Mr. Grozdan Grozev Profile

Grozdan Grozev

at FUJIFILM Electronic Materials Europe NV

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 24 March 2017 Presentation + Paper

Experimental characterization of NTD resist shrinkage

Bernd Küchler, Thomas Mülders, Hironobu Taoka, Weimin Gao, Ulrich Klostermann, Sou Kamimura, Grozdan Grozev, Masahiro Yoshidome, Michihiro Shirakawa, Waikin Li

Proceedings Volume 10147, 101470F (2017) https://doi.org/10.1117/12.2256568

KEYWORDS: Semiconducting wafers, Photoresist processing, Thin films, Computational lithography, Lithography, 3D modeling, Data modeling, Calibration, Polymers, Image processing

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Proceedings Article | 13 March 2012 Paper

Free form source and mask optimization for negative tone resist development for 22nm node contact holes

Tamer Coskun, Huixiong Dai, Vishnu Kamat, Ching-Mei Hsu, Gaetano Santoro, Chris Ngai, Mario Reybrouck, Grozdan Grozev, Hsu-Ting Huang

Proceedings Volume 8326, 83260V (2012) https://doi.org/10.1117/12.918459

KEYWORDS: Photomasks, Source mask optimization, Semiconducting wafers, Image processing, Electroluminescence, Standards development, Nanoimprint lithography, Optical lithography, 3D modeling, Data modeling

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Proceedings Article | 12 June 2003 Paper

Photoresist reflow for 193-nm low-K1 lithography contacts

Patrick Montgomery, Kevin Lucas, Kirk Strozewski, Lena Zavyalova, Grozdan Grozev, Mario Reybrouck, Plamen Tzviatkov, Mireille Maenhoudt

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485186

KEYWORDS: Lithography, Semiconducting wafers, Etching, Optical lithography, Photoresist processing, Photomasks, Cadmium, Binary data, Polymers, 193nm lithography

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Proceedings Article | 24 July 2002 Paper

100-nm generation contact patterning by low temperature 193-nm resist reflow process

Veerle Van Driessche, Kevin Lucas, Frieda Van Roey, Grozdan Grozev, Plamen Tzviatkov

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474204

KEYWORDS: Etching, Photomasks, Semiconducting wafers, Binary data, Photoresist processing, Reticles, Oxides, Electroluminescence, Lithography, Temperature metrology

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Proceedings Article | 26 April 2001 Paper

Low-temperature 193-nm resist reflow process for 100-nm generation contact patterning

Veerle Van Driessche, Kevin Lucas, Frieda Van Roey, Grozdan Grozev, Plamen Tzviatkov

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425231

KEYWORDS: Etching, Oxides, Reticles, Photoresist processing, Photomasks, Semiconducting wafers, Phase shifts, Electroluminescence, Imaging systems, Binary data

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Proceedings Article | 5 July 2000 Paper

Adjustment of bilayer optical properties and the effect on imaging and etching performance

Mark Neisser, John Biafore, Patrick Foster, Gregory Spaziano, Thomas Sarubbi, Veerle Van Driessche, Grozdan Grozev, Plamen Tzviatkov

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389090

KEYWORDS: Etching, Reflectivity, Imaging systems, Oxides, Interfaces, Absorbance, Resistance, Refractive index, Polymers, Silicon

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Proceedings Article | 26 July 1999 Paper

Intrawafer CD control in state-of-the-art lithography

Ivan Pollentier, Christiaan Baert, Thomas Marschner, Kurt Ronse, Grozdan Grozev, Mario Reybrouck

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354406

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Standards development, Lithography, Chemistry, Metrology, Etching, Photoresist developing, Deep ultraviolet, Photoresist processing

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Showing 5 of 7 publications

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