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Byung Cheol Kang
Application Scientist
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Publications (1)
Proceedings Article | 24 March 2016 Paper
Hybrid enabled thin film metrology using XPS and optical
Alok Vaid, Givantha Iddawela, Sridhar Mahendrakar, Michael Lenahan, Mainul Hossain, Padraig Timoney, Abner Bello, Cornel Bozdog, Heath Pois, Wei Ti Lee, Mark Klare, Michael Kwan, Byung Cheol Kang, Paul Isbester, Matthew Sendelbach, Naren Yellai, Prasad Dasari, Tom Larson
Proceedings Volume 9778, 97780M (2016) https://doi.org/10.1117/12.2220299
KEYWORDS: Metrology, Thin films, X-rays, X-ray optics, Semiconducting wafers, Wafer-level optics, Process control, Ellipsometry, Diffractive optical elements, Deposition processes, Optical testing, Dielectrics, Optical properties
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