Prof. Carlo Holly Profile

Prof. Carlo Holly

Professor at RWTH Aachen Univ

SPIE Involvement:

Author

Publications (34)

SPIE Journal Paper | 18 December 2024 Open Access

Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: mask and illumination parameter optimization

Bernhard Lüttgenau, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Carlo Holly

JM3, Vol. 23, Issue 04, 043002, (December 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.043002

KEYWORDS: Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Photoresist materials, Simulations, Spatial coherence, Extreme ultraviolet, Phase shifts, Image transmission, Design

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BackgroundCompact extreme ultraviolet (EUV) exposure tools utilizing partially coherent radiation are ideally suited for industrial EUV resist qualification regarding sensitivity, contrast, and resolution. For the broad applicability of the technology, the achievable resolution is crucial and requires thorough investigation.AimThe investigation of limiting factors for the achievable resolution for achromatic Talbot lithography is an important step in creating compact EUV exposure tools for industrial resist qualification and high-resolution patterning, accelerating the research and development of high-resolution EUV photoresists for next-generation microchips and processes.ApproachTo maximize the contrast of the resulting intensity distribution in the wafer plane for high-resolution patterns, both the illumination parameters and the utilized transmission masks are investigated by rigorous coupled-wave analysis simulations. The main influencing factors on the achievable resolution are identified and presented. In addition to the simulative optimization of the phase-shifting masks, the fabrication of the dense periodic nanopatterns becomes increasingly challenging for smaller periods. The mask fabrication process is therefore optimized to create stable and high-resolution periodic mask patterns.ResultsRigorous simulation of the achievable aerial image contrast in the wafer plane demonstrates the influence of partial coherence as well as the geometry and material selection of the mask. For the current mask design, the theoretical resolution is limited to a 14-nm half-pitch (wafer scale). The mask fabrication process is optimized leading to an experimental record resolution of 32.5-nm half-pitch for lines and spaces as well as 28-nm half-pitch for pinhole patterns with the presented demonstrator setup. Metal-based masks with optimized geometry will allow for the fabrication of 6.5-nm half-pitch patterns (wafer scale).ConclusionsAchromatic Talbot lithography can be used in compact EUV exposure tools with a theoretical resolution below 10-nm half-pitch (wafer scale). The main influencing factors on the achievable resolution are the mask material used and the degree of coherence of the utilized radiation.

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Proceedings Article | 21 November 2024 Poster + Paper

Broadband reflective spectrometer for high-resolution spectral characterization of radiation sources

Ismael Gisch, Sophia Schröder, Sven Glabisch, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 13215, 1321515 (2024) https://doi.org/10.1117/12.3034671

KEYWORDS: Spectroscopy, Reflection, Tunable filters, Optical filters, Diffraction gratings, Metrology, Infrared radiation, Diffraction, Calibration, CCD image sensors

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Proceedings Article | 20 June 2024 Presentation + Paper

Enhancing laser materials processing efficiency: dynamic beam shaping and parallelization strategies

N. Grubert, F. Lange, J. Stollenwerk, C. Holly

Proceedings Volume 13005, 1300506 (2024) https://doi.org/10.1117/12.3016608

KEYWORDS: Diffractive optical elements, Galvanometers, Relays, Matrices, Mirrors, Laser scanners, Laser processing, Scanners, Distortion, Head

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Proceedings Article | 18 June 2024 Poster + Paper

Evaluation of action spaces for reinforcement learning in optical design

Cailing Fu, Dominik Onyszkiewicz, Marco Kemmerling, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 13017, 130170X (2024) https://doi.org/10.1117/12.3016630

KEYWORDS: Optical design, Machine learning, Monochromatic aberrations, Design, Education and training, Ray tracing, Surface properties, Optical properties, Lenses

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Proceedings Article | 17 June 2024 Presentation + Paper

Enhancing three-dimensional beam shaping accuracy through cascaded spatial light modulators using diffractive neural networks

