In this paper, we describe the design and modeling of novel long-range hybrid plasmonic waveguides that consist of both plasmonic thin films and nano-scale structures of a high refractive index material (such as silicon), with a material of low refractive index (such as silicon di-oxide) lying in the region between the nano-scale structures and the plasmonic thin film. We have employed complex geometry of silicon nanostructures in the vicinity of a plasmonic thin film. The effective refractive index and the corresponding propagation length obtained for these plasmonic waveguides and hybrid plasmonic waveguides were obtained using a full-vector finite difference eigen mode solver. In our simulations, different structural parameters of the the hybrid plasmonic waveguides were varied, and the effect of these parameters ⎯ on the propagation length and effective mode area ⎯ was analyzed. We describe the design of novel hybrid plasmonic waveguides that have a propagation length greater than 1 mm and also have a low effective mode area. The waveguides being proposed by us can be fabricated with relative ease using the standard lithography processes.
We propose and design long-range hybrid plasmonic waveguides (HPW) consisting of a combination of plasmonic thin film and nano-scale structures of a high refractive index material (such as silicon), with a low refractive index material (such as silica) surrounding the nano-scale structures and the plasmonic thin film. The effective refractive index and the corresponding propagation length obtained for these plasmonic waveguides, obtained using a full-vector finite difference eigen mode (FDE) solver, demonstrates the viability of these hybrid plasmonic waveguides in applications that demands long propagation range with reasonable field confinement. These waveguides not only have high propagation lengths ⎯ even greater than 1 mm for certain geometrical parameters of the plasmonic waveguides ⎯ but can also have tight mode confinement (low effective mode area). Moreover, the proposed hybrid plasmonic waveguides can also be easily fabricated using the conventional nanolithography processes. Moreover, we study the effect of the variation of different waveguide parameters on the propagation length and effective mode area.
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