Dr. Christopher M. Bottoms Profile

Dr. Christopher M. Bottoms

at IBM Research - Albany

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Author

Publications (6)

Proceedings Article | 16 April 2024 Presentation + Paper

Large feature wafer level in-line optical metrology techniques for advanced packaging schemes

Katherine Sieg, Christopher Bottoms, Christopher Waskiewicz, Alejandro Matos Mejia, Junwon Han, Shahid Butt, Daniel Schmidt, Stefan Schoeche, Alexander Hamer, Alex Hubbard

Proceedings Volume 12955, 129551P (2024) https://doi.org/10.1117/12.3012149

KEYWORDS: Semiconducting wafers, Interferometry, Wafer bonding, Metrology

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Proceedings Article | 10 April 2024 Presentation

Controlling patterning uniformity in thick resist lithography

Christopher Bottoms, Alexander Hamer, Alejandro Mejia, Alex Hubbard, Nicholas Latham, Katherine Sieg, Jennifer Fullam, Vinay Pai, Junwon Han, Juan-Manuel Gomez, Christopher Waskiewicz, Shahid Butt

Proceedings Volume PC12956, PC129560E (2024) https://doi.org/10.1117/12.3012541

KEYWORDS: Optical lithography, Lithography, Coating thickness, Semiconducting wafers, Plating, Photoresist processing, Dielectrics, Coating

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SPIE Journal Paper | 30 August 2023

Role of counter-anion chemistry, free volume, and reaction byproducts in chemically amplified resists

Christopher M. Bottoms, Grant E. Bauman, Gila E. Stein, Manolis Doxastakis

JM3, Vol. 22, Issue 03, 034601, (August 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.034601

KEYWORDS: Polymers, Sodium, Diffusion, Chemistry, Polymer thin films, Film thickness, Photoacid generators, Data modeling, Chemically amplified resists, Chemical species

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Proceedings Article | 1 May 2023 Presentation + Paper

Role of counter-anion chemistry, free volume, and reaction byproducts in chemically amplified resists

Christopher Bottoms, Manolis Doxastakis, Gila Stein

Proceedings Volume 12498, 124980M (2023) https://doi.org/10.1117/12.2656952

KEYWORDS: Polymers, Simulations, Diffusion, Polymer thin films, Film thickness, Chemistry, Photoacid generators, Chemical species, Autocorrelation, Lithography, Chemically amplified resists, Resist chemistry, Spectroscopic ellipsometry, Applied physics

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Proceedings Article | 25 May 2022 Presentation + Paper

Enhanced catalyst mobility in chemically amplified resists

Christopher Bottoms, Tanguy Terlier, Gila Stein, Manolis Doxastakis

Proceedings Volume 12055, 1205506 (2022) https://doi.org/10.1117/12.2613355

KEYWORDS: Modeling and simulation, Monte Carlo methods, Resist chemistry, Diffusion, Polymers, Chemically amplified resists, Systems modeling, FT-IR spectroscopy, Spectroscopic ellipsometry, Polymer thin films, Optical lithography, Ions

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Proceedings Article | 22 February 2021 Presentation + Paper

Probing ion diffusion in chemically amplified resists through experiments and atomistic simulations

Christopher Bottoms, Tanguy Terlier, Gila Stein, Manolis Doxastakis

Proceedings Volume 11612, 116120C (2021) https://doi.org/10.1117/12.2581367

KEYWORDS: Photoresist materials, Ions, Diffusion

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Showing 5 of 6 publications

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