Paul Buske, Fynn Janssen, Oskar Hofmann, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 13023, 130230A (2024) https://doi.org/10.1117/12.3023102

KEYWORDS: Spatial light modulators, Beam shaping, Crosstalk, Neural networks, Liquid crystal on silicon, Diffractive optical elements

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Proceedings Article | 15 May 2024 Paper

Optical design concept for xolography: a volumetric 3D-printer

Cailing Fu, Nicole Grubert, Robin Kurth, Yves Garmshausen, Andreas Hoffmann, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12798, 127982Z (2024) https://doi.org/10.1117/12.2692560

KEYWORDS: Optical design, Light sources and illumination, Molecules, Visible radiation, Superposition, Semiconductor lasers, Projection systems, Polymerization, Laser scanners, Inhomogeneities

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Proceedings Article | 15 May 2024 Paper

Iterative algorithm for the generation of phase masks for spatial laser beam shaping in arbitrary optical systems

Oskar Hofmann, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12798, 127981O (2024) https://doi.org/10.1117/12.2692405

KEYWORDS: Spatial light modulators, Simulations, Fourier transforms, Detection and tracking algorithms, Phase shift keying, Optical amplifiers, Beam shaping, Light wave propagation, Electric fields, Phase modulation

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Proceedings Article | 21 November 2023 Poster + Paper

Development of an ultra-compact inline transmission grating spectrograph for extreme ultraviolet wavelengths

Sascha Brose, Serhiy Danylyuk, Bernhard Lüttgenau, Ismael Gisch, Lars Lohmann, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12750, 127500Q (2023) https://doi.org/10.1117/12.2683682

KEYWORDS: Spectrographs, Extreme ultraviolet, Spectral resolution, Photodiodes, Optical filters, Optical design, Design and modelling, Tunable filters, Thin films, Thin film coatings

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Proceedings Article | 5 October 2023 Paper

Investigation of the resolution limit of Talbot lithography with compact EUV exposure tools

Bernhard Lüttgenau, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12802, 1280203 (2023) https://doi.org/10.1117/12.2675605

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Photoresist materials, Nanostructures, Simulations, Phase shifts, Extreme ultraviolet, Signal intensity, Semiconducting wafers

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Proceedings Article | 14 September 2023 Paper

A quantum annealing approach with a problem specific initial state for the combinatorial selection of catalog lenses for the automated optics design

Thomas Bussek, Annika Völl, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12798, 1279832 (2023) https://doi.org/10.1117/12.2692563

KEYWORDS: Lenses, Quantum annealing, Optical design, Annealing, Design and modelling, Quantum systems, Quantum computing, Quantum advantages

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Proceedings Article | 14 September 2023 Paper

Influence of contrast in the target distribution on the positioning tolerance for non-imaging free-form optics

Jacqueline Dahlmanns, Annika Völl, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12798, 127980A (2023) https://doi.org/10.1117/12.2691612

KEYWORDS: Freeform optics, Tolerancing, Optical design, Design and modelling, Computer simulations, Light sources and illumination, Light sources, Ray tracing

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Proceedings Article | 14 September 2023 Paper

Diffractive neural networks built from spatial light modulators for laser beam shaping in the NIR and VIS

Paul Buske, Annika Völl, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12798, 127981Q (2023) https://doi.org/10.1117/12.2692407

KEYWORDS: Beam shaping, Artificial neural networks, Spatial light modulators, Near infrared, Neural networks, Lenses, Optical components

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Proceedings Article | 7 August 2023 Poster + Paper

Design of multi-aperture beam integrators for homogenization and local controllability of irradiance distributions from high power VCSEL systems

Jacqueline Dahlmanns, Thomas Bussek, Annika Völl, Jochen Stollenwerk, Carlo Holly, Günther Derra, Markus Herper, Ralf Conrads, Holger Mönch, Felix Ogiewa

