Dr. Donald W. Sweeney
LSST Project Manager at Vera C. Rubin Observatory
SPIE Involvement:
Author | Instructor
Publications (21)

Proceedings Article | 4 August 2010 Paper
Proceedings Volume 7733, 77330D (2010) https://doi.org/10.1117/12.857942
KEYWORDS: Large Synoptic Survey Telescope, Mirrors, Data archive systems, Telescopes, Cameras, Prototyping, Optical filters, Optical instrument design, Sensors, Control systems

Proceedings Article | 4 August 2010 Paper
Proceedings Volume 7738, 77380P (2010) https://doi.org/10.1117/12.857301
KEYWORDS: Large Synoptic Survey Telescope, Cameras, Control systems, Telescopes, Databases, Associative arrays, Observatories, Computing systems, Mirrors, Data centers

Proceedings Article | 23 June 2006 Paper
Proceedings Volume 6267, 626706 (2006) https://doi.org/10.1117/12.668217
KEYWORDS: Large Synoptic Survey Telescope, Cameras, Telescopes, Optical filters, Imaging systems, Mirrors, Galactic astronomy, Optical components, Observatories, Data archive systems

Proceedings Article | 28 September 2004 Paper
Charles Claver, Donald Sweeney, John Tyson, Bryan Althouse, Timothy Axelrod, Kem Cook, Larry Daggert, Jeffrey Kantor, Steven Kahn, Victor Krabbendam, Philip Pinto, Jacques Sebag, C. Stubbs, Sidney Wolff
Proceedings Volume 5489, (2004) https://doi.org/10.1117/12.561728
KEYWORDS: Large Synoptic Survey Telescope, Telescopes, Cameras, Mirrors, Optical instrument design, Imaging systems, Astronomy, Solar system, Optical filters, Stars

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484970
KEYWORDS: Particles, Semiconducting wafers, Photomasks, Ion beams, Coating, Extreme ultraviolet lithography, Optical spheres, Ions, Atmospheric particles, Multilayers

Showing 5 of 21 publications
Conference Committee Involvement (9)
Modeling, Systems Engineering, and Project Management for Astronomy V
1 July 2012 | Amsterdam, Netherlands
Ground-based and Airborne Telescopes IV
1 July 2012 | Amsterdam, Netherlands
Ground-based and Airborne Telescopes III
27 June 2010 | San Diego, California, United States
Modeling, Systems Engineering, and Project Management for Astronomy IV
27 June 2010 | San Diego, California, United States
Modeling, Systems Engineering, and Project Management for Astronomy
26 June 2008 | Marseille, France
Showing 5 of 9 Conference Committees
Course Instructor
SC123: Introduction to Extreme Ultraviolet Lithography
Extreme Ultraviolet Lithography (EUVL) is the next step for optical lithography moving toward shorter wavelengths. EUVL is a leading technology for device fabrication with feature sizes of 70 nm and below, and is being developed in the U.S., Japan and Europe. The implementation of EUV requires new technologies in sources, optics and resists materials, different from those of the more traditional optical techniques. The course introduces EUVL and the status of developments in the US and worldwide. It focuses on practical issues associated with the design and use of an EUVL stepper. The instructors address the details of the materials and optics, discuss the image formation process, the resist properties, mask design and fabrication, and the current design of lithographic tools.
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