Mr. Chia-Kai Yeh Profile

Chia-Kai Yeh

at Paul Scherrer Institut

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Author

Publications (5)

Proceedings Article | 25 May 2022 Presentation + Paper

EUV resist screening update: progress towards high-NA lithography

T. Allenet, M. Vockenhuber, C.-K. Yeh, J. Santaclara, L. van Lent-Protasova, Y. Ekinci, D. Kazazis

Proceedings Volume 12055, 120550F (2022) https://doi.org/10.1117/12.2614171

KEYWORDS: Extreme ultraviolet lithography, Metrology, Scanning electron microscopy, Extreme ultraviolet, Lithography, Line width roughness, Optical lithography, Image resolution, Scanners, Printing

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Proceedings Article | 21 December 2021 Presentation + Paper

Progress in EUV resist screening by interference lithography for high-NA lithography

T. Allenet, M. Vockenhuber , C-K. Yeh, D. Kazazis, J. G. Santaclara, L. van Lent-Protasova, Y. Ekinci

Proceedings Volume 11854, 118540N (2021) https://doi.org/10.1117/12.2600963

KEYWORDS: Line width roughness, Extreme ultraviolet, Optical lithography, Lithography, Scanning electron microscopy, Metrology, Extreme ultraviolet lithography, Scanners, Photoresist developing, Materials processing

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Proceedings Article | 21 December 2021 Poster + Presentation + Paper

From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography

T. Allenet, T. Mortelmans, M. Vockenhuber , C-K. Yeh, Y. Ekinci

Proceedings Volume 11854, 1185417 (2021) https://doi.org/10.1117/12.2600920

KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Scanning electron microscopy, Diffraction gratings, Semiconducting wafers, Proteins, Photoresist materials, Optical lithography

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Proceedings Article | 29 March 2021 Presentation + Paper

Progress in EUV resist screening towards the deployment of high-NA lithography

T. Allenet, X. Wang, M. Vockenhuber , C.-K. Yeh, I. Mochi, J. Santaclara, L. Van Lent-Protasova, Y. Ekinci

Proceedings Volume 11609, 116090J (2021) https://doi.org/10.1117/12.2583983

KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Line width roughness, Light sources, Laser sintering, High volume manufacturing, Chemically amplified resists

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Proceedings Article | 4 May 2020 Presentation + Paper

Progress in EUV resists status towards high-NA EUV lithography

Xiaolong Wang, Li-Ting Tseng, Timothee Allenet, Iacopo Mochi, Michaela Vockenhuber, Chia-Kai Yeh, Lidia van Lent-Protasova, Jara Garcia Santaclara, Rolf Custers, Yasin Ekinci

Proceedings Volume 11323, 113230C (2020) https://doi.org/10.1117/12.2551886

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning electron microscopy, Fourier transforms, Diffraction gratings, Printing, Lithography, Electroluminescence, Optical lithography

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