Dr. Guenter Hess Profile

Dr. Guenter Hess

at LIMO GmbH

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 15 May 2007 Paper

Dry etch behavior of different TaN absorber layers for EUVL mask making

Florian Letzkus, Günter Hess, Mathias Irmscher, Konrad Knapp, Markus Renno, Eugen Röhrle, Holger Seitz

Proceedings Volume 6607, 66073D (2007) https://doi.org/10.1117/12.729032

KEYWORDS: Etching, Dry etching, Extreme ultraviolet lithography, Reflectivity, Photomasks, Inspection, Scanning electron microscopy, Mask making, Electron beam lithography, Manufacturing

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Proceedings Article | 20 October 2006 Paper

Process window enhancement for 45-nm node using alterable transmission phase-shifting materials

Hans Becker, Markus Renno, Guenter Hess, Ute Buttgereit, Corinna Koepernik, Lorenz Nedelmann, Mathias Irmscher, Robert Birkner, Axel Zibold, Thomas Scheruebl

Proceedings Volume 6349, 63490J (2006) https://doi.org/10.1117/12.686022

KEYWORDS: Photomasks, Phase shifts, Etching, Silica, Tantalum, Lithography, Optical lithography, Semiconducting wafers, Scanners, Phase shifting

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Proceedings Article | 21 June 2006 Paper

The first full-field EUV masks ready for printing

Uwe Mickan, Rogier Groeneveld, Marcel Demarteau, Jan Hendrik Peters, Uwe Dersch, Günter Hess, Holger Seitz

Proceedings Volume 6281, 628105 (2006) https://doi.org/10.1117/12.692629

KEYWORDS: Photomasks, Extreme ultraviolet, Reticles, Etching, Tolerancing, Image processing, Coating, Printing, Lithography, Reflectivity

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Proceedings Article | 23 March 2006 Paper

NIL template manufacturing using a variable shaped e-beam writer and a new pCAR

Mathias Irmscher, Joerg Butschke, Guenter Hess, Corinna Koepernik, Florian Letzkus, Markus Renno, Holger Sailer, Hubert Schulz, Anatol Schwersenz, Ecron Thompson

Proceedings Volume 6151, 615115 (2006) https://doi.org/10.1117/12.656108

KEYWORDS: Etching, Quartz, Nanoimprint lithography, Photoresist processing, Photomasks, Chromium, Manufacturing, Electron beam lithography, Chemically amplified resists, Beam shaping

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Proceedings Article | 22 March 2006 Paper

EUVL mask blanks: Recent results on substrates, multilayers and the dry-etch process of TaN-absorbers

Holger Seitz, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Torsten Reichardt, Ronny Walter, Helmut Popp, Günter Hess, Florian Letzkus, Jörg Butschke, Mathias Irmscher

Proceedings Volume 6151, 615109 (2006) https://doi.org/10.1117/12.655540

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Multilayers, Dry etching, Polishing, Manufacturing, Reflectivity, Coating

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Proceedings Article | 8 November 2005 Paper

Determination of mask layer stress by placement metrology

Jörg Butschke, Ute Buttgereit, Eric Cotte, Günter Hess, Mathias Irmscher, Holger Seitz

Proceedings Volume 5992, 59923U (2005) https://doi.org/10.1117/12.631526

KEYWORDS: Photomasks, Tantalum, Metrology, Optical lithography, Chromium, Interferometers, Image registration, Quartz, Finite element methods, Lithography

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Proceedings Article | 8 November 2005 Paper

Template manufacturing for nanoimprint lithography using existing infrastructure

Mathias Irmscher, Joerg Butschke, Guenter Hess, Florian Letzkus, Markus Renno, Holger Sailer, Hubert Schulz, Anatol Schwersenz, Ecron Thompson, Boris Vratzov

Proceedings Volume 5992, 59922E (2005) https://doi.org/10.1117/12.629974

KEYWORDS: Etching, Quartz, Manufacturing, Nanoimprint lithography, Photomasks, Photoresist processing, Electron beam lithography, Chromium, Chemically amplified resists, Printing

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Proceedings Article | 4 November 2005 Paper

Antireflection solutions for next generation 193-nm binary and phase-shifting masks

Hans Becker, Markus Renno, Ulrich Hermanns, Holger Seitz, Ute Buttgereit, Konrad Knapp, Günter Hess

Proceedings Volume 5992, 59920I (2005) https://doi.org/10.1117/12.632113

KEYWORDS: Reflection, Antireflective coatings, Photomasks, Binary data, Inspection, Phase shifts, Interfaces, Etching, Lithography, Opacity

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Proceedings Article | 5 October 2005 Paper

Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning

Hans Becker, Markus Renno, Ulrich Hermanns, Holger Seitz, Ute Buttgereit, Konrad Knapp, Günter Hess

Proceedings Volume 5963, 59630J (2005) https://doi.org/10.1117/12.625210

KEYWORDS: Inspection, Etching, Phase shifts, Photomasks, Tantalum, Dry etching, Lithography, Phase shifting, Reflection, Oxides

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Proceedings Article | 28 June 2005 Paper

Novel acid-free cleaning process for mask blanks

Harald Koster, Karsten Branz, Uwe Dietze, Peter Dress, Guenter Hess

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617115

KEYWORDS: Particles, Glasses, Phase shifts, Etching, Photomasks, Silver, Manufacturing, Contamination, Inspection, Oxygen

