CONFERENCE PROCEEDINGS
Advanced Search
Dr. Fan Piao
Senior Staff Engineer at KLA Corp
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 15 January 2007 Paper
The mechanism of ionization radiation-induced compaction in fused silica
Fan Piao, William Oldham
Proceedings Volume 6403, 640320 (2007) https://doi.org/10.1117/12.694507
KEYWORDS: Silica, Annealing, Ultraviolet radiation, Ionization, Glasses, Vitreous, Absorption, Solids, X-ray diffraction, Birefringence
Proceedings Article | 2 June 2000 Paper
At-wavelength characterization of DUV-radiation-induced damage in fused silica
Sang Hun Lee, Fan Piao, Patrick Naulleau, Kenneth Goldberg, William Oldham, Jeffrey Bokor
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386529
KEYWORDS: Wavefronts, Silica, Birefringence, Refractive index, Interferometry, Annealing, Deep ultraviolet, Ultraviolet radiation, Lithography, Radiation effects
Proceedings Article | 7 July 1997 Paper
Temperature dependence of UV-induced compaction in fused silica
Fan Piao, Richard Schenker, William Oldham
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276046
KEYWORDS: Silica, Annealing, Resistance, Birefringence
Proceedings Article | 7 July 1997 Paper
Durability of experimental fused silicas to 193-nm induced compaction
Richard Schenker, Fan Piao, William Oldham
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275966
KEYWORDS: Silica
Proceedings Article | 7 June 1996 Paper
Material limitations to 193-nm lithographic system lifetimes
Richard Schenker, Fan Piao, William Oldham
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240935
KEYWORDS: Birefringence, Silica, Refractive index, Lithography, Imaging systems, Polarization, Ultraviolet radiation, Excimer lasers, Absorption, 193nm lithography
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top