Mr. Enrico Bellmann Profile

Enrico Bellmann

at Qoniac GmbH

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 27 April 2023 Presentation + Paper

Quantifying CD-SEM contact hole roughness and shape combined with machine learning-based pattern fidelity scores for process optimization and monitoring

Hyosung Lee, Seonho Lee, Hyungju Rah, Iksun Park, Jaeil Lee, Jaewoong Sohn, Yongchan Kim, Christoph Ehrlich, Philip Groeger, Sven Boese, Enrico Bellmann, Stefan Buhl, Seop Kim, Kang-san Lee

Proceedings Volume 12496, 124961P (2023) https://doi.org/10.1117/12.2657679

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Image processing, Image restoration, Education and training, Contour extraction, Machine learning, Deformation, Finite element methods

Read Abstract +

Proceedings Article | 23 March 2020 Paper

Application of intra-field alignment to reduce wafer-to-wafer variation

Jangsun Kim, Seonho Lee, Hyunjun Ha, Boris Habets, Enrico Bellmann, Holger Bald, Tobias Hoeer, Seop Kim

Proceedings Volume 11327, 113270V (2020) https://doi.org/10.1117/12.2552735

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Neodymium, Computer simulations, Data modeling, Yield improvement, Electronics, Information technology, Standards development

Read Abstract +

Proceedings Article | 28 March 2017 Presentation + Paper

Topography based wafer clustering for wafer level overlay correction

Hongoo Lee, Sangjun Han, Heongsoo Kim, Boris Habets, Enrico Bellmann, Steven Tottewitz, Stefan Buhl, Martin Rößiger, Seop Kim

Proceedings Volume 10145, 101450Q (2017) https://doi.org/10.1117/12.2259858

KEYWORDS: Semiconducting wafers, Overlay metrology, Molybdenum, Optical alignment, Lithography, Etching, Deposition processes, Distortion, Data modeling, Computer simulations

Read Abstract +

Proceedings Article | 8 March 2016 Paper

Excursion detection using leveling data

MinGyu Kim, Jaewuk Ju, Boris Habets, Georg Erley, Enrico Bellmann, Seop Kim

Proceedings Volume 9778, 97783O (2016) https://doi.org/10.1117/12.2230389

KEYWORDS: Semiconducting wafers, Metals, Overlay metrology, Reflectivity, Scanners, High volume manufacturing, Environmental monitoring, Data processing, Databases, Contamination

Read Abstract +

Proceedings Article | 8 March 2016 Paper

In-depth analysis of sampling optimization methods

Honggoo Lee, Sangjun Han, Myoungsoo Kim, Boris Habets, Stefan Buhl, Steffen Guhlemann, Martin Rößiger, Enrico Bellmann, Seop Kim

Proceedings Volume 9778, 97781E (2016) https://doi.org/10.1117/12.2219037

KEYWORDS: Optical alignment, Overlay metrology, Semiconducting wafers, Optimization (mathematics), Data modeling, Image processing, Process control, Lithography, Statistical modeling, High volume manufacturing, Performance modeling, Computer simulations, Semiconductors

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Overlay improvement using Legendre-Zernike model-based overlay corrections and monitoring with interpolated metric

Md Zakir Ullah, Rajanish Javvaji, Alan Lim, Lieu Chia Chuen, Boris Habets, Stefan Buhl, Georg Erley, Steven Tottewitz, Enrico Bellmann

Proceedings Volume 9424, 942420 (2015) https://doi.org/10.1117/12.2085013

KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Performance modeling, Model-based design, Process modeling, Coastal modeling, Zernike polynomials, Process control, Semiconductors

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years