Dr. Andrey E. Yakshin Profile

Dr. Andrey E. Yakshin

at MESA+ Institute for Nanotechnology

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 26 October 2017 Open Access

Deformation of multilayers and optical surfaces in soft x-ray adaptive optics (Conference Presentation) (Withdrawal Notice)

Benjamin Wylie-van Eerd, Huiyu Yuan, Evert Houwman, Oleksandr Antonov, Eric Louis, Andrey Yakshin, Guus J. H. Rijnders, Fred Bijkerk

Proceedings Volume 9963, 99630N (2017) https://doi.org/10.1117/12.2239018

KEYWORDS: X-ray optics, Adaptive optics, X-rays, Geometrical optics, Alternate lighting of surfaces

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Proceedings Article | 26 August 2015 Paper

High-reflectance La/B-based multilayer mirror for 6.x-nm wavelength

Dmitry Kuznetsov, Andrey Yakshin, Marko Sturm, Robbert van de Kruijs, Eric Louis, Fred Bijkerk

Proceedings Volume 9588, 958806 (2015) https://doi.org/10.1117/12.2199427

KEYWORDS: Lanthanum, Reflectivity, Interfaces, Local area networks, Mirrors, Nitrogen, Extreme ultraviolet, Optical lithography, X-ray optics, X-rays

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SPIE Journal Paper | 17 March 2014

Diffusion-induced structural changes in La/B-based multilayers for 6.7-nm radiation

Steven Nyabero, Robbert van de Kruijs, Andrey Yakshin, Igor Makhotkin, Jeroen Bosgra, Fred Bijkerk

JM3, Vol. 13, Issue 01, 013014, (March 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.013014

KEYWORDS: Multilayers, Annealing, Reflectivity, Lanthanum, Interfaces, Crystals, Temperature metrology, Local area networks, X-ray diffraction, X-rays

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Proceedings Article | 27 September 2013 Paper

Engineering optical constants for broadband single layer antireflection coatings

S. Huber, R. van de Kruijs, A. Yakshin, E. Zoethout, F. Bijkerk

Proceedings Volume 8848, 884814 (2013) https://doi.org/10.1117/12.2026546

KEYWORDS: Reflectivity, Antireflective coatings, Deep ultraviolet, Thin films, Multilayers, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Optical engineering, Mirrors

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Proceedings Article | 28 September 2011 Paper

Interface diffusion kinetics and lifetime scaling in multilayer Bragg optics

R. W. van de Kruijs, S. Bruijn, A. Yakshin, I. Nedelcu, F. Bijkerk

Proceedings Volume 8139, 81390A (2011) https://doi.org/10.1117/12.893546

KEYWORDS: Interfaces, Multilayers, Diffusion, Annealing, Reflectivity, Molybdenum, Silicon, Temperature metrology, Thermography, Extreme ultraviolet

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Proceedings Article | 18 March 2009 Paper

Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the extreme UV

Tim Tsarfati, Erwin Zoethout, Eric Louis, Robbert van de Kruijs, Andrey Yakshin, Stephan Müllender, Fred Bijkerk

Proceedings Volume 7271, 72713V (2009) https://doi.org/10.1117/12.824434

KEYWORDS: Lanthanum, Multilayers, Reflectivity, Interfaces, Local area networks, EUV optics, Ultraviolet radiation, Optical lithography, Diffusion, Lithography

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SPIE Journal Paper | 1 June 2008

Reflectivity and surface roughness of multilayer-coated substrate recovery layers for EUV lithographic optics

Ileana Nedelcu, Robbert van de Kruijs, Andrey Yakshin, Bernhard von Blanckenhagen, Fred Bijkerk

OE, Vol. 47, Issue 06, 063801, (June 2008) https://doi.org/10.1117/12.10.1117/1.2939403

KEYWORDS: Multilayers, Reflectivity, Surface roughness, Silicon, Atomic force microscopy, Optical coatings, Extreme ultraviolet, EUV optics, X-rays, Scattering

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Proceedings Article | 29 March 2007 Paper

Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition

A. Yakshin, R. van de Kruijs, I. Nedelcu, E. Zoethout, E. Louis, F. Bijkerk, H. Enkisch, S. Müllender

Proceedings Volume 6517, 65170I (2007) https://doi.org/10.1117/12.711796

KEYWORDS: Interfaces, Reflectivity, Particles, Multilayers, Sputter deposition, Silicon, Molybdenum, Diffusion, Deposition processes, Boron

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Proceedings Article | 21 March 2007 Paper

Substrate recovery layers for EUVL optics: effects on multilayer reflectivity and surface roughness

I. Nedelcu, R. van de Kruijs, A. Yakshin, E. Louis, F. Bijkerk, S. Mullender

Proceedings Volume 6517, 651730 (2007) https://doi.org/10.1117/12.712176

KEYWORDS: Multilayers, Reflectivity, Surface roughness, Silicon, Atomic force microscopy, Extreme ultraviolet lithography, Scattering, Zerodur, Semiconducting wafers, Silver

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Proceedings Article | 24 March 2006 Paper

Multilayer optics with spectral purity layers for the EUV wavelength range

E. Louis, R. W .E. van de Kruijs, A. E. Yakshin, S. Alonso van der Westen, F. Bijkerk, M. M. J. W. van Herpen, D. J. W. Klunder, L. Bakker, H. Enkisch, S. Müllender, M. Richter, V. Banine

