Dr. Chien-Ching Wu Profile

Dr. Chien-Ching Wu

Publications (6)

Proceedings Article | 4 November 2020 Presentation + Paper

Study of EUV reticle storage effects through exposure on EBL2 and NXE

Rik Jonckheere, Chien-Ching Wu, Veronique de Rooij-Lohmann, Dorus Elstgeest, Henk Lensen, Philipp Hönicke, Michael Kolbe, Victor Soltwisch, Claudia Zech, Frank Scholze, Remko Aubert, Vineet Nair, Eric Hendrickx

Proceedings Volume 11517, 115170Z (2020) https://doi.org/10.1117/12.2573125

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Ruthenium, Scanners, Contamination, Integrated circuits, Semiconductors, X-rays

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Proceedings Article | 23 March 2020 Paper

Additional real-time diagnostics on the EBL2 EUV exposure facility

Peter van der Walle, Jetske Stortelder, Chien-Ching Wu, Henk Lensen, Norbert Koster

Proceedings Volume 11323, 113231Z (2020) https://doi.org/10.1117/12.2552011

KEYWORDS: Extreme ultraviolet lithography, Imaging systems, Extreme ultraviolet, Diffraction gratings, Thermography, Reflectometry, Reflectivity, Mirrors, Diagnostics, Pellicles

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Proceedings Article | 26 September 2019 Paper

EBL2 an EUV (Extreme Ultra-Violet) lithography beam line irradiation facility

Herman Bekman, Michael Dekker, Rob Ebeling, Jochem Janssen, Norbert Koster, Joop Meijlink, Freek Molkenboer, Kyri Nicolai, Michel van Putten, Corné Rijnsent, Arnold Storm, Jetske Stortelder, Chien-Ching Wu, Rory de Zanger

Proceedings Volume 11147, 1114706 (2019) https://doi.org/10.1117/12.2536531

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Pellicles, Temperature metrology, Mirrors, Contamination, Ruthenium

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Proceedings Article | 27 June 2019 Open Access

Lifetime test on EUV photomask with EBL2

Chien-Ching Wu, Markus Bender, Rik Jonckheere, Frank Scholze, Herman Bekman, Michel van Putten, Rory de Zanger, Rob Ebeling, Jeroen Westerhout, Kyri Nicolai, Jacqueline van Veldhoven, Véronique de Rooij-Lohmann, Olaf Kievit, Alex Deutz

Proceedings Volume 11178, 111780E (2019) https://doi.org/10.1117/12.2537734

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Scanners, Reflectivity, Oxidation, Ruthenium

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Proceedings Article | 26 March 2019 Paper

Compatibility assessment of novel reticle absorber materials for use in EUV lithography systems.

Jetske Stortelder, Arnold Storm, Veronique de Rooij-Lohmann, Chien-Ching Wu, Willem van Schaik

Proceedings Volume 10957, 1095713 (2019) https://doi.org/10.1117/12.2513887

KEYWORDS: Reticles, Extreme ultraviolet lithography, Hydrogen, Plasma, Contamination, Extreme ultraviolet, Chemical analysis, Ruthenium, Ions, Tantalum

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Proceedings Article | 19 March 2018 Paper

EUV mask lifetime testing using EBL2

Chien-Ching Wu, Edwin te Sligte, Herman Bekman, Arnold Storm, Michel van Putten, Maurice P.M. Limpens, Jacqueline van Veldhoven, Alex Deutz

Proceedings Volume 10583, 1058310 (2018) https://doi.org/10.1117/12.2297369

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Pellicles, Scanners, EUV optics, High volume manufacturing

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