Inverse lithography technology (ILT) has been the focus of research for several years due to its ability to produce theoretically optimal mask shapes. However, its widespread adoption has been hindered by the complex computational techniques involved and the challenges associated with writing curvilinear ILT mask shapes. To enhance manufacturability, one approach involves streamlining the curvilinear mask shapes by converting them into simplified, ‘Manhattanized’ rectangular shapes using a mask rule constraint (MRC) compliant ILT method. The aim of this study is to examine the influence of mask fracture sizes on manufacturability and to assess the impact of traditional optical proximity correction (OPC), curvilinear ILT, and Manhattanized ILT on the quality of photographic images. The study focuses on challenging cell structures, and generating pattern shapes using traditional OPC, curvilinear ILT, and Manhattanized ILT with MRC compliance. Fracture sizes were varied from 5nm to 25nm in increments of 5nm. To compare mask manufacturability across different patterns, several factors were evaluated, including data fracturing, writing time, and metrology. Photographic image quality metrics, such as NILS (Normalized Image Log-Slope), MEEF (Mask Error Enhancement Factor), EPE (Edge Placement Error), PV-band (Process Variation Band), and CDOF (Common Depth of Focus) were also assessed. The comprehensive analysis aims to provide a better understanding of the trade-offs between different approaches and guide future improvements in mask manufacturability and image quality.
Mask corner rounding refers to the unintentional rounding deviation of sharp corners or edges during the mask making process, that is caused by the inherent limitations of the e-beam exposure system, such as beam blur, proximity effects, and the resist exposure process. It can have significant consequences on the lithography of chip manufacturing. This article compares the mask corner rounding behavior under different electron beam sizes and presents a novel Optical Proximity Correction (OPC) approach that incorporates mask corner rounding for various dimensional rectangular shapes, named Rounded Corner Aware OPC (RC-OPC). Contrasting with traditional OPC that rely on a single value for simulating mask corner rounding, this innovative OPC approach delivers substantial advantages including increased accuracy, exceptional lithographic performance, and better pattern fidelity, leading to a more dependable and robust process.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.