CONFERENCE PROCEEDINGS
Advanced Search
Claudio Masia
Regional Technology Support at Applied Materials Europe BV
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 16 April 2010 Paper
Metrology qualification of EUV resists
Claudio Masia, Ram Peltinov, Chanjuan Xing, Stefano Ventola, Liraz Gershtein
Proceedings Volume 7638, 76383D (2010) https://doi.org/10.1117/12.849020
KEYWORDS: Line edge roughness, Extreme ultraviolet, Scanning electron microscopy, Extreme ultraviolet lithography, Metrology, Critical dimension metrology, Edge roughness, Lithography, Semiconducting wafers, Photomasks
Proceedings Article | 25 March 2008 Paper
Novel approach for immersion lithography defectivity control to increase productivity
Ofer Rotlevi, Ingrid Minnaert-Janssen, Jeroen Linders, Frank Duray, Denis Ovchinnikov, Zach Telor, Rich Piech, Robert Schreutelkamp, Erik van Brederode, Ted der Kinderen, Claudio Masia, Noam Hillel, Saar Shabtay, Peter Vanoppen, Ilan Englard, Erez Ravid, Raf Stegen, Amir Wilde
Proceedings Volume 6922, 69223U (2008) https://doi.org/10.1117/12.776085
KEYWORDS: Inspection, Scanning electron microscopy, Semiconducting wafers, Photodynamic therapy, Polarization, Particles, Immersion lithography, Scanners, Deep ultraviolet, Image classification
Proceedings Article | 24 March 2008 Paper
Accurate in-resolution level overlay metrology for multipatterning lithography techniques
Dana Sofer, Claudio Masia, Ofer Adan, Richard Piech, Noam Hillel, Ram Peltinov, Ilan Englard, Liraz Gershtein
Proceedings Volume 6922, 69221D (2008) https://doi.org/10.1117/12.776099
KEYWORDS: Overlay metrology, Critical dimension metrology, Lithography, Metrology, Process control, Scanners, Optical lithography, Double patterning technology, Semiconducting wafers, Monochromatic aberrations
Proceedings Article | 5 April 2007 Paper
Metrology challenges for advanced lithography techniques
Ilan Englard, Richard Piech, Ram Peltinov, Gert-Jan Janssen, Frank Duray, Liraz Gershtein, Peter Vanoppen, Ofer Adan, Jo Finders, Ingrid Minnaert-Janssen, Jeroen Meessen, Claudio Masia
Proceedings Volume 6518, 65181G (2007) https://doi.org/10.1117/12.713455
KEYWORDS: Overlay metrology, Critical dimension metrology, Etching, Lithography, Monte Carlo methods, Scanning electron microscopy, Metrology, Semiconducting wafers, Reticles, Algorithm development
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top