Mr. Felix Koch Profile

Felix Koch

Engineer at Carl Zeiss Jena GmbH

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 12 July 2023 Open Access

Enhanced resolution light scattering analyzer for curved gratings – ELSA/CG-S

Matthias Zilk, Tilman Glaser, Felix Koch, Martin Steglich, Thomas Wollweber, Dennis Lehr, Dana Tomuta, Mathijs Arts, Volker Kirschner

Proceedings Volume 12777, 1277717 (2023) https://doi.org/10.1117/12.2689273

KEYWORDS: Equipment, Diffraction gratings, Optical gratings, Cameras, Signal to noise ratio, Relays, Light sources and illumination, Diffraction, Astronomical imaging, Sensors

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 20 June 2021 Presentation + Paper

Semi-analytic modeling of diffraction grating BRDF using scalar Fourier optics

Felix Koch, Matthias Zilk, Tilman Glaser

Proceedings Volume 11783, 1178304 (2021) https://doi.org/10.1117/12.2591771

KEYWORDS: Diffraction gratings, Bidirectional reflectance transmission function, Fourier optics, Manufacturing, Error analysis, Light scattering, Holography, Statistical modeling, Statistical analysis, Spectrometers

Read Abstract +

Proceedings Article | 12 July 2019 Open Access

Tailored dispersive elements for adapted spectrometric sensing

Torsten Diehl, Peter Triebel, Tobias Moeller, Alexandre Gatto, Dennis Lehr, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies, Felix Koch

Proceedings Volume 11180, 111801K (2019) https://doi.org/10.1117/12.2535975

KEYWORDS: Holography, Optical design, Diffraction gratings, Spectrometers, Optics manufacturing, Manufacturing, Wavefronts, Interferometers, Spectroscopy, Photoresist materials

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 21 June 2019 Paper

High-resolution Czerny-Turner scatterometer for BRDF measurements

Felix Koch, Matthias Zilk, Mike Schnabel, Tilman Glaser

Proceedings Volume 11056, 110561C (2019) https://doi.org/10.1117/12.2524832

KEYWORDS: Bidirectional reflectance transmission function, Diffraction gratings, Light scattering, Scattering

Read Abstract +

SPIE Journal Paper | 24 May 2019 Open Access

Reactive ion beam etching of highly dispersive, high-efficiency transmission gratings for the VIS range

Annemarie Finzel, Felix Koch, Gregor Dornberg, Dennis Lehr, Frank Frost, Tilman Glaser

OE, Vol. 58, Issue 09, 092614, (May 2019) https://doi.org/10.1117/12.10.1117/1.OE.58.9.092614

KEYWORDS: Etching, Diffraction gratings, Ions, Diffraction, Ion beams, Reactive ion etching, Refractive index, Photoresist materials, Silica, Oxygen

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 15 June 2018 Paper

Optical gratings with low wavefront aberrations and low straylight for enhanced spectroscopical applications

Torsten Diehl, Peter Triebel, Tobias Moeller, Alexandre Gatto, Dennis Lehr, Alexander Pesch, Lars Erdmann, Matthias Burkhardt, Alexander Kalies, Felix Koch

Proceedings Volume 10692, 106920H (2018) https://doi.org/10.1117/12.2313550

KEYWORDS: Holography, Spectrometers, Optical design, Optics manufacturing, Manufacturing, Optical components, Satellites, Diffraction gratings, Wavefront aberrations, Photoresist materials

Read Abstract +

The sensing performance of spectroscopic systems can be enhanced by improving their optical core-element: the optical grating. in particular for imaging spectrometers - especially Hyper-Spectral Imagers - beside the polarization sensitivity and efficiency the imaging quality of the diffraction grating is an important parameter. Optical elements within the spectrometer are manufactured while aiming on lowest wave front aberrations. Thus, least imaging aberration quality of the grating is required not to limit the overall imaging quality of the instrument. Different types of spectrometers (Offner, Czerny Turner) lead to different requirements for the grating surface figure. Beside wavefront aberrations the straylight of gratings will impact the optical performance of spectrometers too. Both parameters are crucially influenced by the manufacturing processes. During the manufacturing process of the grating substrate, a sequence of polishing steps can be applied in order to minimize the wavefront aberrations and roughness. Chemical assisted polishing in combination with classical techniques lead to least surface roughness. A good practice for the manufacturing of aspheres and freeform substrates is the generation of an initial figure close to the final shape only by a classical process, followed by a careful applied aspherization. The imaging performance (wavefront and straylight) of the grating is also optimized due to the recording setup of the holography - including all employed optics for the wave forming. Holographically manufactured gratings with adapted wave forming functions are used for transmission or reflection gratings on different types of substrates like prisms, convex and concave spherical and aspherical surface shapes, up to free-form elements. Numerous spectrometer setups (e.g. Offner, Rowland circle, Czerny-Turner system layout) work on the optical design principles of reflection gratings. All those manufactured gratings can be coated with adapted coatings to support their reflection or transmission operation. The present approach can be applied to manufacture high quality reflection gratings for the EUV to the IR. In this paper we report our results on designing and manufacturing high quality gratings based on holographic processes in order to enable diffraction limited complex spectrometric setups over certain wavelength ranges. Most beneficial is an optimization of the grating during spectrometer design phase while regarding the manufacturing as well. However, the initial optical design approach will show that gratings can be tailored to the specific requirements of the spectrometer (in order to enhance the imaging quality). The enhancement of the optical performance may lead to a specific wavefront shape after the grating element. this special capability for aberration reduction can be defined to the grating during the holographic process. In general, holography enables to manufacture gratings with a specific and adapted wavefront error compensation functions. Beside the results of low aberration gratings the results on straylight measurements will be presented. Recent results and optimization will be shown.

Proceedings Article | 28 May 2018 Paper

Optimization and tolerancing of highly dispersive multilayer gratings for laser applications

Felix Koch, Dennis Lehr, Tilman Glaser

Proceedings Volume 10694, 1069403 (2018) https://doi.org/10.1117/12.2307365

KEYWORDS: Diffraction gratings, Optical design, Tolerancing, Multilayers, Diffraction, Refractive index, Dielectrics, Optimization (mathematics), Tantalum, Reflection

Read Abstract +

Proceedings Article | 16 October 2017 Paper

Stability requirements for two-beam interference lithography diffraction grating manufacturing

Felix Koch, Dennis Lehr, Tilman Glaser

Proceedings Volume 10448, 104481L (2017) https://doi.org/10.1117/12.2277007

KEYWORDS: Diffraction gratings, Optics manufacturing, Lithography, Manufacturing, Holography, Laser stabilization, Laser optics, Temperature metrology, Humidity, Atmospheric optics

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years