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Bill Kalsbeck
at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 16 September 2022 Paper
High-precision and cost-effective EUV reticle defect registration with integrated grid matching using KLA LMS IPRO and FlashScan
P. Y. Portnichenko, F. Oezdogan, L. Dawahre, O. Lohse, B. Kalsbeck, P. Jain, H. Steigerwald, S. Ismail, F. Laske
Proceedings Volume 12325, 123250E (2022) https://doi.org/10.1117/12.2642100
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Metrology, Reticles, Optical alignment, Particles, Manufacturing, Defect inspection
Proceedings Article | 20 October 2021 Presentation + Paper
High-precision and cost-effective EUV reticle defect registration with integrated grid matching using KLA LMS IPRO and FlashScan
P. Portnichenko, F. Oezdogan, L. Dawahre, O. Lohse, B. Kalsbeck, P. Jain, H. Steigerwald, S. Ismail, F. Laske
Proceedings Volume 11855, 1185504 (2021) https://doi.org/10.1117/12.2600957
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Metrology, Reticles, Optical alignment, Particles, Manufacturing, Defect inspection, Silicon
Proceedings Article | 3 October 2018 Paper
Improving mask yield by implementing an advanced mask blank inspection system
Gregg Inderhees, Bill Kalsbeck, Alexander Tan, Paul Chung, JiUk Hur, Eric Kwon, Min Choo, Wonil Cho, Chan-Uk Jeon, IlYong Jang, In-Yong Kang, JeongHun Seo, Suein Son
Proceedings Volume 10810, 1081017 (2018) https://doi.org/10.1117/12.2511160
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Reticles, Yield improvement, Coating, Optical lithography, Extreme ultraviolet lithography
Proceedings Article | 16 October 2017 Paper
Dark field technology for EUV and optical mask blank inspection
Qiuping Nie, David Aupperle, Alexander Tan, Bill Kalsbeck, Qiang Zhang, Gregg Inderhees
Proceedings Volume 10451, 104511D (2017) https://doi.org/10.1117/12.2281057
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Reticles, Scattering, Light scattering, Particles, EUV optics, Defect detection, Optics manufacturing
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