Dr. Erwin Zoethout Profile

Dr. Erwin Zoethout

at FOM Institute DIFFER

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 17 April 2014 Paper

Paper

Spectral purity enhancement for the EUV lithography systems by suppressing UV reflection from multilayers

Qiushi Huang, Meint de Boer, Jonathan Barreaux, Daniel Paardekooper, Toine van den Boogaard, Robbert van de Kruijs, Erwin Zoethout, Eric Louis, Fred Bijkerk

Proceedings Volume 9048, 90480G (2014) https://doi.org/10.1117/12.2046415

KEYWORDS: Extreme ultraviolet, Ultraviolet radiation, Reflectivity, Silicon, Diffraction, Multilayers, Reflection, Extreme ultraviolet lithography, Plasma, Imaging systems

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Proceedings Article | 27 September 2013 Paper

Paper

Engineering optical constants for broadband single layer antireflection coatings

S. Huber, R. van de Kruijs, A. Yakshin, E. Zoethout, F. Bijkerk

Proceedings Volume 8848, 884814 (2013) https://doi.org/10.1117/12.2026546

KEYWORDS: Reflectivity, Antireflective coatings, Deep ultraviolet, Thin films, Multilayers, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Optical engineering, Mirrors

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Proceedings Article | 27 September 2013 Paper

Paper

Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

I. Makhotkin, R. van de Kruijs, E. Zoethout, E. Louis, F. Bijkerk

Proceedings Volume 8848, 88480O (2013) https://doi.org/10.1117/12.2024199

KEYWORDS: Reflectivity, Multilayers, Mirrors, Lanthanum, Sputter deposition, Lithography, Extreme ultraviolet, Local area networks, Deposition processes, Extreme ultraviolet lithography

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Proceedings Article | 27 September 2013 Paper

Paper

Suppression of long wavelength reflection from extreme-UV multilayer optics

Q. Huang, A. J. R. van den Boogaard, R. van de Kruijs, E. Zoethout, V. Medvedev, E. Louis, F. Bijkerk

Proceedings Volume 8848, 88480N (2013) https://doi.org/10.1117/12.2023889

KEYWORDS: Ultraviolet radiation, Extreme ultraviolet, Multilayers, Reflectivity, Reflection, Diffraction gratings, Antireflective coatings, Diffraction, Optical filters, Silicon

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SPIE Journal Paper | 19 October 2012 Open Access

Open Access

Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet

Igor Makhotkin, Erwin Zoethout, Eric Louis, Andrei Yakunin, Stephan Müllender, Fred Bijkerk

JM3, Vol. 11, Issue 4, 040501, (October 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.4.040501

KEYWORDS: Reflectivity, Mirrors, Local area networks, Multilayers, Extreme ultraviolet lithography, Boron, Interfaces, Extreme ultraviolet, Lithography, Lanthanum

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Proceedings Article | 23 March 2012 Paper

Paper

Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Igor Makhotkin, Erwin Zoethout, Eric Louis, Andrei Yakunin, Stephan Müllender, Fred Bijkerk

Proceedings Volume 8322, 832213 (2012) https://doi.org/10.1117/12.918036

KEYWORDS: Reflectivity, Mirrors, Multilayers, Boron, Extreme ultraviolet lithography, Interfaces, Lithography, Optical testing, Extreme ultraviolet, Terbium

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Proceedings Article | 23 March 2010 Paper

Paper

High reflectance multilayers for EUVL HVM-projection optics

E. Louis, E. van Hattum, S. Alonso van der Westen, P. Sallé, K. Grootkarzijn, E. Zoethout, F. Bijkerk, G. von Blanckenhagen, S. Müllender

Proceedings Volume 7636, 76362T (2010) https://doi.org/10.1117/12.846566

KEYWORDS: Coating, Reflectivity, Multilayers, Extreme ultraviolet lithography, Projection systems, Optical components, Mirrors, Polishing, Silver, Ion beams

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Proceedings Article | 18 March 2009 Paper

Paper

Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the extreme UV

Tim Tsarfati, Erwin Zoethout, Eric Louis, Robbert van de Kruijs, Andrey Yakshin, Stephan Müllender, Fred Bijkerk

Proceedings Volume 7271, 72713V (2009) https://doi.org/10.1117/12.824434

KEYWORDS: Lanthanum, Multilayers, Reflectivity, Interfaces, Local area networks, EUV optics, Ultraviolet radiation, Optical lithography, Diffusion, Lithography

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Proceedings Article | 26 March 2008 Paper

Paper

Smoothing properties of single and multilayer coatings: a method to smoothen substrates

A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Alonso van der Westen, F. Bijkerk, S. Müllender

Proceedings Volume 6921, 69210R (2008) https://doi.org/10.1117/12.772479

KEYWORDS: Multilayers, Reflectivity, Silicon, Polishing, Spatial frequencies, Extreme ultraviolet, Ions, Optical coatings, Semiconducting wafers, Reflectometry

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Proceedings Article | 29 March 2007 Paper

