms, convex and concave spherical and aspherical surface shapes, free-form elements. All the manufactured gratings are monolithic and can be coated with high reflection and anti-reflection coatings. Prism substrates were used to manufacture monolithic GRISM elements for the UV to IR spectral range preferably working in transmission. Besides of transmission gratings, numerous spectrometer setups (e.g. Offner, Rowland circle, Czerny-Turner system layout) working on the optical design principles of reflection gratings. The present approach can be applied to manufacture high quality reflection gratings for the EUV to the IR.

In this paper we report our latest results on manufacturing lowest wavefront aberration gratings based on holographic processes in order to enable at least diffraction limited complex spectrometric setups over certain wavelength ranges. Beside the results of low aberration gratings the latest achievements on improving efficiency together with less polarization sensitivity of diffractive gratings will be shown for different grating profiles.

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Proceedings Article | 19 September 2017 Presentation

Imaging gratings: Technology and applications for spectrometers (Conference Presentation)

Peter Triebel, Tobias Moeller, Torsten Diehl, Alexandre Gatto, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies

Proceedings Volume 10402, 104020J (2017) https://doi.org/10.1117/12.2275131

KEYWORDS: Diffraction gratings, Manufacturing, Spectrometers, Reflection, Optical design, Wavefront aberrations, Holography, Infrared spectroscopy, Polarization, Wavefronts

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SPIE Journal Paper | 3 February 2016

Broadband and wide-angle hybrid antireflection coatings prepared by combining interference multilayers with subwavelength structures

Stéphane Bruynooghe, Marcel Schulze, Michael Helgert, Michel Challier, Diana Tonova, Michael Sundermann, Thomas Koch, Alexandre Gatto, Ernst-Bernhard Kley

JNP, Vol. 10, Issue 03, 033002, (February 2016) https://doi.org/10.1117/12.10.1117/1.JNP.10.033002

KEYWORDS: Antireflective coatings, Reflectivity, Refractive index, Glasses, Coating, Multilayers, Thin films, Reflection, Nanostructures, Etching

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Proceedings Article | 8 October 2015 Paper

Enhanced monolithic diffraction gratings with high efficiency and reduced polarization sensitivity for remote sensing applications

Peter Triebel, Torsten Diehl, Tobias Moeller, Alexandre Gatto, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies

Proceedings Volume 9641, 96410H (2015) https://doi.org/10.1117/12.2194326

KEYWORDS: Diffraction gratings, Polarization, Manufacturing, Optical design, Binary data, Holography, Remote sensing, Spectroscopy, Prisms, Etching

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Spectral imaging systems lead to enhanced sensing properties when the sensing system provides sufficient spectral resolution to identify materials from its spectral reflectance signature. The performance of diffraction gratings provides an initial way to improve instrumental resolution. Thus, subsequent manufacturing techniques of high quality gratings are essential to significantly improve the spectral performance. The ZEISS unique technology of manufacturing real-blazed profiles and as well as lamellar profiles comprising transparent substrates is well suited for the production of transmission gratings. In order to reduce high order aberrations, aspherical and free-form surfaces can be alternatively processed to allow more degrees of freedom in the optical design of spectroscopic instruments with less optical elements and therefore size and weight advantages. Prism substrates were used to manufacture monolithic GRISM elements for UV to IR spectral range. Many years of expertise in the research and development of optical coatings enable high transmission anti-reflection coatings from the DUV to the NIR. ZEISS has developed specially adapted coating processes (Ion beam sputtering, ion-assisted deposition and so on) for maintaining the micro-structure of blazed gratings in particular. Besides of transmission gratings, numerous spectrometer setups (e.g. Offner, Rowland circle, Czerny-Turner system layout) working on the optical design principles of reflection gratings. This technology steps can be applied to manufacture high quality reflection gratings from the EUV to the IR applications with an outstanding level of low stray light and ghost diffraction order by employing a combination of holography and reactive ion beam etching together with the in-house coating capabilities. We report on results of transmission gratings on plane and curved substrates and GRISM elements with enhanced efficiency of the grating itself combined with low scattered light in the angular distribution. Beside of the results of straylight measurement the actual results on improving efficiency and lowering the polarization sensitivity for transmission gratings will be discussed on theoretical simulations compared to measured data over the entire wavelength range.

