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Claudia Zech
at Physikalisch-Technische Bundesanstalt
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Publications (1)
Proceedings Article | 4 November 2020 Presentation + Paper
Study of EUV reticle storage effects through exposure on EBL2 and NXE
Rik Jonckheere, Chien-Ching Wu, Veronique de Rooij-Lohmann, Dorus Elstgeest, Henk Lensen, Philipp Hönicke, Michael Kolbe, Victor Soltwisch, Claudia Zech, Frank Scholze, Remko Aubert, Vineet Nair, Eric Hendrickx
Proceedings Volume 11517, 115170Z (2020) https://doi.org/10.1117/12.2573125
KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Ruthenium, Scanners, Contamination, Integrated circuits, Semiconductors, X-rays
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