Proceedings Volume 12624, 126240S (2023) https://doi.org/10.1117/12.2680279

KEYWORDS: Vertical cavity surface emitting lasers, Design and modelling, Aspheric lenses, Light sources and illumination, Lens arrays, Homogenization, Switching, Beam divergence, Optical design

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Proceedings Article | 15 March 2023 Presentation + Paper

Fiber-based sensor for combustion chamber monitoring: manufacturing challenge

N. Grubert, M. Prochnau, J. Stollenwerk, C. Holly

Proceedings Volume 12434, 124340O (2023) https://doi.org/10.1117/12.2647501

KEYWORDS: Combustion, Sensors, Optical sensors, Fiber optics sensors, Manufacturing, Spatial resolution, Optical components, Laser damage threshold, Data acquisition

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Proceedings Article | 15 March 2023 Presentation + Paper

Application of machine learning to overcome challenges of generating phase masks for dynamic beam shaping in complex optical systems

Robin Kurth, Oskar Hofmann, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12414, 124140F (2023) https://doi.org/10.1117/12.2646223

KEYWORDS: Artificial neural networks, Beam shaping, Data processing, Visualization, Machine learning, Overfitting, Neurons, Liquid crystal on silicon, Diffractive optical elements

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Proceedings Article | 15 March 2023 Presentation + Paper

Application-adapted beam shaping with cutting-edge optical elements in laser materials processing

A. Völl, P. Buske, J. Stollenwerk, C. Holly

Proceedings Volume 12414, 124140H (2023) https://doi.org/10.1117/12.2664765

KEYWORDS: Beam shaping, Optical components, Temperature distribution, Freeform optics, Vertical cavity surface emitting lasers, Laser processing, Algorithm development, Design and modelling, Artificial neural networks

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Proceedings Article | 14 March 2023 Presentation + Paper

Evaluation of design concepts for feedback-resistant 9xx-nm high-power laser diodes

Martin Adams, Carlo Holly, Simon Rauch, Martin Traub, Hans-Dieter Hoffmann

Proceedings Volume 12403, 124030B (2023) https://doi.org/10.1117/12.2647171

KEYWORDS: Quantum wells, Semiconductor lasers, Waveguides, Design and modelling, Nonabsorbing mirrors, Resonators, Electro optical modeling, Diodes, High power lasers, Laser resonators

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Proceedings Article | 1 December 2022 Presentation + Paper

Investigation of stochastic roughness effects for nanoscale grating characterization with a stand-alone EUV spectrometer

Sven Glabisch, Sophia Schröder, Sascha Brose, Henning Heiming, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12293, 122930K (2022) https://doi.org/10.1117/12.2641625

KEYWORDS: Line edge roughness, Line width roughness, Reflectivity, Extreme ultraviolet, Diffraction gratings, Diffraction, Spectroscopy, Grazing incidence

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Fast and non-destructive non-imaging metrology of nanostructures is crucial for the development of integrated circuits and for the corresponding in-situ metrology within fabrication processes. Stochastic variations related to the gratings local period (line edge roughness, LER) and line width (line width roughness, LWR) are of special interest due to their key role for the minimal achievable structure size. Non-imaging metrology approaches taking these statistic variations into account are quite limited. For scatterometry, models predict a change of the grating’s diffraction efficiency according to a DebyeWaller factor but only in the non-zeroth diffraction orders. The authors perform simulations of nanoscale gratings that suggest an influence of LER and LWR on the reflectance (zeroth diffraction order efficiency) which motivate an extended study on LER and LWR measured by spectrally resolved EUV reflectometry here described as EUV spectrometry. The authors present reconstruction results of nanoscale gratings measured with a compact spectrometer utilizing extreme ultraviolet (EUV) radiation emitted by a discharged-produced plasma (DPP) EUV source. The use of two sequential spectrographs, one for the reference measurement of the source spectrum, the other one for the measurement of the spectrum after sample interaction, combined within the experimental setup allows to measure the broadband reflectance with 2% relative uncertainty of samples under various grazing incidence angles. The method offers a proven sub-nm reconstruction accuracy for critical grating parameters. Within the presented study, the measured samples are dedicated test samples, fabricated to exhibit well-defined LER and LWR at different grating periods and linewidths. In addition, the samples are also cross-characterized by the Physikalisch-Technische Bundesanstalt (PTB, Berlin). Experimental and simulative results are discussed to derive approaches to include LER and LWR as parameters in the physical model for reconstruction.

