Dr. Bernd Loechel Profile

Dr. Bernd Loechel

at Micro Resist Technology GmbH

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 20 August 2015 Presentation + Paper

Presentation + Paper

Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing

Emil Agocs, Bernd Bodermann, Sven Burger, Gaoliang Dai, Johannes Endres, Poul-Erik Hansen, Lars Nielson, Morten Madsen, Sebastian Heidenreich, Michael Krumrey, Bernd Loechel, Juergen Probst, Frank Scholze, Victor Soltwisch, Matthias Wurm

Proceedings Volume 9556, 955610 (2015) https://doi.org/10.1117/12.2190409

KEYWORDS: Scatterometry, Silicon, Standards development, Scanning electron microscopy, Atomic force microscopy, Manufacturing, Calibration, Metrology, Critical dimension metrology, X-rays

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Proceedings Article | 15 May 2014 Paper

Paper

Light harvesting quasicrystalline nanophotonic structures for crystalline silicon thin-film solar cells

Jolly Xavier, Jürgen Probst, Philippe Wyss, David Eisenhauer, Franziska Back, Eveline Rudigier-Voigt, Christoph Hülsen, Bernd Löchel, Christiane Becker

Proceedings Volume 9140, 914004 (2014) https://doi.org/10.1117/12.2052796

KEYWORDS: Absorption, Silicon, Crystals, Thin film solar cells, Thin films, Nanophotonics, Silicon films, Nanostructures, Light harvesting, Photovoltaics

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Proceedings Article | 1 May 2014 Paper

Paper

Development of a scatterometry reference standard

Bernd Bodermann, Bernd Loechel, Frank Scholze, Gaoliang Dai, Jan Wernecke, Johannes Endres, Juergen Probst, Max Schoengen, Michael Krumrey, Poul-Erik Hansen, Victor Soltwisch

Proceedings Volume 9132, 91320A (2014) https://doi.org/10.1117/12.2052278

KEYWORDS: Scatterometry, Atomic force microscopy, Standards development, Calibration, Metrology, Scanning electron microscopy, Scatter measurement, Diffraction, Diffraction gratings, Silicon

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Proceedings Article | 25 September 2013 Paper

Paper

Nanophotonic light trapping in polycrystalline silicon thin-film solar cells using periodically nanoimprint-structured glass substrates

Christiane Becker, Jolly Xavier, Veit Preidel, Philippe Wyss, Tobias Sontheimer, Bernd Rech, Jürgen Probst, Christoph Hülsen, Bernd Löchel, Alexei Erko, Sven Burger, Frank Schmidt, Franziska Back, Eveline Rudigier-Voigt

Proceedings Volume 8824, 88240D (2013) https://doi.org/10.1117/12.2023871

KEYWORDS: Silicon, Absorption, Glasses, Crystals, Nanophotonics, Silicon films, Thin film solar cells, Sol-gels, Solids, Solar cells

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Proceedings Article | 24 February 2010 Paper

Paper

Plasmonic-photonic hybrid cavity for tailored light-matter coupling

Michael Barth, Stefan Schietinger, Sabine Fischer, Jan Becker, Nils Nüsse, Thomas Aichele, Bernd Löchel, Carsten Sönnichsen, Oliver Benson

Proceedings Volume 7609, 76090B (2010) https://doi.org/10.1117/12.841726

KEYWORDS: Gold, Plasmonics, Metals, Waveguides, Photonic crystals, Polarization, Dielectrics, Silicon, Nanorods, Nanoantennas

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Proceedings Article | 18 February 2010 Paper

Paper

Hybrid approaches toward single emitter coupling to optical microresonators

Michael Barth, Markus Gregor, Rico Henze, Tim Schröder, Nils Nüsse, Bernd Löchel, Oliver Benson

Proceedings Volume 7579, 757918 (2010) https://doi.org/10.1117/12.847166

KEYWORDS: Diamond, Microresonators, Atomic force microscopy, Resonators, Luminescence, Confocal microscopy, Microscopes, Optical properties, Systems modeling, Photonic crystals

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Proceedings Article | 27 May 2009 Paper

Paper

Fabrication and characterization of photonic crystal cavities in the visible range

Nils Nüsse, Michael Barth, Bernd Löchel, Oliver Benson

Proceedings Volume 7366, 73661K (2009) https://doi.org/10.1117/12.820926

KEYWORDS: Photonic crystals, Silicon, Luminescence, Scanning electron microscopy, Reactive ion etching, Particles, Finite-difference time-domain method, Waveguides, Nickel, Atmospheric particles