Proceedings Article | 14 September 2015 Paper

Optical gratings and grisms: developments on straylight and polarization sensitivity improved microstructures

Torsten Diehl, Peter Triebel, Tobias Moeller, Alexandre Gatto, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies

Proceedings Volume 9611, 96110W (2015) https://doi.org/10.1117/12.2188081

KEYWORDS: Diffraction gratings, Polarization, Manufacturing, Optical design, Holography, Prisms, Etching, Reflection, Ultraviolet radiation, Spectroscopy

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Spectral imaging systems lead to enhanced sensing properties when the sensing system provides sufficient spectral resolution to identify materials from its spectral reflectance signature. The performance of diffraction gratings provides an initial way to improve instrumental resolution. Thus, subsequent manufacturing techniques of high quality gratings are essential to significantly improve the spectral performance. The ZEISS unique technology of manufacturing real-blazed profiles comprising transparent substrates is well suited for the production of transmission gratings. In order to reduce high order aberrations, aspherical and free-form surfaces can be alternatively processed to allow more degrees of freedom in the optical design of spectroscopic instruments with less optical elements and therefore size and weight advantages. Prism substrates were used to manufacture monolithic GRISM elements for UV to IR spectral range. Many years of expertise in the research and development of optical coatings enable high transmission anti-reflection coatings from the DUV to the NIR. ZEISS has developed specially adapted coating processes (Ion beam sputtering, ion-assisted deposition and so on) for maintaining the micro-structure of blazed gratings in particular. Besides of transmission gratings, numerous spectrometer setups (e.g. Offner, Rowland circle, Czerny-Turner system layout) working on the optical design principles of reflection gratings. This technology steps can be applied to manufacture high quality reflection gratings from the EUV to the IR applications with an outstanding level of low stray light and ghost diffraction order by employing a combination of holography and reactive ion beam etching together with the in-house coating capabilities. We report on results of transmission, reflection gratings on plane and curved substrates and GRISM elements with enhanced efficiency of the grating itself combined with low scattered light in the angular distribution. Focusing on the straylight characteristic a measurement of the actual straylight level, preferably with extremely high precision, was performed and will be discussed in this paper. Beside of the results of straylight measurement the actual results on improving efficiency for transmission and reflection gratings will be discussed on theoretical simulations compared to measured data over the entire wavelength range.

Proceedings Article | 20 August 2015 Paper

Wideband antireflection coatings combining interference multilayers and subwavelength structures prepared by reactive ion etching

S. Bruynooghe, M. Helgert, M. Challier, D. Tonova, M. Sundermann, T. Koch, A. Gatto, M. Schulze, E.-B. Kley

Proceedings Volume 9558, 955804 (2015) https://doi.org/10.1117/12.2189810

KEYWORDS: Silica, Coating, Refractive index, Reflection, Antireflective coatings, Reflectivity, Thin films, Nanostructures, Multilayers, Etching

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Proceedings Article | 7 October 2014 Paper

Monolithic diffraction grating elements for remote sensing applications

Alexandre Gatto, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies, Torsten Diehl, Peter Triebel, Tobias Moeller

Proceedings Volume 9241, 92411J (2014) https://doi.org/10.1117/12.2067226

KEYWORDS: Diffraction gratings, Manufacturing, Holography, Polarization, Remote sensing, Diffraction, Ion beams, Optics manufacturing, Spectrometers, Imaging spectroscopy

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Proceedings Article | 23 September 2013 Paper

Fabrication of low straylight holographic gratings for space applications

Reinhard Steiner, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexandre Gatto, Robert Wipf, Torsten Diehl, H. J. P. Vink, B.G. van den Bosch

Proceedings Volume 8870, 88700H (2013) https://doi.org/10.1117/12.2025269

KEYWORDS: Diffraction gratings, Stray light, Holography, Diffraction, Spectrometers, Manufacturing, Optics manufacturing, Polarization, Optical testing, Optical design

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Proceedings Article | 5 March 2013 Paper

Microstructured optics for high-performance optical systems

Alexandre Gatto

Proceedings Volume 8613, 86130U (2013) https://doi.org/10.1117/12.2006894

KEYWORDS: Optical components, Beam shaping, Imaging systems, Etching, Diffraction, Optics manufacturing, Surface roughness, Lithography, Holography, Antireflective coatings

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Proceedings Article | 9 May 2012 Paper

Talbot-carpets of periodic and quasi-periodic close-packed 2D mask structures calculated by a modified chirp-z-algorithm

Jacqueline Maass, Oliver Sandfuchs, Alexandre Gatto, Daniel Thomae, Robert Brunner

