Dr. Christof Klein
COO at IMS Nanofabrication GmbH
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 13 November 2024 Presentation
Elmar Platzgummer, Christoph Spengler, Christof Zillner, Mathias Tomandl, Christof Klein, Hans Loeschner, Peter Fiala
Proceedings Volume 13216, 1321616 (2024) https://doi.org/10.1117/12.3038731
KEYWORDS: Extreme ultraviolet, Semiconductors, Semiconductor manufacturing, Optical lithography, Industry, Extreme ultraviolet lithography, Systems modeling, Optical alignment, Miniaturization, Mask making

Proceedings Article | 10 April 2024 Presentation
Stefan Kuhn, Christof Klein, Hans Loeschner, Elmar Platzgummer
Proceedings Volume PC12956, PC1295606 (2024) https://doi.org/10.1117/12.3012898
KEYWORDS: Extreme ultraviolet, Nanofabrication, Advanced patterning

SPIE Journal Paper | 10 February 2024 Open Access
Mathias Tomandl, Christoph Spengler, Peter Hudek, Christof Klein, Hans Loeschner, Elmar Platzgummer
JM3, Vol. 23, Issue 01, 011205, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011205
KEYWORDS: Extreme ultraviolet, Distortion, Lenses, Nanofabrication, Industry, Magnetism, Industrial applications, Lithography, Extreme ultraviolet lithography, Projection systems

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12751, PC127510R (2023) https://doi.org/10.1117/12.2688204
KEYWORDS: Lithography, Nanofabrication, Extreme ultraviolet, Standards development, Optical lithography

Proceedings Article | 22 November 2023 Presentation
Mathias Tomandl, Christof Klein, Hans Loeschner, Elmar Platzgummer
Proceedings Volume PC12751, PC127510I (2023) https://doi.org/10.1117/12.2688257
KEYWORDS: Vestigial sideband modulation, Optical proximity correction, Industrial applications, Standards development, Reliability, Photomasks, Nanofabrication, Logic, Lithography, Line edge roughness

Showing 5 of 31 publications
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