Dr. Christian Wies Profile

Dr. Christian Wies

at AIXUV GmbH

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 27 May 2009 Paper

The task of EUV reflectometry for HVM of EUV masks: first steps

Azadeh Farahzadi, Christian Wies, Rainer Lebert

Proceedings Volume 7470, 74700E (2009) https://doi.org/10.1117/12.835176

KEYWORDS: Reflectivity, Extreme ultraviolet, Photomasks, Reflectometry, High volume manufacturing, Metrology, Quality measurement, Extreme ultraviolet lithography, Particles, Factor analysis

Read Abstract +

Proceedings Article | 16 April 2008 Paper

Optics characterization with compact EUV spectrophotometer

H. Blaschke, I. Balasa, L. Koch, K. Starke, D. Ristau, C. Wies, R. Lebert, A. Bayer, F. Barkusky, K. Mann

Proceedings Volume 6922, 692228 (2008) https://doi.org/10.1117/12.772859

KEYWORDS: Extreme ultraviolet, Spectrophotometry, EUV optics, Spectroscopy, Reflectivity, Inspection, Process control, Optical lithography, Geometrical optics, Charge-coupled devices

Read Abstract +

Proceedings Article | 3 May 2007 Paper

Status report on EUV source development and EUV source applications in EUVL

Vivek Bakshi, Rainer Lebert, Bernhard Jägle, Christian Wies, Uwe Stamm, Juergen Kleinschmidt, Guido Schriever, Christian Ziener, Marc Corthout, Joseph Pankert, Klaus Bergmann, Willi Neff, André Egbert, Deborah Gustafson

Proceedings Volume 6533, 653315 (2007) https://doi.org/10.1117/12.737183

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Xenon, Plasma, Tin, Electrodes, Photomasks, Scanners, Lithography, Mirrors

Read Abstract +

Proceedings Article | 29 August 2006 Paper

Novel compact spectrophotometer for EUV-optics characterization

K. Starke, H. Blaschke, L. Jensen, S. Nevas, D. Ristau, R. Lebert, C. Wies, A. Bayer, F. Barkusky, K. Mann

Proceedings Volume 6317, 631701 (2006) https://doi.org/10.1117/12.686878

KEYWORDS: Reflectivity, Spectroscopy, Transmittance, Spectrophotometry, CCD cameras, Silicon, Optical components, Spectral resolution, Gold, Calibration

Read Abstract +

Proceedings Article | 16 June 2005 Paper

Progress on EUV-source development, tool integration and applications

Rainer Lebert, Bernhard Jagle, Christian Wies, Uwe Stamm, Juergen Kleinschmidt, Kai Gaebel, Guido Schriever, Joseph Pankert, Klaus Bergmann, Willi Neff, Andre Egbert

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637333

KEYWORDS: Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Lithography, Metrology, Xenon, Photomasks, Tin, Reflectivity, Magnetism

Read Abstract +

Proceedings Article | 16 June 2005 Paper

High speed reflectometer for EUV mask-blanks

Christian Wies, Rainer Lebert, Bernhard Jagle, L. Juschkin, F. Sobel, H. Seitz, Ronny Walter, C. Laubis, F. Scholze, W. Biel, O. Steffens

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637341

KEYWORDS: Mirrors, Reflectivity, Calibration, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Photons, Charge-coupled devices

Read Abstract +

Proceedings Article | 16 June 2005 Paper

Production challenges of making EUV mask blanks

Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Gunter Hess, Konrad Knapp, Christian Wies, Rainer Lebert

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637335

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Metrology, Reflectivity, Dry etching, Inspection, Etching, Process control

Read Abstract +

Proceedings Article | 10 May 2005 Paper

High speed reflectometer for EUV mask-blanks

C. Wies, R. Lebert, B. Jaegle, L. Juschkin, F. Sobel, H. Seitz, R. Walter, C. Laubis, F. Scholze, W. Biel, O. Steffens

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599776

KEYWORDS: Mirrors, Reflectivity, Calibration, Reflectometry, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Metrology, Photons, Charge-coupled devices

Read Abstract +

Proceedings Article | 6 May 2005 Paper

Recent results on EUV mask blank multilayers and absorbers

Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Guenter Hess, Konrad Knapp, Christian Wies, Rainer Lebert

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600538

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Multilayers, Reflectivity, Etching, Dry etching, Metrology, CCD cameras, Inspection

Read Abstract +

Proceedings Article | 20 May 2004 Paper

High-throughput EUV reflectometer for EUV mask blanks

Rainer Lebert, Christian Wies, Larissa Juschkin, Bernhard Jaegle, Manfred Meisen, Lutz Aschke, Frank Sobel, Holger Seitz, Frank Scholze, Gerhard Ulm, Konstantin Walter, Willi Neff, Klaus Bergmann, Wolfgang Biel

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537012

KEYWORDS: Reflectometry, Photomasks, Extreme ultraviolet, Mirrors, Spectrographs, Charge-coupled devices, Metrology, Extreme ultraviolet lithography, Photons, Reflectivity

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Status of EUV-lamp development and demonstration of applications

Rainer Lebert, Christian Wies, Bernhard Jaegle, Larissa Juschkin, Ulrich Bieberle, Manfred Meisen, Willi Neff, Klaus Bergmann, Konstantin Walter, Oliver Rosier, Max Schuermann, Thomas Missalla

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538058

KEYWORDS: Extreme ultraviolet, Lamps, Extreme ultraviolet lithography, Calibration, Mirrors, Silicon, Reflectometry, Metrology, Neon, Zirconium

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Metrology tools for EUV-source characterization and optimization

Thomas Missalla, Max Schuermann, Rainer Lebert, Christian Wies, Larissa Juschkin, Roman Klein, Frank Scholze, Gerhard Ulm, Andre Egbert, Boris Tkachenko, Boris Chichkov

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.556521

KEYWORDS: Calibration, Extreme ultraviolet, Sensors, Diodes, Metrology, Spectrographs, Optical filters, Extreme ultraviolet lithography, Transmittance, Mirrors

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Update on the EUVL mask blank activity at Schott Lithotec

Frank Sobel, Lutz Aschke, Hans Becker, Markus Renno, Frauke Ruggeberg, Steffen Kirchner, Thomas Leutbecher, Nathalie Olschewski, Mario Schiffler, Kurt Walter, Guenter Hess, Ute Buttgereit, Konrad Knapp, Rainer Lebert, Larissa Juschkin, Christian Wies, Bernhard Jagle

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518061

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Coating, Reflectivity, Polishing, Reflectometry, Surface finishing, Metrology

Read Abstract +

Showing 5 of 13 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years