Proceedings Volume 8428, 84281L (2012) https://doi.org/10.1117/12.922217

KEYWORDS: Photomasks, Wave propagation, Opacity, Computer simulations, Binary data, Applied sciences, Visible radiation, Diffraction, Numerical simulations, Optical properties

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Proceedings Article | 23 January 2006 Paper

Highly reflective optical coatings for high-power applications of micro scanning mirrors in the UV-VIS-NIR spectral region

Thilo Sandner, Jan Schmidt, Harald Schenk, Hubert Lakner, Minghong Yang, Alexandre Gatto, Norbert Kaiser, Stefan Braun, Thomas Foltyn, Andreas Leson

Proceedings Volume 6114, 61140H (2006) https://doi.org/10.1117/12.644626

KEYWORDS: Aluminum, Reflectivity, Silver, Mirrors, Optical coatings, Micromirrors, Gold, Laser damage threshold, Dielectrics, Microopto electromechanical systems

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Proceedings Article | 20 October 2005 Paper

VUV spectrophotometry for photomasks characterization at 193 nm

Minghong Yang, Jork Leiterer, Alexandre Gatto, Norbert Kaiser, Ingo Höllein, Silvio Teuber, Karsten Bubke

Proceedings Volume 5965, 59651L (2005) https://doi.org/10.1117/12.625144

KEYWORDS: Photomasks, Polarization, Vacuum ultraviolet, Spectrophotometry, Lithography, Light sources, Transmittance, Computing systems, Diffraction, Resolution enhancement technologies

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Proceedings Article | 5 October 2005 Paper

VUV optical coatings for the next-generation micro-mechanical mirrors

Minghong Yang, Alexandre Gatto, Norbert Kaiser, Jan Uwe Schmidt, Thilo Sandner, Jörg Heber, Harald Schenk, Hubert Lakner

Proceedings Volume 5963, 596322 (2005) https://doi.org/10.1117/12.625138

KEYWORDS: Aluminum, Mirrors, Vacuum ultraviolet, Coating, Reflectivity, Micromirrors, Optical coatings, Spatial light modulators, Oxides, Dielectrics

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Proceedings Article | 5 October 2005 Paper

Deposition of robust multilayer mirror coatings for storage ring FEL lasing at 176nm

St. Günster, D. Ristau, M. Trovó, M. Danailov, A. Gatto, N. Kaiser, F. Sarto, A. Piegari

Proceedings Volume 5963, 59632A (2005) https://doi.org/10.1117/12.625384

KEYWORDS: Mirrors, Free electron lasers, Reflectivity, Optical coatings, Oxides, Vacuum ultraviolet, Multilayers, Resistance, Transmittance, Sputter deposition

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Proceedings Article | 5 October 2005 Paper

Highly reflective thin film coatings for high power applications of micro scanning mirrors in the NIR-VIS-UV spectral region

Thilo Sandner, Jan Uwe Schmidt, Harald Schenk, Hubert Lakner, Minghong Yang, Alexandre Gatto, Norbert Kaiser, Stefan Braun, Thomas Foltyn, Andreas Leson

Proceedings Volume 5963, 596314 (2005) https://doi.org/10.1117/12.625246

KEYWORDS: Reflectivity, Aluminum, Mirrors, Silver, Micromirrors, Thin film coatings, Optical coatings, Laser damage threshold, Radium, Dielectrics

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Proceedings Article | 5 October 2005 Paper

Aluminum-enhanced optical coatings for the VUV spectral range

Minghong Yang, Alexandre Gatto, Norbert Kaiser

Proceedings Volume 5963, 59630M (2005) https://doi.org/10.1117/12.625133

KEYWORDS: Reflectivity, Aluminum, Vacuum ultraviolet, Oxides, Mirrors, Multilayers, Optical coatings, Dielectrics, Thin films, Oxidation

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Proceedings Article | 21 February 2005 Paper

New challenges for VUV-XUV radiation resistant coatings

Alexandre Gatto, Joerg Heber, Minghong Yang, Nicolas Benoit, Sergiy Yulin, Torsten Feigl, Norbert Kaiser

Proceedings Volume 5647, (2005) https://doi.org/10.1117/12.583583

KEYWORDS: Vacuum ultraviolet, Optical coatings, Mirrors, Micromirrors, Ultraviolet radiation, Reflectivity, Thin film coatings, Thin films, Aluminum, Optical components

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Proceedings Article | 22 January 2005 Paper

Highly reflective coatings for micromechanical mirror arrays operating in the DUV and VUV spectral range

