Ms. Carey M. Thiel Profile

Carey M. Thiel

at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 16 June 2003 Paper

Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks

Carey Thiel, Kenneth Racette, Emily Fisch, Mark Lawliss, Louis Kindt, Chester Huang, Robin Ackel, Max Levy

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484988

KEYWORDS: Chromium, Etching, Reflectivity, Oxides, Photomasks, Extreme ultraviolet lithography, Dry etching, Multilayers, Wet etching, Silicon

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Proceedings Article | 16 June 2003 Paper

Reduction of image placement errors in EPL masks

Obert Wood, Phillip Reu, Roxann Engelstad, Edward Lovell, Michael Lercel, Carey Thiel, Mark Lawliss, R. Mackay

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490136

KEYWORDS: Photomasks, Reticles, Silicon, Semiconducting wafers, Mask making, Metrology, Electron beam lithography, Optical alignment, Projection lithography, Lithography

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Proceedings Article | 28 May 2003 Paper

Ultrathin-membrane EPL masks

J. Greschner, T. Bayer, S. Kalt, H. Weiss, Phillip Reu, Roxann Engelstad, Obert Wood, Carey Thiel, Michael Gordon, Rajinder Dhaliwal, Christopher Robinson, Hans Pfeiffer

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515090

KEYWORDS: Photomasks, Silicon, Manufacturing, Lithography, Silicon carbide, Carbon, Scanning electron microscopy, Photomicroscopy, Mechanics, Microelectronics

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Proceedings Article | 27 December 2002 Paper

Image placement distortions in EPL masks

Carey Thiel, Louis Kindt, Mark Lawliss

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467756

KEYWORDS: Silicon, Photomasks, Boron, Line edge roughness, Electron beam lithography, Etching, Semiconducting wafers, Image quality, Scanning electron microscopy, Projection lithography

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Proceedings Article | 16 August 2002 Paper

Mask availability for next-generation lithography

Michael Lercel, Emily Fisch, Kenneth Racette, Mark Lawliss, Carey Williams, Louis Kindt, Chester Huang

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479342

KEYWORDS: Photomasks, Inspection, Lithography, Extreme ultraviolet lithography, X-rays, Etching, Chromium, Image processing, Multilayers, Reflectivity

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Proceedings Article | 1 August 2002 Paper

EPL mask fabrication

Michael Lercel, Carey Williams, Mark Lawliss, Robin Ackel, Louis Kindt, Emily Fisch

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477008

KEYWORDS: Photomasks, Image processing, Mask making, Metals, Optical lithography, Line edge roughness, Lithography, Electron beam lithography, Semiconducting wafers, Data centers

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Proceedings Article | 1 August 2002 Paper

EUVL mask fabrication for the 45-nm node

Emily Fisch, Louis Kindt, Michael Lercel, Kenneth Racette, Carey Williams

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476989

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reflectivity, Chromium, Inspection, Particles, Silica, Silicon, Extreme ultraviolet, Oxides

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Proceedings Article | 1 July 2002 Paper

Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC

Kenneth Racette, Carey Williams, Emily Fisch, Louis Kindt, Mark Lawliss, Robin Ackel, Michael Lercel

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472286

KEYWORDS: Chromium, Extreme ultraviolet lithography, Etching, Photomasks, Inspection, Line edge roughness, Silicon, Metrology, Reflectivity, Quartz

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Proceedings Article | 11 March 2002 Paper

Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks

Kenneth Racette, Carey Williams, Michael Lercel

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458253

KEYWORDS: Chromium, Etching, Extreme ultraviolet lithography, Photomasks, Silicon, Tantalum, Semiconducting wafers, Oxides, Silicon films, Argon

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Proceedings Article | 20 August 2001 Paper

Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks

Christopher Magg, Michael Lercel, Mark Lawliss, Robin Ackel, Neal Caldwell, Louis Kindt, Kenneth Racette, Carey Williams, Phillip Reu

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436664

KEYWORDS: Photomasks, Image processing, Electron beam lithography, Projection lithography, Silicon, Scattering, Etching, Lithography, Finite element methods, Image analysis

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Showing 5 of 10 publications

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