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Proceedings Article | 16 February 2009 Paper

Paper

Controlled coupling of nanoparticles to photonic crystal cavities

Michael Barth, Johannes Stingl, Nils Nüsse, Bernd Löchel, Oliver Benson

Proceedings Volume 7223, 72230Y (2009) https://doi.org/10.1117/12.808105

KEYWORDS: Photonic crystals, Particles, Nanoparticles, Atomic force microscopy, Diamond, Optical properties, Particle systems, Nanocrystals, Reactive ion etching, Luminescence

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Proceedings Article | 11 September 2007 Paper

Paper

Fabrication and optical characterization of Si3N4 2D-photonic crystals for applications in visible range

J. Kouba, S. Kiss, M. Barth, W. Eberhardt, B. Loechel

Proceedings Volume 6645, 664505 (2007) https://doi.org/10.1117/12.734011

KEYWORDS: Photonic crystals, Silicon, Image processing, Reactive ion etching, Optical filters, Visible radiation, Silicon photonics, Photonic crystal devices, Etching, Crystals

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Proceedings Article | 18 April 2006 Paper

Paper

Wavelength filter for visible wavelengths based on photonic crystal

J. Kouba, W. Eberhardt, B. Loechel

Proceedings Volume 6182, 61820R (2006) https://doi.org/10.1117/12.661989

KEYWORDS: Photonic crystals, Waveguides, Silicon, Finite-difference time-domain method, Linear filtering, Photonic crystal devices, Visible radiation, Etching, Electronic filtering, Signal attenuation

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Proceedings Article | 24 April 2003 Paper

Paper

Cost-effective masks for deep x-ray lithography

Heinz-Ulrich Scheunemann, Bernd Loechel, Linke Jian, Daniel Schondelmaier, Yohannes Desta, Jost Goettert

Proceedings Volume 5116, (2003) https://doi.org/10.1117/12.498986

KEYWORDS: Photomasks, X-rays, X-ray lithography, Carbon, Silicon carbide, Beryllium, Transparency, Silicon, Polishing, Glasses

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Proceedings Article | 15 January 2003 Paper

Paper

SU-8-based deep x-ray lithography/LIGA

Linke Jian, Yohannes Desta, Jost Goettert, Martin Bednarzik, Bernd Loechel, Yoonyoung Jin, Georg Aigeldinger, Varshni Singh, Gisela Ahrens, Gabi Gruetzner, Ralf Ruhmann, Reinhard Degen

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478246

KEYWORDS: X-ray lithography, X-rays, Polymethylmethacrylate, Ultraviolet radiation, Lithography, Microelectromechanical systems, Photoresist processing, Nickel, 3D microstructuring, Electroplating

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Proceedings Article | 15 January 2003 Paper

Paper

Borosilicate-glass-based x-ray masks for LIGA microfabrication

Yohannes Desta, Martin Bednarzik, Michael Bryant, Jost Goettert, Linke Jian, Yoonyoung Jin, Daejong Kim, Sanghoon Lee, Bernd Loechel, Hans-Ulrich Scheunemann, Zhengchun Peng

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478258

KEYWORDS: Photomasks, X-rays, Glasses, Gold, Polymethylmethacrylate, Borosilicate glass, X-ray lithography, Surface roughness, Lithography, Electroplating

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Proceedings Article | 23 September 1996 Paper

Paper

Influence of resist-baking on the pattern quality of thick photoresists

Bernd Loechel, Martina Rothe, Simone Fehlberg, Gabi Gruetzner, Gerhard Bleidiessel

Proceedings Volume 2879, (1996) https://doi.org/10.1117/12.251205

KEYWORDS: Photoresist materials, Ultraviolet radiation, Optical lithography, Photoresist processing, Lithography, Photoresist developing, Electroplating, Standards development, Coating, Gold

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Proceedings Article | 19 September 1995 Paper

Paper

Surface microcomponents fabricated by UV depth lithography and electroplating

Bernd Loechel, Andreas Maciossek

Proceedings Volume 2639, (1995) https://doi.org/10.1117/12.221275

KEYWORDS: Photoresist materials, Ultraviolet radiation, Microsystems, Gold, Lithography, Optical lithography, Electroplating, Photoresist processing, Plating, Coating

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Showing 5 of 15 publications

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