Thilo Sandner, Jan Schmidt, Harald Schenk, Hubert Lakner, Alexandre Gatto, Minghong Yang, Norbert Kaiser, Stefan Braun, Thomas Foltyn, Andreas Leson

Proceedings Volume 5721, (2005) https://doi.org/10.1117/12.590522

KEYWORDS: Mirrors, Aluminum, Micromirrors, Deep ultraviolet, Reflectivity, Coating, Spatial light modulators, Vacuum ultraviolet, Multilayers, Silicon

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Proceedings Article | 22 January 2005 Paper

Micromechanical scanning mirrors with highly reflective NIR coatings for high-power applications

Thilo Sandner, Jan Schmidt, Harald Schenk, Hubert Lakner, Stefan Braun, Thomas Foltyn, Andreas Leson, Alexandre Gatto, Minghong Yang, Norbert Kaiser

Proceedings Volume 5721, (2005) https://doi.org/10.1117/12.590448

KEYWORDS: Reflectivity, Aluminum, Near infrared, Mirrors, Optical coatings, Silver, Absorption, Dielectrics, Multilayers, Microopto electromechanical systems

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Proceedings Article | 21 July 2004 Paper

Improved mechanical properties of metallic micro-structures

Juergen Schreiber, Stefan Braun, Alexandre Gatto, Harald Schenk

Proceedings Volume 5392, (2004) https://doi.org/10.1117/12.541312

KEYWORDS: Aluminum, Micromirrors, Mirrors, X-rays, Atomic force microscopy, Coating, Silicon, Stress analysis, Reliability, Surface roughness

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Proceedings Article | 10 June 2004 Paper

Surface investigation of VUV-optical components after exposure to high-energy synchrotron radiation

Stefan Guenster, Holger Blaschke, Kai Starke, Detlev Ristau, Miltcho Danailov, B. Diviacco, Alexandre Gatto, Norbert Kaiser, Francesca Sarto, Enrico Massetti

Proceedings Volume 5273, (2004) https://doi.org/10.1117/12.525490

KEYWORDS: Transmittance, Vacuum ultraviolet, Oxides, Synchrotron radiation, Optical coatings, Aluminum, Lanthanum, Resistance, Visible radiation, Microscopy

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Proceedings Article | 25 February 2004 Paper

Radiation resistance of single- and multilayer coatings against synchrotron radiation

Stefan Guenster, Holger Blaschke, Detlev Ristau, Miltcho Danailov, Mauro Trovo, Alexandre Gatto, Norbert Kaiser, Francesca Sarto, Daniel Flori, F. Menchini

Proceedings Volume 5250, (2004) https://doi.org/10.1117/12.514801

KEYWORDS: Optical coatings, Vacuum ultraviolet, Transmittance, Multilayers, Oxides, Mirrors, Reflectivity, Free electron lasers, Absorption, Synchrotron radiation

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Proceedings Article | 30 May 2003 Paper

Spectrophotometry in the vacuum UV

Joerg Heber, Alexandre Gatto, Norbert Kaiser

Proceedings Volume 4932, (2003) https://doi.org/10.1117/12.472400

KEYWORDS: Spectrophotometry, Vacuum ultraviolet, Reflectivity, Ultraviolet radiation, Transmittance, Reflection, Signal detection, Phase modulation, Polarization, Optical coatings

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Proceedings Article | 30 May 2003 Paper

Radiation resistance of optical materials against synchrotron radiation

Stefan Guenster, Holger Blaschke, Detlev Ristau, Alexandre Gatto, Joerg Heber, Norbert Kaiser, B. Diviacco, Marino Marsi, Mauro Trovo, Francesca Sarto, Salvatore Scaglione, Enrico Masetti

Proceedings Volume 4932, (2003) https://doi.org/10.1117/12.473160

KEYWORDS: Vacuum ultraviolet, Synchrotron radiation, Surface finishing, Free electron lasers, Synchrotrons, Resistance, Transmittance, Polishing, Hard x-rays, Reflectivity

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Proceedings Article | 30 May 2003 Paper

Synchrotron-radiation-induced damages in optical materials

Alexandre Gatto, Norbert Kaiser, Stefan Guenster, Detlev Ristau, Francesca Sarto, Mauro Trovo, M. Danailov

Proceedings Volume 4932, (2003) https://doi.org/10.1117/12.472487

KEYWORDS: Synchrotron radiation, Free electron lasers, Carbon, Contamination, Mirrors, Electrons, Oxides, Absorption, Synchrotrons, Color centers

