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- Modeling of semiconductor photolithography manufacturing process for the purpose of Optical Proximity Correction.
- Knowledge semiconductor processing
- Electron-beam Lithography, SEM & AFM Metrology
- Software Product Development
- Process Research and Development
- Knowledge semiconductor processing
- Electron-beam Lithography, SEM & AFM Metrology
- Software Product Development
- Process Research and Development
Extreme ultraviolet mask multilayer material variation impact on horizontal to vertical pattern bias
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