The high-precision gravity measurements of cold atom experiments puts highly demands on the design and qualification of magneto-optical trap. We present a new modular magneto-optical trap for the cooling and manipulation of rubidium atom interferometry based on free space optical bench technology, which has been developed for a portable atomic inertial sensor. The setup consists of an integrated cooling laser injecting module, a free space bench module, an integrated Raman laser injecting module and a reflecting mirror attached to a single tri-axial accelerometer. The traditional magneto-optical trap includes 3 pairs of commercial cooling laser injecting lens, which are hard to assembled together in 3 mutually perpendicular directions and intersected at a common point. This paper introduces a new free space bench method to meet the angle and position requirements of magneto-optical trap. The vertical angle error of each pair of Cooling beams and intersection coincidence distance can be controlled in a small range. And the free space bench module is easy to control the parameters of laser beams, such as power and polarization. Theoretical analysis and experimental results show that the new modular magneto-optical trap is more reliable and robust in comparison with traditional MOT.
The aim of present work is to estimate the impact of gas refractive index shift on the image quality of projection lens caused by the change of environment condition. This work in the paper consists of two parts: a)when temperature rises or reduces, how gas refractive index changes and the wave front error comes up; b)when gas pressure changes. The model objective lens developed for simulation is a US patent lens whose NA <1 and wave front RMS < 5nm in all fields. This paper includes an illustration of the impact of gas refractive index shift on optical system data, wave front, and aberration. According to the analysis, wave front RMS of projection lens will increase about 10nm if the temperature changed by 0.1K or the gas pressure by 100 Pa. Comparing to origin wave front RMS of the patent lens, 5nm, the change caused by gas temperature and pressure can’t be neglected. It proves the necessary of compensating or controlling the optical path change resulted from gas refractive index shift during the lithography projection lens work process.
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