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Proceedings Article | 12 April 2001 Paper

Correlation between absorption and scattering imaging in optical materials (Abstract Only)

Mireille Commandre, Alexandre Gatto, Annelise During, Caroline Fossati

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425022

KEYWORDS: Scattering, Absorption, Light scattering, Raman scattering, Scatter measurement, Optical imaging, Spatial resolution, Refractive index, Particles, Thin films

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Proceedings Article | 12 April 2001 Paper

Achromatic damage investigations on mirrors for UV-free electron lasers

Alexandre Gatto, Norbert Kaiser, Roland Thielsch, David Garzella, M. Hirsch, Daniele Nutarelli, G. de Ninno, Eric Renault, Marie-Emmanuelle Couprie, Philippe Torchio, Marco Alvisi, Gerard Albrand, Claude Amra, Marino Marsi, Mauro Trovo, R. Walker, M. Grewe, Jean Roger, Albert Boccara

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425044

KEYWORDS: Mirrors, Free electron lasers, Reflectivity, Electrons, Synchrotron radiation, Crystals, Optical resonators, Atomic force microscopy, Ultraviolet radiation, Optical coatings

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Proceedings Article | 2 November 2000 Paper

Multiscale mapping technique for the simultaneous estimation of absorption and partial scattering of optical coatings

Alexandre Gatto, Mireille Commandre

Proceedings Volume 4099, (2000) https://doi.org/10.1117/12.405808

KEYWORDS: Absorption, Scattering, Spatial resolution, Laser scattering, Associative arrays, Light scattering, Laser beam diagnostics, Optical coatings, Thin films, Silica

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Proceedings Article | 25 October 2000 Paper

Toward resistant UV mirrors at 200 nm for free electron lasers: manufacture, characterizations, and degradation tests

Alexandre Gatto, Roland Thielsch, Norbert Kaiser, M. Hirsch, David Garzella, Daniele Nutarelli, G. de Ninno, Eric Renault, Marie-Emmanuelle Couprie, Philippe Torchio, Marco Alvisi, Gerard Albrand, Claude Amra, Marino Marsi, Mauro Trovo, R. Walker, M. Grewe, Stephanie Robert, Jean Roger, Albert Boccara

Proceedings Volume 4102, (2000) https://doi.org/10.1117/12.405293

KEYWORDS: Mirrors, Free electron lasers, Ultraviolet radiation, Reflectivity, Synchrotron radiation, Coating, Absorption, Ions, Manufacturing, Photons

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Proceedings Article | 25 October 2000 Paper

Comparative study of the UV-optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition, and plasma-ion-assisted deposition

Roland Thielsch, Alexandre Gatto, Joerg Heber, Sven Martin, Norbert Kaiser

Proceedings Volume 4102, (2000) https://doi.org/10.1117/12.405294

KEYWORDS: Ions, Refractive index, Optical coatings, Oxygen, Absorption, Ultraviolet radiation, Thin films, Plasma, Water, Thin film coatings

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Proceedings Article | 7 September 1999 Paper

Statistical distribution of optical losses in bare substrates and thin films through increasing spatial windows

Alexandre Gatto, Mireille Commandre, Pierre Roche

Proceedings Volume 3738, (1999) https://doi.org/10.1117/12.360081

KEYWORDS: Absorption, Spatial resolution, Scattering, Laser scattering, Laser beam diagnostics, Associative arrays, Light scattering, Thin films, Silica, Ion implantation

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Proceedings Article | 7 September 1999 Paper

Stress in dielectric thin films: evolution with annealing and ion implantation

Christine Mahodaux, Herve Rigneault, Laurent Gallais, Alexandre Gatto, Paul Moretti

Proceedings Volume 3738, (1999) https://doi.org/10.1117/12.360075

KEYWORDS: Annealing, Absorption, Thin films, Ions, Temperature metrology, Ion implantation, Refractive index, Sputter deposition, Optical properties, Plating

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Proceedings Article | 26 May 1998 Paper

Optical fiber transmission of a high-average-power excimer laser

A. Gouillon, Alexandre Gatto, Philippe Delaporte, Bernard Fontaine, Marc Sentis, Olivier Uteza

Proceedings Volume 3404, (1998) https://doi.org/10.1117/12.308632

KEYWORDS: Color centers, Optical fibers, Luminescence, Excimer lasers, Absorption, Fiber lasers, Pulsed laser operation, Silica, Ultraviolet radiation, Oxygen

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