Dr. Changwoo Lee
at Lam Research Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2019 Presentation + Paper
Proceedings Volume 10963, 109630G (2019) https://doi.org/10.1117/12.2519383
KEYWORDS: Etching, Critical dimension metrology, Semiconducting wafers, Optical lithography, Extreme ultraviolet, Inspection, Data centers, Front end of line, Logic, Plasma etching

Proceedings Article | 17 March 2015 Paper
Changwoo Lee, Bhaskar Nagabhirava, Michael Goss, Peng Wang, Phil Friddle, Stafan Schmitz, Jian Wu, Richard Yang, Yann Mignot, Nouradine Rassoul, Bassem Hamieh, Genevieve Beique, Andre Labonte, Catherine Labelle, John Arnold, John Mucci
Proceedings Volume 9428, 94280A (2015) https://doi.org/10.1117/12.2087133
KEYWORDS: Etching, Line edge roughness, Optical lithography, Extreme ultraviolet, Plasma, Line width roughness, Plasma etching, Extreme ultraviolet lithography, Photomasks, Ions

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