Dr. Aviv Frommer Profile

Dr. Aviv Frommer

EVP R&D at Lumus Ltd

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Author

Publications (7)

Proceedings Article | 14 March 2023 Presentation

2D reflective waveguide-based near to eye displays for consumer AR glasses

Aviv Frommer

Proceedings Volume 12450, 124500I (2023) https://doi.org/10.1117/12.2667975

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Proceedings Article | 18 March 2022 Presentation

Reflective waveguides near to eye displays for consumer AR glasses

Aviv Frommer

Proceedings Volume 11932, 119321R (2022) https://doi.org/10.1117/12.2632535

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Proceedings Article | 29 March 2021 Presentation

Lumus: Maximus: Large FoV Near to Eye Display for Consumer AR Glasses

Aviv Frommer

Proceedings Volume 11764, 1176403 (2021) https://doi.org/10.1117/12.2597431

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Proceedings Article | 24 March 2006 Paper

Imaging simulations of optimized overlay marks with deep sub-resolution features

Daniel Kandel, Michael Adel, Aviv Frommer, Vladimir Levinski, Alexandra Rapoport, Richard Silver

Proceedings Volume 6152, 61522X (2006) https://doi.org/10.1117/12.656494

KEYWORDS: Overlay metrology, Oxides, Metrology, Silicon, Image analysis, Finite-difference time-domain method, Lithography, Process control, Electromagnetic simulation, Imaging systems

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Proceedings Article | 24 March 2006 Paper

In-field overlay uncertainty contributors: a back end study

Mike Adel, Aviv Frommer, Elyakim Kassel, Pavel Izikson, Philippe Leray, Bernd Schulz, Rolf Seltmann, Jens Busch

Proceedings Volume 6152, 615213 (2006) https://doi.org/10.1117/12.656467

KEYWORDS: Reticles, Overlay metrology, Scanners, Data modeling, Semiconducting wafers, Metrology, Chemical mechanical planarization, Manufacturing, Polishing, Optical alignment

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Proceedings Article | 10 May 2005 Paper

In field overlay uncertainty contributors

Aviv Frommer, Elyakim Kassel, Pavel Izikson, Mike Adel, Philippe Leray, Bernd Schulz

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599397

KEYWORDS: Reticles, Overlay metrology, Semiconducting wafers, Scanners, Dysprosium, Metrology, Data modeling, Personal protective equipment, Lithography, Manufacturing

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Proceedings Article | 10 May 2005 Paper

Overlay mark performance: a simulation study

Aviv Frommer, Joel Seligson

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599059

KEYWORDS: Overlay metrology, Signal processing, Photoresist processing, Semiconducting wafers, Device simulation, Optical design, Computer simulations, MATLAB, Image processing, Performance modeling

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Showing 5 of 7 publications

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