Dr. Craig Rosslee Profile

Dr. Craig Rosslee

at Lam Research Corp

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 2 April 2010 Paper

Micro-bridge defects: characterization and root cause analysis

Gaetano Santoro, Dieter Van den Heuvel, Jennifer Braggin, Craig Rosslee, Philippe Leray, Shaunee Cheng, Christiane Jehoul, Robert Schreutelkamp, Noam Hillel

Proceedings Volume 7638, 763820 (2010) https://doi.org/10.1117/12.846969

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Particles, Extreme ultraviolet lithography, Image processing, Lithography, Immersion lithography, Photomasks, Extreme ultraviolet, Chromium

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Proceedings Article | 31 March 2010 Paper

Simplified "Litho-Cluster-Only" solution for double patterning

H. Tanaka, K. Hoshiko, T. Shimokawa, H. Hoefnagels, D. Keller, S. Wang, O. Tanriseven, R. Maas, J. Mallman, K. Shigemori, C. Rosslee

Proceedings Volume 7639, 76391V (2010) https://doi.org/10.1117/12.848462

KEYWORDS: Double patterning technology, Semiconducting wafers, Optical alignment, Scanning electron microscopy, Sensors, Reticles, Lithography, Signal processing, Optical lithography, Photoresist processing

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Proceedings Article | 30 March 2010 Paper

Further analysis of the effect of point-of-use filtration on microbridging defectivity

J. Braggin, R. Gronheid, S. Cheng, D. Van den Heuvel, S. Bernard, P. Foubert, C. Rosslee

Proceedings Volume 7639, 763917 (2010) https://doi.org/10.1117/12.843663

KEYWORDS: Manufacturing, Particles, Chemistry, Composites, Coating, Semiconducting wafers, Manufacturing equipment, Lithography, Adsorption, Control systems

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Proceedings Article | 11 December 2009 Paper

Litho-freeze-litho-etch (LFLE) enabling dual wafer flow coat/develop process and freeze CD tuning bake for >200wph immersion ArF photolithography double patterning

Charles Pieczulewski, Craig Rosslee

Proceedings Volume 7520, 75201H (2009) https://doi.org/10.1117/12.837221

KEYWORDS: Semiconducting wafers, Double patterning technology, Thin film coatings, Optical lithography, Critical dimension metrology, Temperature metrology, Lithography, Scanners, Photoresist processing, Wafer manufacturing

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Proceedings Article | 1 April 2009 Paper

Analysis of the effect of point-of-use filtration on microbridging defectivity

J. Braggin, R. Gronheid, S. Cheng, D. Van Den Heuvel, S. Bernard, P. Foubert, C. Rosslee

Proceedings Volume 7273, 72730S (2009) https://doi.org/10.1117/12.813471

KEYWORDS: Chemistry, Semiconducting wafers, Inspection, Immersion lithography, Scanning electron microscopy, Manufacturing, Particles, Intelligence systems, Photomasks, Metrology

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Proceedings Article | 24 March 2009 Paper

Track optimization and control for 32nm node double patterning and beyond

David Laidler, Craig Rosslee, Koen D'havé, Philippe Leray, Len Tedeschi

Proceedings Volume 7272, 727236 (2009) https://doi.org/10.1117/12.814849

KEYWORDS: Etching, Semiconducting wafers, Double patterning technology, Calibration, Metrology, Photoresist processing, Scanners, Polarization, Zone plates, Critical dimension metrology

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Proceedings Article | 4 December 2008 Paper

Cluster optimization to improve CD control as an enabler for double patterning

Len Tedeschi, Craig Rosslee, David Laidler, Philippe Leray, Koen D'havé

Proceedings Volume 7140, 714023 (2008) https://doi.org/10.1117/12.805239

KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Double patterning technology, Error analysis, Scanners, Metrology, Polarization, Photoresist processing, Lithographic illumination

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Showing 5 of 7 publications

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