Proceedings Article | 1 December 2022 Presentation + Paper

Toward the resolution limit of Talbot lithography with compact EUV exposure tools

Bernhard Lüttgenau, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12292, 1229208 (2022) https://doi.org/10.1117/12.2641693

KEYWORDS: Photomasks, Lithography, Extreme ultraviolet lithography, Phase shifts, Nanostructures, Extreme ultraviolet, Photoresist materials

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Proceedings Article | 3 October 2022 Presentation + Paper

Reinforcement learning for guiding optimization processes in optical design

Cailing Fu, Jochen Stollenwerk, Carlo Holly

Proceedings Volume 12227, 1222709 (2022) https://doi.org/10.1117/12.2632425

KEYWORDS: Optical design, Optimization (mathematics), Machine learning, Objectives, Geometrical optics, Computing systems

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Proceedings Article | 3 October 2022 Paper

Beam shaping for large-area laser structuring in a roll-to-roll process

N. Grubert, O. Hofmann, M. Hesker, J. Stollenwerk, C. Holly

Proceedings Volume 12216, 1221604 (2022) https://doi.org/10.1117/12.2632926

KEYWORDS: Diffractive optical elements, Beam shaping, Axicons, Optical design, Laser ablation

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SPIE Journal Paper | 20 April 2022 Open Access

Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet

Sophia Schröder, Lukas Bahrenberg, Bernhard Lüttgenau, Sven Glabisch, Sascha Brose, Serhiy Danylyuk, Jochen Stollenwerk, Peter Loosen, Carlo Holly

JM3, Vol. 21, Issue 02, 021208, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021208

KEYWORDS: Extreme ultraviolet, Reflectance spectroscopy, Reflectivity, Extreme ultraviolet lithography, Spectroscopy, Reflectometry, Photoresist materials, Imaging spectroscopy, Grazing incidence, Image processing

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Proceedings Article | 4 March 2022 Presentation + Paper

Progress in experimental studies into the beam parameter product of GaAs-based high-power diode lasers

Paul Crump, Mohamed Elattar, Md. Jarez Miah, Michael Ekterai, Matthias Karow, Dominik Martin, Pietro Della Casa, Andre Maaßdorf, Stewart McDougall, Carlo Holly, Simon Rauch, Stefan Gruetzner, Stephan Strohmaier, Andrea Knigge, Günther Tränkle

Proceedings Volume 11983, 1198307 (2022) https://doi.org/10.1117/12.2610277

KEYWORDS: Semiconductor lasers, High power lasers, Temperature metrology, Continuous wave operation, Near field, Optical testing, Near field optics, Thermography

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Proceedings Article | 4 March 2022 Presentation + Paper

Multiphysics modeling of feedback-induced catastrophic optical damage in 9xx-nm high-power laser diodes

Martin Adams, Simon Rauch, Carlo Holly, Martin Traub, Hans-Dieter Hoffmann

Proceedings Volume 11983, 119830E (2022) https://doi.org/10.1117/12.2608103

KEYWORDS: Electro optical modeling, Quantum wells, 3D modeling, Thermal modeling, Absorption, Semiconductor lasers, Reflectivity, Resonators

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Proceedings Article | 13 October 2021 Poster + Presentation + Paper

