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Erik Ruinemans
at MI-Partners BV
SPIE Involvement:
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Publications (3)
Proceedings Article | 29 August 2022 Presentation + Paper
Development of an aluminium mirror with a novel integrated flexure-based mount for METIS cryogenic environment
Daan Zaalberg, Mirka Lewińska-Maresca, Erik Ruinemans, Niels Tromp, Dennis Dolkens, Tibor Agocs, Jeff Lynn, Ivan Lloro, Menno Schuil, Menno de Haan, Rik ter Horst, Eddy Elswijk
Proceedings Volume 12188, 121881O (2022) https://doi.org/10.1117/12.2629995
KEYWORDS: Mirrors, Optics manufacturing, Polishing, Surface finishing, Aluminum, Mirror mounts, Manufacturing, Cryogenics, Optical mounts, Integrated optics
Proceedings Article | 13 December 2020 Paper
A cryogenic actuator for the image derotator on ELT-METIS
Olivier Corpace, Jean-Christophe Barrière, Ayoub Bounab, Olivier Cloué, Achrène Dyrek, Jean Fontignié, Jean-Christophe Guillard, Stéphane Jury, Mickaël Lacroix, Ivan Lloro, Jeffrey Lynn, Jorge Mendes, Gert Raskin, Yann Reinert, Erik Ruinemans, Niels Tromp
Proceedings Volume 11451, 114511O (2020) https://doi.org/10.1117/12.2560259
KEYWORDS: Cryogenics, Actuators, Feedback control, Mirrors, Performance modeling, Systems modeling, Computer simulations, Device simulation, Position sensors, Spatial resolution
Proceedings Article | 9 July 2015 Paper
Grid-supported EUV pellicles: A theoretical investigation for added value
Florian Dhalluin, Laurens de Winter, Luigi Scaccabarozzi, Jack Van der Sanden, Sven Lentzen, Rob Van Gils, Maurice Bogers, Erik Ruinemans, Derk Brouns, Juan Diego Arias Espinoza, Mária Péter, Daniel Smith, Wim Van der Zande, Hans Vermeulen
Proceedings Volume 9658, 96580J (2015) https://doi.org/10.1117/12.2197454
KEYWORDS: Pellicles, Reticles, Finite element methods, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Resistance, Semiconducting wafers, Protactinium
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