Alok Vaid
Dep. Director Process Engineering at GLOBALFOUNDRIES Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (51)

SPIE Journal Paper | 14 August 2018
Dhairya Dixit, Nick Keller, Yevgeny Lifshitz, Taher Kagalwala, Alexander Elia, Vinit Todi, Jody Fronheiser, Alok Vaid
JM3, Vol. 17, Issue 03, 034001, (August 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.3.034001
KEYWORDS: Semiconducting wafers, Data modeling, Metrology, Reactive ion etching, Diffractive optical elements, Optics manufacturing, Optical lithography, Scatterometry, Overlay metrology, Transmission electron microscopy

Proceedings Article | 22 March 2018 Presentation + Paper
Proceedings Volume 10585, 105850I (2018) https://doi.org/10.1117/12.2296679
KEYWORDS: Metrology, Critical dimension metrology, Scanning electron microscopy, 3D metrology, Silicon, X-rays, Overlay metrology, Fin field effect transistors, Process control, Image resolution

Proceedings Article | 21 March 2018 Presentation + Paper
Fang Fang, Alok Vaid, Alina Vinslava, Richard Casselberry, Shailendra Mishra, Dhairya Dixit, Padraig Timoney, Dinh Chu, Candice Porter, Da Song, Zhou Ren
Proceedings Volume 10585, 105851Q (2018) https://doi.org/10.1117/12.2297213
KEYWORDS: Semiconducting wafers, Temperature metrology, Yield improvement, Etching, Plasma, Metrology, Modulation, Sensors, Signal processing, Silicon

Proceedings Article | 13 March 2018 Presentation + Paper
V. Ukraintsev, W. Banke, G. Zagorodnev, C. Archie, N. Rana, V. Pavlovsky, V. Smirnov, I. Briginas, A. Katnani, A. Vaid
Proceedings Volume 10585, 105850W (2018) https://doi.org/10.1117/12.2297065
KEYWORDS: Scanning electron microscopy, Metrology, Data modeling, Optical proximity correction, Critical dimension metrology, Photoresist materials, Scanners, Process modeling, 3D modeling, Optical lithography

Proceedings Article | 28 March 2017 Presentation + Paper
Dhairya Dixit, Nick Keller, Taher Kagalwala, Fiona Recchia, Yevgeny Lifshitz, Alexander Elia, Vinit Todi, Jody Fronheiser, Alok Vaid
Proceedings Volume 10145, 101451H (2017) https://doi.org/10.1117/12.2261430
KEYWORDS: Scatterometry, Overlay metrology, Ellipsometry, Spectroscopic ellipsometry, Process control, Critical dimension metrology, Optical metrology, Mueller matrices, Metrology, Transmission electron microscopy, Semiconducting wafers, Diffractive optical elements, Reactive ion etching, 3D modeling, Optics manufacturing, Chemical elements

Showing 5 of 51 publications
Conference Committee Involvement (13)
Metrology, Inspection, and Process Control XXXIX
23 February 2025 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Showing 5 of 13 Conference Committees
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