Design and realization of an in-lab EUV dual beamline for industrial and scientific applications

B. Lüttgenau, S. Brose, S. Danylyuk, J. Stollenwerk, P. Loosen, C. Holly

Proceedings Volume 11854, 1185419 (2021) https://doi.org/10.1117/12.2600935

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Photoresist materials, Electron beam lithography, Nanostructures, Phase shifts

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Applications that require high resolution patterns are numerous, leading to an increasing demand for compact patterning tools and alternative lithographic concepts. For many scientific applications like biosensing or fabrication of metamaterials, or artificial crystals, the achievable resolution and the patterned area of the fabrication process are of main importance. In the field of high-volume manufacturing, there is a need for high-resolution patterning at the industrial exposure wavelength of 13.5 nm. The main industrial application for compact exposure tools is EUV photoresist development and its related process optimization. The overall patterned area is of minor interest. Instead, the focus is placed on the achievable resolution and quality of the intensity distribution used for the patterning tests. The realized EUV dual beamline allows to address both application fields in a single in-lab setup. By operating the source with an argon/xenon (Ar/Xe) gas mixture, a narrowband spectrum with a main wavelength of 10.9 nm is created without the need of spectral filtering. The resulting intensity of up to 2 mW/cm² in wafer plane allows large area patterning with highest throughput of several mm²/min. Single exposure fields of 2 x 2 mm² can be stitched together to achieve an overall patterned area of up to several cm² with minimal stitching borders of ~ 1 μm. By inserting a customized multilayer mirror into the beamline, the emission spectrum of the DPP source (operated with pure Xe gas) is in-band filtered to 13.5 nm, thus allowing qualification of industrial photoresists regarding sensitivity, contrast and resolution. The mask-wafer positioning system for the 13.5 nm beamline is designed for maximum rigidity to minimize relative movements between the mask and wafer that would lower the achievable resolution. Multi-field resolution test masks are created in-house and are exposed in a parallel manner to determine the achievable resist resolution in an efficient manner. Transmission mask designs are optimized by a rigorous simulation model. By tuning the pattern geometry on mask, different patterns like contact holes or nanopillars can be created on the wafer, tailored to the required application.

Proceedings Article | 12 September 2021 Presentation + Paper

Simulation and design of a Fresnelized freeform optic for a head-up display

Jacqueline Dahlmanns, Annika Völl, Rolf Wester, Jochen Stollenwerk, Peter Loosen, Carlo Holly

Proceedings Volume 11874, 118740Q (2021) https://doi.org/10.1117/12.2600221

KEYWORDS: Freeform optics, Ray tracing, Fresnel lenses, Heads up displays, Computer simulations, Optimization (mathematics)

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Proceedings Article | 5 March 2021 Presentation + Paper

Modeling of the impact of current crowding on catastrophic optical damage in 9xx-nm high power laser diodes

Martin Adams, Simon Rauch, Carlo Holly, Martin Traub, Hans-Dieter Hoffmann

Proceedings Volume 11668, 116680C (2021) https://doi.org/10.1117/12.2578092

KEYWORDS: 3D modeling, Thermal modeling, Optical damage, High power lasers, Diodes, Quantum wells, Waveguides, Thermography, Temperature metrology, Semiconductor lasers

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Proceedings Article | 22 February 2017 Paper

kW-class direct diode laser for sheet metal cutting based on commercial pump modules

U. Witte, F. Schneider, C. Holly, A. Di Meo, D. Rubel, F. Boergmann, M. Traub, D. Hoffmann, S. Drovs, T. Brand, A. Unger

Proceedings Volume 10086, 1008608 (2017) https://doi.org/10.1117/12.2252145

KEYWORDS: High power diode lasers, Semiconductor lasers, Laser cutting, Metals, Fiber couplers, Dielectric filters, Dense wavelength division multiplexing, Laser processing, Laser optics, Laser systems engineering, Multiplexing, Optical filters, Electro optics