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Proceedings Article | 28 June 2005 Paper

EUV mask image placement management in writing, registration, and exposure tools

Eric Cotte, Uwe Dersch, Christian Holfeld, Uwe Mickan, Holger Seitz, Thomas Leutbecher, Gunter Hess

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617484

KEYWORDS: Photomasks, Reticles, Optical lithography, Extreme ultraviolet, Photovoltaics, Extreme ultraviolet lithography, Image registration, Tolerancing, Electron beam lithography, Image quality

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Proceedings Article | 16 June 2005 Paper

Production challenges of making EUV mask blanks

Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Gunter Hess, Konrad Knapp, Christian Wies, Rainer Lebert

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637335

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Metrology, Reflectivity, Dry etching, Inspection, Etching, Process control

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Proceedings Article | 6 May 2005 Paper

Recent results on EUV mask blank multilayers and absorbers

Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Guenter Hess, Konrad Knapp, Christian Wies, Rainer Lebert

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600538

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Multilayers, Reflectivity, Etching, Dry etching, Metrology, CCD cameras, Inspection

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Proceedings Article | 6 December 2004 Paper

Absorber stack optimization toward EUV lithography mask blank pilot production

Frank Sobel, Lutz Aschke, Markus Renno, Holger Seitz, Hans Becker, Nathalie Olschewski, Torsten Reichardt, Guenter Hess, Ute Buttgereit, Konrad Knapp, Florian Letzkus, Joerg Butschke, Corinna Koepernik

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568787

KEYWORDS: Coating, Reflectivity, Etching, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Dry etching, Inspection, Manufacturing, Multilayers

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Proceedings Article | 6 December 2004 Paper

New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM

Hans Becker, Pascal Schley, Frank Schmidt, Frank Sobel, Markus Renno, Nathalie Olschewski, Holger Seitz, Ute Buttgereit, Konrad Knapp, Guenter Hess

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570217

KEYWORDS: Inspection, Etching, Tantalum, Phase shifts, Dry etching, Lithography, Oxides, Silica, Reflection, Mask cleaning

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Proceedings Article | 20 August 2004 Paper

Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography

Hans Becker, Frank Schmidt, Frank Sobel, Markus Renno, Ute Buttgereit, Jay Chey, Marie Angelopoulos, Konrad Knapp, Gunter Hess

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557798

KEYWORDS: Particles, Phase shifts, Silica, Lithography, Etching, Photomasks, Tantalum, Surface roughness, Scanning electron microscopy, Deposition processes

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Proceedings Article | 2 June 2004 Paper

Production challenges of making an EUV mask blank

Lutz Aschke, Hans Becker, Falk Friemel, Thomas Leutbecher, Nathalie Olschewski, Markus Renno, Frauke Rueggeberg, Mario Schiffler, Frank Schmidt, Frank Sobel, Kurt Walter, Guenter Hess, Frank Lenzen, Konrad Knapp, Jochen Alkemper, Hrabanus Hack, Klaus Megges, Ina Mitra, Rolf Mueller, Uwe Nolte, Joerg Schumacher, Wolfgang Pannhorst

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568007

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Zerodur, Reflectivity, Polishing, Temperature metrology, Surface finishing, Glasses

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Proceedings Article | 20 May 2004 Paper

Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber

Frank Sobel, Lutz Aschke, Frauke Rueggeberg, Holger Seitz, Nathalie Olschewski, Torsten Reichhardt, Hans Becker, Markus Renno, Steffen Kirchner, Thomas Leutbecher, Guenter Hess, Konrad Knapp

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.533292

KEYWORDS: Multilayers, Photomasks, Extreme ultraviolet lithography, Polishing, Extreme ultraviolet, Surface finishing, Magnetorheological finishing, Surface roughness, Silica, Optical coatings

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Proceedings Article | 17 December 2003 Paper

Update on the EUVL mask blank activity at Schott Lithotec

Frank Sobel, Lutz Aschke, Hans Becker, Markus Renno, Frauke Ruggeberg, Steffen Kirchner, Thomas Leutbecher, Nathalie Olschewski, Mario Schiffler, Kurt Walter, Guenter Hess, Ute Buttgereit, Konrad Knapp, Rainer Lebert, Larissa Juschkin, Christian Wies, Bernhard Jagle

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518061

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Coating, Reflectivity, Polishing, Reflectometry, Surface finishing, Metrology

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Proceedings Article | 17 December 2003 Paper

Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography

Hans Becker, Jay Chey, Frank Sobel, Frank Schmidt, Markus Renno, Ute Buttgereit, Marie Angelopoulos, Guenter Hess, Konrad Knapp

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518339

KEYWORDS: Phase shifts, Particles, Tantalum, Phase shifting, Lithography, Photomasks, Chemical lasers, Laser stabilization, Vacuum ultraviolet, Ion beams

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Proceedings Article | 27 December 2002 Paper

High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition

Hans Becker, Frank Sobel, Lutz Aschke, Markus Renno, Juergen Krieger, Ute Buttgereit, Guenter Hess, Frank Lenzen, Konrad Knapp, Sergey Yulin, Torsten Feigl, Thomas Kuhlmann, Norbert Kaiser

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467578

KEYWORDS: Reflectivity, Multilayers, