Dr. Gerhard W. B. Schlüter Profile

Dr. Gerhard W. B. Schlüter

Product Manager at KLA MIE GmbH

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Author

Publications (11)

Proceedings Article | 16 June 2005 Paper

Results of a round robin measurement on a new CD mask standard

F. Gans, R. Liebe, J. Richter, Th. Schatz, B. Hauffe, F. Hillmann, S. Dobereiner, H.-J. Bruck, G. Scheuring, B. Brendel, L. Bettin, K.-D. Roth, W. Steinberg, G. Schluter, P. Speckbacher, W. Sedlmeier, T. Scherubl, W. Hassler-Grohne, C. Frase, S. Czerkas, K. Dirscherl, B. Bodermann, W. Mirande, H. Bosse

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637313

KEYWORDS: Calibration, Photomasks, Ultraviolet radiation, Scanning electron microscopy, Standards development, Critical dimension metrology, Deep ultraviolet, Chromium, Microscopy, Opacity

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Proceedings Article | 16 June 2005 Paper

Actual measurement data obtained on new 65nm generation mask metrology tool set

Jochen Bender, Michael Ferber, Klaus-Dieter Roth, Gerhard Schluter, Walter Steinberg, Gerd Scheuring, Frank Hillmann

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637319

KEYWORDS: Scanning electron microscopy, Photomasks, Reticles, Critical dimension metrology, Metrology, Contamination, Optical testing, Image registration, Lithography, Microsystems

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Proceedings Article | 6 December 2004 Paper

Reticle CD-SEM for 65-nm technology node and beyond

Gerhard Schlueter, Takayuki Nakamura, Jun Matsumoto, Masahiro Seyama, John Whittey

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568270

KEYWORDS: Contamination, Photomasks, Scanning electron microscopy, Critical dimension metrology, Opacity, Reticles, Manufacturing, Microsystems, Electron beams, Metrology

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Proceedings Article | 16 August 2002 Paper

Actual performance data obtained on new transmitted light mask metrology system

Klaus-Dieter Roeth, Gerhard Schlueter

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479348

KEYWORDS: Metrology, Photomasks, Edge detection, Image registration, Reticles, Optical resolution, Interferometers, Critical dimension metrology, Lithography, Microsystems

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Proceedings Article | 1 August 2002 Paper

Next-generation mask metrology tool

Gerhard Schlueter, Klaus-Dieter Roeth, Carola Blaesing-Bangert, Michael Ferber

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476920

KEYWORDS: Photomasks, Critical dimension metrology, Metrology, Optical testing, Image registration, Semiconducting wafers, Lithography, Mirrors, Objectives, Resolution enhancement technologies

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Proceedings Article | 11 March 2002 Paper

First performance data obtained on next-generation mask metrology tool

Gerhard Schlueter, Klaus-Dieter Roeth, John Whittey

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458296

KEYWORDS: Metrology, Optical testing, Photomasks, Microsystems, Time metrology, Fiber optics tests, Fiber optics, Wafer-level optics, Tolerancing, Critical dimension metrology

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Proceedings Article | 11 March 2002 Paper

Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs

Gerhard Schlueter, Walter Steinberg, John Whittey

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458314

KEYWORDS: Deep ultraviolet, Critical dimension metrology, Optical resolution, Objectives, Reticles, Optical testing, Ultraviolet radiation, Lens design, Electronics, Microsystems

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Proceedings Article | 5 September 2001 Paper

First performance data obtained on next-generation optical mask metrology tools

Klaus-Dieter Roeth, Carola Blaesing-Bangert, Herger Alt, Gerhard Schlueter

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438331

KEYWORDS: Deep ultraviolet, Metrology, Critical dimension metrology, Photomasks, Edge detection, Imaging systems, Lithographic illumination, Optical resolution, Ultraviolet radiation, Environmental sensing

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Proceedings Article | 9 April 2001 Paper

First results from a new 248-nm CD measurement system for future mask and reticle generation

Gerhard Schlueter, Gerd Scheuring, Juergen Helbing, Sigrid Lehnigk, Hans-Juergen Brueck

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425077

KEYWORDS: Deep ultraviolet, Imaging systems, Critical dimension metrology, Reticles, Optical resolution, Inspection, Ultraviolet radiation, Cameras, Microscopes, Image resolution

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Proceedings Article | 3 February 2000 Paper

Major improvements in mask CD metrology: enhanced performance on attenuated phase-shift masks, corner rounding measurements, and improved measurement automation

Gerhard Schlueter, Gerd Scheuring, Guenther Falk, Hans-Juergen Brueck, Thomas Schaetz, Sigrid Lehnigk

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377103

KEYWORDS: Algorithm development, Photomasks, Critical dimension metrology, Phase shifts, Detection and tracking algorithms, Manufacturing, Standards development, Integrated circuits, Calibration, Interference (communication)

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Proceedings Article | 25 August 1999 Paper

New UV-capable photomask CD metrology tool

Gerhard Schlueter, Hans-Juergen Brueck, Sebastian Birkenmayer, Guenther Falk, Gerd Scheuring, Lars Walden, Sigrid Lehnigk

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360234

KEYWORDS: Critical dimension metrology, Calibration, Scanning electron microscopy, Photomasks, Ultraviolet radiation, Glasses, Metrology, Optical testing, Visible radiation, Microscopes

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Showing 5 of 11 publications

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