Mr. Eunsoo Jeong Profile

Eunsoo Jeong

at Dongbu HiTek Co Ltd

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 24 March 2008 Paper

Impact of assistance feature to pattern profile for isolated feature in sub-65 nm node

Myungsoo Kim, Young-Je Yun, Eunsoo Jeong, Kwangseon Choi, Jeahee Kim, Jaewon Han

Proceedings Volume 6922, 69221K (2008) https://doi.org/10.1117/12.773109

KEYWORDS: SRAF, Line edge roughness, Artificial intelligence, Critical dimension metrology, Resolution enhancement technologies, Photomasks, Semiconducting wafers, Inspection, Wafer-level optics, Metrology

Read Abstract +

Proceedings Article | 7 March 2008 Paper

Double patterning in lithography for 65nm node with oxidation process

Eunsoo Jeong, Jeahee Kim, Kwangsun Choi, Minkon Lee, Doosung Lee, Myungsoo Kim, Chansik Park

Proceedings Volume 6924, 692424 (2008) https://doi.org/10.1117/12.772544

KEYWORDS: Silicon, Oxides, Double patterning technology, Etching, Optical lithography, Photomasks, Lithography, Photoresist processing, Thermal oxidation, Oxidation

Read Abstract +

Proceedings Article | 7 March 2008 Paper

Extension of low k1 lithography processes with KrF for 90nm technology node

Sungho Jun, Eunsoo Jeong, Youngje Yun, Kwangseon Choi, Jeahee Kim, Jaewon Han

Proceedings Volume 6924, 692439 (2008) https://doi.org/10.1117/12.772537

KEYWORDS: Lithography, Critical dimension metrology, Line edge roughness, Etching, Image processing, Resolution enhancement technologies, Photomasks, Optical lithography, Image resolution, Edge roughness

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Optimization of lithography process to improve image deformation of contact hole sub-90 nm technology node

Sungho Jun, Juhyun Kim, Eunsoo Jeong, Youngje Yun, Jaehee Kim, Keeho Kim

Proceedings Volume 6518, 65183T (2007) https://doi.org/10.1117/12.711978

KEYWORDS: Image processing, Photomasks, Lithography, Edge roughness, Etching, Critical dimension metrology, Image analysis, Resistance, Image resolution, Failure analysis

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Resolution enhancement technique using oxidation process with nitride hardmask process

Eunsoo Jeong, Jaehee Kim, Keeho Kim, Daeyoung Kim, Hyunju Lim

Proceedings Volume 6518, 65183V (2007) https://doi.org/10.1117/12.712017

KEYWORDS: Silicon, Oxides, Optical lithography, Etching, Resolution enhancement technologies, Photomasks, Lithography, Image processing, Double patterning technology, Oxidation

Read Abstract +

Proceedings Article | 14 November 2002 Paper

Flexible electrode and its characteristics for microactuators

Youngdae Jung, Haedo Jeong, Eunsoo Jeong, Hansu Park, Namju Jo

Proceedings Volume 4935, (2002) https://doi.org/10.1117/12.469402

KEYWORDS: Electrodes, Polymers, Carbon, Actuators, Polymeric actuators, Composites, Polyurethane, Silver, Manufacturing, Chemical vapor deposition

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years