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Dan L. White
Product Marketing Manager at Synopsys Inc
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Publications (3)
Proceedings Article | 30 October 2007 Paper
LRC techniques for improved error detection throughout the process window
Venson Lee, Sheng-Hua Tsai, Jun Zhu, Lantian Wang, Shu-Mei Yang, Dan White
Proceedings Volume 6730, 67303F (2007) https://doi.org/10.1117/12.746439
KEYWORDS: Optical proximity correction, Lithography, Model-based design, Error analysis, Data modeling, Photomasks, Process modeling, Semiconducting wafers, Printing, Computer simulations
Proceedings Article | 5 May 2005 Paper
Building an infrastructure for parametric yield analysis: concept and implementation of a DFM platform
John Gookassian, Bob Pack, Mitch Heins, John Garcia, Hitendra Divecha, Brian Gordon, Dean Frazier, Dan White, Gurgen Lachinyan, Brian Dillon, Christophe Suzor, Anthony Adamov, Kyung-Youl Min, Sergei Bakarian, Rafik Marutyan, Victor Boksha
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600261
KEYWORDS: Design for manufacturing, Manufacturing, Photomasks, Human-machine interfaces, Electronic design automation, Databases, Distortion, Semiconducting wafers, Design for manufacturability, Data conversion
Proceedings Article | 5 May 2005 Paper
A novel design-process optimization technique based on self-consistent electrical performance evaluation
Valery Axelrad, Andrei Shibkov, Gene Hill, Hung-Jen Lin, Cyrus Tabery, Dan White, Victor Boksha, Randy Thilmany
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600283
KEYWORDS: Device simulation, Transistors, Manufacturing, Design for manufacturing, Light sources, Lithography, Optical proximity correction, Field effect transistors, Process modeling, Critical dimension metrology
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