Paper

Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition

A. Yakshin, R. van de Kruijs, I. Nedelcu, E. Zoethout, E. Louis, F. Bijkerk, H. Enkisch, S. Müllender

Proceedings Volume 6517, 65170I (2007) https://doi.org/10.1117/12.711796

KEYWORDS: Interfaces, Reflectivity, Particles, Multilayers, Sputter deposition, Silicon, Molybdenum, Diffusion, Deposition processes, Boron

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Proceedings Article | 23 March 2006 Paper

Paper

Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB

Christian Laubis, Christian Buchholz, Andreas Fischer, Sven Plöger, Frank Scholz, Heike Wagner, Frank Scholze, Gerhard Ulm, Hartmut Enkisch, Stephan Müllender, Marco Wedowski, Eric Louis, Erwin Zoethout

Proceedings Volume 6151, 61510I (2006) https://doi.org/10.1117/12.656246

KEYWORDS: Mirrors, Sensors, Coating, Extreme ultraviolet, Off axis mirrors, Extreme ultraviolet lithography, Reflectivity, Multilayers, Reflectometry, EUV optics

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CZ SMT AG produced large off-axis EUV mirrors as they are used e.g. in ASML's alpha demo tools, the predecessor for Extreme Ultraviolet Lithography (EUVL) production tools by ASML. The coating development and a large part of the actual coatings were done by the FOM-Institute. The Physikalisch-Technische Bundesanstalt (PTB) operates an EUV reflectometry facility at the electron storage ring BESSY II for at-wavelength metrology of full-size EUVL optics with a weight of up to 50 kg and a diameter of 550 mm. Critical issues for EUVL mirrors are the high reflectivity close to the theoretical limit, the matching of the period to the operating wavelength of the stepper (13.5 nm) and the imaging properties of the EUV optics. The full multilayer stack needs to be controlled laterally to such extend that the initial sub-nanometre surface figure of the substrate is preserved. The so-called added figure error should not exceed 100 pm in order to ensure faultless imaging at 13.5 nm wavelength. Here, we discuss representative results obtained at large off-axis EUV mirrors. We especially discuss the challenges of measurements at higher local angles of incidence according to the optical design and the accuracy needed in sample alignment for measurement of the coating profiles. PTB has shown excellent reproducibility for measurements of the near normal incidence reflectance of flat homogeneous mirrors over several years. For large off-axis EUV mirrors, measurements have to be done at angles significantly off normal, which dramatically increases the influence of angular alignment errors of the sample on the measured peak wavelength. Furthermore, according to the optical design, these optics have gradients of the coating thickness which require exact knowledge of the measurement position in the mirror coordinates. Extensive studies were done to estimate and validate the uncertainties connected to the sample alignment. Our results clearly show that it is possible to meet and verify the tight specifications for the lateral coating profiles of EUV multilayer mirrors. The non-correctable added figure error is significantly better than required and the overall reflectance of the coatings with a special protective capping layer is 65%.

Proceedings Article | 10 September 2005 Paper

Paper

Enhanced performance of EUV multilayer coatings

E. Louis, A. Yakshin, E. Zoethout, R. van de Kruijs, I. Nedelcu, S. van der Westen, T. Tsarfati, F. Bijkerk, H. Enkisch, S. Müllender, B. Wolschrijn, B. Mertens

Proceedings Volume 5900, 590002 (2005) https://doi.org/10.1117/12.616902

KEYWORDS: Optical coatings, Multilayers, Reflectivity, Extreme ultraviolet, Astronomy, Extreme ultraviolet lithography, Silver, Astronomical imaging, Molybdenum, Oxidation

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Proceedings Article | 6 May 2005 Paper

Paper

Multilayer coatings for the EUVL process development tool

E. Louis, E. Zoethout, R. van de Kruijs, I. Nedelcu, A. Yakshin, S. van der Westen, T. Tsarfati, F. Bijkerk, H. Enkisch, S. Muellender

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.619856

KEYWORDS: Reflectivity, Optical coatings, Multilayers, Extreme ultraviolet lithography, Fiber optic illuminators, Projection systems, Mirrors, Optical components, Semiconducting wafers, Silver

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Proceedings Article | 20 May 2004 Paper

Paper

Subatomic accuracy in EUVL multilayer coatings

Erwin Zoethout, P. Suter, R. van de Kruijs, Andrey Yakshin, Eric Louis, Fred Bijkerk, H. Enkisch, Stefan Muellender

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.561319

KEYWORDS: Reflectivity, Multilayers, Mirrors, Extreme ultraviolet lithography, Optical coatings, Silicon, Extreme ultraviolet coatings, Polishing, Silver, Sputter deposition

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Proceedings Article | 16 June 2003 Paper

Paper

Stress mitigation in Mo/Si multilayers for EUV lithography

Erwin Zoethout, G. Sipos, R. van de Kruijs, Andrey Yakshin, Eric Louis, Stefan Muellender, Fred Bijkerk

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490138

KEYWORDS: Multilayers, Reflectivity, Molybdenum, Sputter deposition, Extreme ultraviolet lithography, Ions, Silicon, Polishing, Extreme ultraviolet, Lithography

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Showing 5 of 15 publications

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