Proceedings Volume 6151, 615139 (2006) https://doi.org/10.1117/12.675132

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, EUV optics, Optical components, Extreme ultraviolet lithography, Mirrors, Silicon, Optical coatings, Vacuum ultraviolet

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Proceedings Article | 10 September 2005 Paper

Enhanced performance of EUV multilayer coatings

E. Louis, A. Yakshin, E. Zoethout, R. van de Kruijs, I. Nedelcu, S. van der Westen, T. Tsarfati, F. Bijkerk, H. Enkisch, S. Müllender, B. Wolschrijn, B. Mertens

Proceedings Volume 5900, 590002 (2005) https://doi.org/10.1117/12.616902

KEYWORDS: Optical coatings, Multilayers, Reflectivity, Extreme ultraviolet, Astronomy, Extreme ultraviolet lithography, Silver, Astronomical imaging, Molybdenum, Oxidation

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Proceedings Article | 6 May 2005 Paper

Multilayer coatings for the EUVL process development tool

E. Louis, E. Zoethout, R. van de Kruijs, I. Nedelcu, A. Yakshin, S. van der Westen, T. Tsarfati, F. Bijkerk, H. Enkisch, S. Muellender

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.619856

KEYWORDS: Reflectivity, Optical coatings, Multilayers, Extreme ultraviolet lithography, Fiber optic illuminators, Projection systems, Mirrors, Optical components, Semiconducting wafers, Silver

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Proceedings Article | 20 May 2004 Paper

Subatomic accuracy in EUVL multilayer coatings

Erwin Zoethout, P. Suter, R. van de Kruijs, Andrey Yakshin, Eric Louis, Fred Bijkerk, H. Enkisch, Stefan Muellender

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.561319

KEYWORDS: Reflectivity, Multilayers, Mirrors, Extreme ultraviolet lithography, Optical coatings, Silicon, Extreme ultraviolet coatings, Polishing, Silver, Sputter deposition

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Proceedings Article | 16 June 2003 Paper

Stress mitigation in Mo/Si multilayers for EUV lithography

Erwin Zoethout, G. Sipos, R. van de Kruijs, Andrey Yakshin, Eric Louis, Stefan Muellender, Fred Bijkerk

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490138

KEYWORDS: Multilayers, Reflectivity, Molybdenum, Sputter deposition, Extreme ultraviolet lithography, Ions, Silicon, Polishing, Extreme ultraviolet, Lithography

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Proceedings Article | 20 December 2001 Paper

Prevention of MoSi multilayer reflection loss in EUVL tools

Hans Meiling, Bas Mertens, Frank Stietz, Marco Wedowski, Roman Klein, Ralph Kurt, Eric Louis, Andrey Yakshin

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450949

KEYWORDS: Carbon, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Reflectivity, Bioalcohols, Oxygen, Reflection, Silicon, Oxidation

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Proceedings Article | 8 November 2000 Paper

New PTB beamlines for high-accuracy EUV reflectometry at BESSY II

Frank Scholze, Burkhard Beckhoff, G. Brandt, R. Fliegauf, Roman Klein, Bernd Meyer, D. Rost, Detlef Schmitz, M. Veldkamp, J. Weser, Gerhard Ulm, Eric Louis, Andrey Yakshin, Sebastian Oestreich, Fred Bijkerk

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406678

KEYWORDS: Mirrors, Reflectivity, Reflectometry, Extreme ultraviolet, Monochromators, Diodes, Sensors, Electron beams, Optical components, Coating

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Proceedings Article | 8 November 2000 Paper

Multilayer reflectance during exposure to EUV radiation

Sebastian Oestreich, Roman Klein, Frank Scholze, Jeroen Jonkers, Eric Louis, Andrey Yakshin, Peter Goerts, Gerhard Ulm, Markus Haidl, Fred Bijkerk

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406677

KEYWORDS: Mirrors, Reflectivity, Extreme ultraviolet lithography, Ozone, Multilayers, Extreme ultraviolet, Contamination, Carbon, Ultraviolet radiation, Chlorine

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Proceedings Article | 8 November 2000 Paper

Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability

Eric Louis, Andrey Yakshin, Peter Goerts, Sebastian Oestreich, Edward Maas, M. Kessels, Detlef Schmitz, Frank Scholze, Gerhard Ulm, Stefan Muellender, Markus Haidl, Fred Bijkerk

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406676

KEYWORDS: Coating, Reflectivity, Multilayers, Extreme ultraviolet lithography, Mirrors, Projection systems, X-rays, Silicon, Plasma physics, Ion beams

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Proceedings Article | 21 July 2000 Paper

Progress in Mo/Si multilayer coating technology for EUVL optics

Eric Louis, Andrey Yakshin, Peter Goerts, Sebastian Oestreich, R. Stuik, Edward Maas, M. Kessels, Fred Bijkerk, Markus Haidl, Stefan Muellender, Michael Mertin, Detlef Schmitz, Frank Scholze, Gerhard Ulm

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390077

KEYWORDS: Reflectivity, Coating, Multilayers, Extreme ultraviolet lithography, Reflectometry, Mirrors, Interfaces, Extreme ultraviolet, Deposition processes, Silicon

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Showing 5 of 19 publications

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