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George L. Mack
at IBM Microelectronics Div
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 7 March 2008 Paper
Monitoring defects at wafer’s edge for improved immersion lithography performance
Chris Robinson, Jeff Bright, Dan Corliss, Mike Guse, Bob Lang, George Mack
Proceedings Volume 6924, 69244O (2008) https://doi.org/10.1117/12.776363
KEYWORDS: Semiconducting wafers, Inspection, Head-mounted displays, Immersion lithography, Silicon, Wafer inspection, Lithography, Scanners, Defect inspection, Metrology
Proceedings Article | 29 March 2006 Paper
A high productivity low defectivity develop process for 193nm lithography
George Mack, Steven Consiglio, Jeffrey Bright, Kenichi Ueda, Tom Winter
Proceedings Volume 6153, 61530T (2006) https://doi.org/10.1117/12.656664
KEYWORDS: Photoresist processing, Critical dimension metrology, Semiconducting wafers, Diffractive optical elements, 193nm lithography, Silicon, Chemical elements, Scanning electron microscopy, Reticles, Image processing
Proceedings Article | 29 March 2006 Paper
Use of direct washing of chemical dispense nozzle for defect control
Michael Linnane, George Mack, Christopher Longstaff, Thomas Winter
Proceedings Volume 6153, 61533D (2006) https://doi.org/10.1117/12.656534
KEYWORDS: Semiconducting wafers, Photoresist materials, Contamination, Fermium, Frequency modulation, Coating, Wafer testing, Manufacturing, Statistical analysis, Industrial chemicals
SPIE Journal Paper | 1 July 2002
Linewidth variation characterization by spatial decomposition
Alfred Wong, Antoinette Molless, Timothy Brunner, Eric Coker, Robert Fair, George Mack, Scott Mansfield
JM3, Vol. 1, Issue 02, (July 2002) https://doi.org/10.1117/12.10.1117/1.1488159
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Spatial analysis, Optical lithography, Error analysis, Process control, Lithography, Resolution enhancement technologies
Proceedings Article | 5 July 2000 Paper
Characterization of linewidth variation
Alfred Wong, Antoinette Molless, Timothy Brunner, Eric Coker, Robert Fair, George Mack, Scott Mansfield
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388994
KEYWORDS: Photomasks, Semiconducting wafers, Spatial analysis, Optical lithography, Critical dimension metrology, Photoresist developing, Photoresist materials, Metrology, Lithography, Lithographic illumination
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