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Proceedings Article | 18 March 2016 Paper

Monocrystalline CVD-diamond optics for high-power laser applications

C. Holly, M. Traub, D. Hoffmann, C. Widmann, D. Brink, C. Nebel, T. Gotthardt, M. C. Sözbir, C. Wenzel

Proceedings Volume 9741, 974104 (2016) https://doi.org/10.1117/12.2213601

KEYWORDS: Absorption, Dielectrics, Silica, Thermography, Near infrared, Lenses, Spherical lenses, Refractive index

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Proceedings Article | 4 March 2016 Paper

Simultaneous frequency stabilization and high-power dense wavelength division multiplexing (HP-DWDM) using an external cavity based on volume Bragg gratings (VBGs)

Stefan Hengesbach, Sarah Klein, Carlo Holly, Ulrich Witte, Martin Traub, Dieter Hoffmann

Proceedings Volume 9733, 97330K (2016) https://doi.org/10.1117/12.2212550

KEYWORDS: Laser stabilization, Fiber Bragg gratings, Multiplexing, Dense wavelength division multiplexing, Semiconductor lasers, Mirrors, Multiplexers, Diffraction, Dielectric mirrors, Beam quality measurement, Diffraction gratings, Laser stabilization, Collimation, High power lasers, Diodes

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Proceedings Article | 13 March 2015 Paper

Brightness and average power as driver for advancements in diode lasers and their applications

Stefan Hengesbach, Reinhart Poprawe, Dieter Hoffmann, Martin Traub, Thomas Schwarz, Carlo Holly, Florian Eibl, Andreas Weisheit, Sabrina Vogt, Simon Britten, Michael Ungers, Ulrich Thombansen, Christoph Engelmann, Viktor Mamuschkin, Philipp Lott

Proceedings Volume 9348, 93480B (2015) https://doi.org/10.1117/12.2085068

KEYWORDS: Semiconductor lasers, Vertical cavity surface emitting lasers, Laser systems engineering, Laser applications, Laser welding, Heat treatments, Laser processing, Fiber lasers, Metals, Image processing

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Proceedings Article | 7 March 2014 Paper

Automated alignment of fast-axis collimator lenses for high-power diode laser bars

Thomas Westphalen, Stefan Hengesbach, Carlo Holly, Martin Traub, Dieter Hoffmann

Proceedings Volume 8965, 89650V (2014) https://doi.org/10.1117/12.2041245

KEYWORDS: Semiconductor lasers, Lenses, Electroluminescent displays, Optical alignment, Collimators, Algorithm development, High power diode lasers, High power lasers, Laser applications, Optical components

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Proceedings Article | 7 March 2014 Paper

Numerical analysis of external feedback concepts for spectral stabilization of high-power broad-area semiconductor lasers

Carlo Holly, Stefan Hengesbach, Martin Traub, Dieter Hoffmann

Proceedings Volume 8965, 89650K (2014) https://doi.org/10.1117/12.2037053

KEYWORDS: Waveguides, Resonators, Semiconductor lasers, Electroluminescent displays, Collimation, High power lasers, Optical simulations, Diodes, Diffraction, Mirrors

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Proceedings Article | 7 March 2014 Paper

High-power dense wavelength division multiplexing (HP-DWDM) of frequency stabilized 9xx diode laser bars with a channel spacing of 1.5 nm

Stefan Hengesbach, Carlo Holly, Niels Krauch, Ulrich Witte, Thomas Westphalen, Martin Traub, Dieter Hoffmann

Proceedings Volume 8965, 89650C (2014) https://doi.org/10.1117/12.2036974

KEYWORDS: Multiplexing, Semiconductor lasers, Laser stabilization, Multiplexers, High power lasers, Dense wavelength division multiplexing, Temperature metrology, Laser development, Dielectric mirrors, Mirrors

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Showing 5 of 34 publications

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