In micro-area spectroscopic analysis, precise identification of characteristic X-ray peak positions holds paramount importance. Analyzing the energy information of these characteristic X-ray peaks, enables the determination of elements types present in the sample and their relative abundances. However, spectral graphs often present intricate challenges such as overlapping, weak spurious peaks, complicating the peak-finding process significantly. To tackle these hurdles in micro-area X-ray spectroscopy, this paper proposes an adaptive threshold symmetric zero-area peak-finding algorithm. In comparison to traditional methods like the simple comparison method, derivative method, and Gaussian fitting method, the symmetric zero-area peak-finding algorithm demonstrates superior advantages in detecting overlapping, weak, and spurious peaks. Through peak-finding experiments conducted on original spectral data from various samples, and comparing results with the standard characteristic X-ray element tables and other classical algorithms, it’s evident that symmetric zero-area algorithm not only accurately distinguish each individual peak but also effectively distinguishes real peaks from noise-induced false peaks, proving feasibility of the symmetric zero-area peak-finding algorithm in micro-area spectroscopy.
Energy resolution, considered to be one of the most important parameters, reflects the performance of Silicon Drift Detectors (SDDs). A constant area spectral peak reconstruction algorithm is proposed to improve the energy resolution of SDDs in this paper. Without changing the peak position and peak area, the peak width is reduced by spectral peak reconstruction. The results show that the energy resolution of the SDDs is improved by 28.57% using the algorithm. Moreover, with the increase of energy resolution, the peak amplitude increases, which in turn increases the peak-to-back ratio by 18.71%. For sum peaks, it is effective to decompose sum peaks by the least square fitting. The method is applied to fit the curve to solve the relevant parameters and the peak widths are changed to reconstruct the Gaussian peak.
KEYWORDS: Scanning electron microscopy, Metrology, Digital signal processing, Interferometers, Electron microscopes, Image processing, Semiconductors, Image resolution, Raster graphics, Calibration
As an imaging tool of nanometer resolution for microstructure analysis, the scanning electron microscope plays an important role in semiconductor and nanometer structure measurement. In this study, a special scanning electron microscopy imaging and line width measuring method is introduced based on principle of laser interference. We design the double stages including micron resolution stage and nanometer resolution stage. A new imaging mode by raster scanning of precision stage is employed in this metrological scanning electron microscope. The line width of standard sample image is measured precisely by calculating the coordination data that come from the laser interferometer system. This nanostructure measuring method is in line with international standard for the dimension measurement of traceability.
X-ray MicroandNano imaging is developed based on the conventional x–ray tomography, it can not only provide nondestructive testing with higher resolution measurement, but also be used to examine the material or the structure with low atomic number and low density. The source with micro-focal spot size is one of the key components of x-ray MicroandNano imaging. The focused electron beam from SEM bombarding the metal target can generate x-ray with ultra-small size. It is convenient to set up x-ray microscopy based on SEM for laboratory use. This paper describes a new x-ray microscopy using reflection targets based on FEI Quanta600 SEM with tungsten filament. The flat panel detector is placed outside of the vacuum chamber with 300μm thickness Be-window to isolate vacuum from the air. A stage with 3 DOFs is added to adjust the positions of the target, the SEM’s sample stage is used to move sample. And the shape of target is designed as cone with 60° half cone angle to get the maximum x-ray dosage. The attenuation coefficient of Bewindow for x-ray is about 25%. Finally, the line pair card is used to evaluate the resolution and the result shows that the resolution of the system can receive less than 750nm, when the acceleration voltage is 30keV, the beam current is 160nA, the SEM working distance is 5mm and the acquisition time of the detector is 60s.
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