Dr. Bruce A. Tirri Profile

Dr. Bruce A. Tirri

Engineer at ASML Wilton

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Author

Publications (8)

Proceedings Article | 29 August 2008 Paper

Deposition and characterization of challenging DUV coatings

Parag Kelkar, Bruce Tirri, Ron Wilklow, David Peterson

Proceedings Volume 7067, 706708 (2008) https://doi.org/10.1117/12.794752

KEYWORDS: Antireflective coatings, Optical coatings, Deep ultraviolet, Reflection, Polarization, Objectives, Apodization, Thin film coatings, Lens design, Thin films

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Proceedings Article | 26 June 2003 Paper

Status of 157-nm lithography development at IMEC

Kurt Ronse, Peter De Bisschop, Astrid Eliat, Anne-Marie Goethals, Jan Hermans, Rik Jonckheere, Dieter Van Den Heuvel, Frieda Van Roey, Stephan Beckx, Johan Wouters, Jean-Francois de Marneffe, Timothy O'Neil, Bruce Tirri, Harry Sewell

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485513

KEYWORDS: Pellicles, Etching, Lithography, Reticles, Photomasks, Semiconducting wafers, Optical lithography, Silicon carbide, Contamination, Oxides

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Proceedings Article | 26 June 2003 Paper

Optical lithography solutions for sub-65-nm semiconductor devices

Jan Mulkens, James McClay, Bruce Tirri, Martin Brunotte, Birgit Mecking, Hans Jasper

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485382

KEYWORDS: Pellicles, Birefringence, Lithography, Imaging systems, Oxygen, Critical dimension metrology, Overlay metrology, Combined lens-mirror systems, Optical lithography, Semiconducting wafers

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Proceedings Article | 26 June 2003 Paper

157-nm Micrascan VII initial lithography results

Harry Sewell, Bruce Tirri, Timothy O'Neil, Thomas Fahey, Diane McCafferty, Paul Reid, James McClay

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485423

KEYWORDS: Reticles, Pellicles, Semiconducting wafers, Lithography, Silicon, Oxygen, Absorption, Projection systems, Wafer-level optics, Nitrogen

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Proceedings Article | 14 September 2001 Paper

SVG 157-nm lithography technical review

Thomas Fahey, James McClay, Matthew Hansen, Bruce Tirri, Matthew Lipson

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435789

KEYWORDS: Contamination, Lithography, Coating, Oxygen, Silicon, Optical coatings, Reticles, Silica, Optical lithography, 193nm lithography

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Proceedings Article | 5 July 2000 Paper

SVG 157-nm lithography approach

James McClay, Michael DeMarco, Thomas Fahey, Matthew Hansen, Bruce Tirri

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389006

KEYWORDS: Lithography, Contamination, Optical coatings, Optical lithography, Reticles, Autoregressive models, Metrology, Antireflective coatings, Coherence (optics), Performance modeling

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Proceedings Article | 2 November 1993 Paper

Graded period rugates

Thomas Rahmlow, Bruce Tirri

Proceedings Volume 2046, (1993) https://doi.org/10.1117/12.163552

KEYWORDS: Reflectors, Reflection, Refractive index, Classification systems, Superposition, Absorption, Mirrors, Coating, Linear filtering, Optical filters

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Proceedings Article | 2 November 1993 Paper

Gradient index film fabrication using optical control techniques

Bruce Tirri, Jeanne Lazo-Wasem, Thomas Rahmlow

Proceedings Volume 2046, (1993) https://doi.org/10.1117/12.163553

KEYWORDS: Control systems, Raman spectroscopy, Reflectivity, Refractive index, Optical filters, Gradient-index optics, Crystals, Fabrication, Control systems design, Signal detection

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Showing 5 of 8 publications

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