Erik Ruinemans
at MI-Partners BV
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 August 2024 Presentation + Paper
Jean-Christophe Barrière, Olivier Corpace, Olivier Cloué, Jean Fontignié, Pablo Alberto Fuerte Rodriguez, Jan Goris, Jean-Christophe Guillard, Gerd Jakob, Stéphane Jurie, Mickaël Lacroix, Dirk Lesman, Ivan Lloro, Jeffrey Lynn, Mirka Maresca, Jorge Mendes, François Puel, Gert Raskin, Erik Ruinemans, Niels Tromp, Marijn Versteeg, Daan Zaalberg
Proceedings Volume 13100, 1310032 (2024) https://doi.org/10.1117/12.3016641
KEYWORDS: Sensors, Cryogenics, Design, Manufacturing, Cryostats, Tolerancing, Vacuum, Aluminum, Interfaces, Deformation, Cryogenic mechanisms, Stainless steel, Feedback control, Actuators

Proceedings Article | 29 August 2022 Presentation + Paper
Daan Zaalberg, Mirka Lewińska-Maresca, Erik Ruinemans, Niels Tromp, Dennis Dolkens, Tibor Agocs, Jeff Lynn, Ivan Lloro, Menno Schuil, Menno de Haan, Rik ter Horst, Eddy Elswijk
Proceedings Volume 12188, 121881O (2022) https://doi.org/10.1117/12.2629995
KEYWORDS: Mirrors, Optics manufacturing, Polishing, Surface finishing, Aluminum, Mirror mounts, Manufacturing, Cryogenics, Optical mounts, Integrated optics

Proceedings Article | 13 December 2020 Paper
Olivier Corpace, Jean-Christophe Barrière, Ayoub Bounab, Olivier Cloué, Achrène Dyrek, Jean Fontignié, Jean-Christophe Guillard, Stéphane Jury, Mickaël Lacroix, Ivan Lloro, Jeffrey Lynn, Jorge Mendes, Gert Raskin, Yann Reinert, Erik Ruinemans, Niels Tromp
Proceedings Volume 11451, 114511O (2020) https://doi.org/10.1117/12.2560259
KEYWORDS: Cryogenics, Actuators, Feedback control, Mirrors, Performance modeling, Systems modeling, Computer simulations, Device simulation, Position sensors, Spatial resolution

Proceedings Article | 9 July 2015 Paper
Florian Dhalluin, Laurens de Winter, Luigi Scaccabarozzi, Jack Van der Sanden, Sven Lentzen, Rob Van Gils, Maurice Bogers, Erik Ruinemans, Derk Brouns, Juan Diego Arias Espinoza, Mária Péter, Daniel Smith, Wim Van der Zande, Hans Vermeulen
Proceedings Volume 9658, 96580J (2015) https://doi.org/10.1117/12.2197454
KEYWORDS: Pellicles, Reticles, Finite element methods, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Resistance, Semiconducting wafers, Protactinium

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top