Dr. Chrystel Ambard Profile

Dr. Chrystel Ambard

at Commissariat à l'Energie Atomique

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Author

Publications (4)

Proceedings Article | 9 May 2012 Paper

Elaboration by the sol-gel process of fluorescent sensitive coatings for gas chemical sensors

N. Oudot, X. Le Guevel, C. Ambard, F. Pereira, P. Belleville, L. Hairault, K. Vallé, D. Autissier, C. Sanchez

Proceedings Volume 8439, 84392M (2012) https://doi.org/10.1117/12.927088

KEYWORDS: Sol-gels, Silica, Luminescence, Chemical fiber sensors, Explosives, Nanoparticles, Gas sensors, Molecules, Explosives detection, Sensors

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Proceedings Article | 31 December 2009 Paper

Chemical characterizations of optical materials: a tool for high quality components

C. Ambard, O. Rondeau, J. Destribats, P. Cormont, J. Néauport

Proceedings Volume 7504, 75040W (2009) https://doi.org/10.1117/12.836358

KEYWORDS: Etching, Barium, Silica, HF etching, Polishing, Contamination, Chemical analysis, Chemical elements, Doping, Plasma

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Proceedings Article | 31 December 2009 Paper

Diagnostics tools for subsurface damage characterization of ground silica parts

P. Cormont, J. Neauport, N. Darbois, J. Destribats, C. Ambard, O. Rondeau

Proceedings Volume 7504, 75040Y (2009) https://doi.org/10.1117/12.836368

KEYWORDS: Magnetorheological finishing, Silica, Optics manufacturing, Polishing, Surface roughness, Etching, Diamond, Manufacturing, Diagnostics, Laser induced damage

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Proceedings Article | 30 December 2008 Paper

Optimizing fused silica polishing processes for 351nm high-power laser application

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, F. Pilon

Proceedings Volume 7132, 71321I (2008) https://doi.org/10.1117/12.804414

KEYWORDS: Silica, Polishing, High power lasers, Magnetorheological finishing, Diamond, Etching, Laser development, Abrasives, Optical spheres, HF etching

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