Mr. Andrew G. Dinsdale Profile

Andrew G. Dinsdale

Sr. Applications Engineer at RAVE LLC

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Publications (7)

Proceedings Article | 17 October 2008 Paper

Nanomachining photomask repair of complex patterns

Tod Robinson, Andrew Dinsdale, Mike Archuletta, Ron Bozak, Roy White

Proceedings Volume 7122, 71221I (2008) https://doi.org/10.1117/12.801297

KEYWORDS: Photomasks, Optical proximity correction, Atomic force microscopy, Extreme ultraviolet, Cryogenics, Scanning electron microscopy, Lithography, Nanotechnology, Metrology, Autoregressive models

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Proceedings Article | 17 October 2008 Paper

Analysis of process margin in EUV mask repair with nano-machining

Su-Young Lee, Geun-Bae Kim, Hong-Seok Sim, Sang-Hyeon Lee, Hwa-Sung Kim, Jung-Hwan Lee, Hwan-Seok Seo, Hak-Seung Han, Seong-Sue Kim, Seong-Yong Moon, Sang-Gyun Woo, Ron Bozak, Andrew Dinsdale, Tod Robinson, David Lee, HanKu Cho

Proceedings Volume 7122, 71222I (2008) https://doi.org/10.1117/12.801415

KEYWORDS: Photomasks, Extreme ultraviolet, Error analysis, Extreme ultraviolet lithography, Scanning electron microscopy, Semiconducting wafers, Diffractive optical elements, Image processing, Critical dimension metrology, Factor analysis

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Proceedings Article | 19 May 2008 Paper

Nanomachining processes for 45, 32 nm node mask repair and beyond

Tod Robinson, Andrew Dinsdale, Ron Bozak, Roy White, Michael Archuletta

Proceedings Volume 7028, 70281A (2008) https://doi.org/10.1117/12.793052

KEYWORDS: Particles, Photomasks, Cryogenics, Chromium, Scanning electron microscopy, Atomic force microscopy, Binary data, Image processing, Optical proximity correction, Particle contamination

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Proceedings Article | 30 October 2007 Paper

Advanced mask particle cleaning solutions

Tod Robinson, Andrew Dinsdale, Ron Bozak, Bernie Arruza

Proceedings Volume 6730, 67301Y (2007) https://doi.org/10.1117/12.746748

KEYWORDS: Particles, Photomasks, Cryogenics, Particle contamination, Atomic force microscopy, Scanning electron microscopy, Chromium, Lithography, Inspection, Quartz

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Proceedings Article | 30 October 2007 Paper

Repairing 45 nm node defects through nano-machining

Roy White, Andrew Dinsdale, Tod Robinson, David Brinkley, Jeffrey Csuy, David Lee

Proceedings Volume 6730, 673021 (2007) https://doi.org/10.1117/12.748668

KEYWORDS: Diamond, Atomic force microscopy, Image processing, Quartz, Scanning electron microscopy, Photomasks, Diamond machining, Standards development, Autoregressive models, Chromium

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Proceedings Article | 20 October 2006 Paper

Precise and high-throughput femtopulse laser mask repair of large defects

Roy White, Jeff LeClaire, Tod Robinson, Andrew Dinsdale, Ron Bozak, David Lee

Proceedings Volume 6349, 63494F (2006) https://doi.org/10.1117/12.686361

KEYWORDS: Deep ultraviolet, Laser ablation, Femtosecond phenomena, Chromium, Quartz, Critical dimension metrology, Photomasks, Pulsed laser operation, Microscopes, Image transmission

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As mask complexity has increased and design rules continued to shrink, the manufacturing cost per mask has steadily increased as well. Studies also show that defects are the number one issue for mask yield. Smaller defects are typically addressed through process development, or through photomask repair. The occurrence of large defects often may only be further reduced through use of expensive clean room improvements, like SMIF handling systems. The impact of each large defect therefore increases while the feasibility in their repair decreases as they can span a large number of adjoining densely packed patterns. The presence of sub-resolution features such as scatter bars and the increasing use of embedded phase-shifting masks also complicates the timely repair of such defects. Existing mask repair techniques such as nanomachining, electron beam, or focused ion beam are challenged to produce high yield repairs on such large defects within a reasonable timeframe. Often very complex repairs may in fact take longer than a rewrite of the mask! Deep UV (DUV) femtosecond pulse laser mask repair provides a unique solution to this defect repair need. Methods and results are discussed for the process optimization for the removal of large (5μm) area repair on both Cr and MoSi absorber films on quartz. Additionally, high repair throughput results are shown for unknown contamination removal, and reproduction of ≥1 μm complex unconnected patterns in a single repair run lasting a matter of minutes. Closed-loop CD feedback in-situ with the iterative repair process for such structures can readily result in an edge placement control within ±15 nm. Prior iterative CD closed-loop repairs on specific structures have reliably yielded results within ±10 nm, as confirmed by AIMS CD error, even after aggressive mask wet clean. The nanometer scale dimensional resolution and repeatability of such repairs is shown with the use of sub-pixel resolution automated pattern reconstruction using integrated high-NA DUV microscope imaging.

Proceedings Article | 9 November 2005 Paper

Mask repair for the 65nm technology node

Tod Robinson, Andrew Dinsdale, Ron Bozak, Roy White, David Lee, Ken Roessler

Proceedings Volume 5992, 59924Z (2005) https://doi.org/10.1117/12.634758

KEYWORDS: Photomasks, Chromium, Atomic force microscopy, Statistical analysis, Binary data, Quartz, Feedback control, Control systems, Extreme ultraviolet lithography, Lithography

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Showing 5 of 7 publications

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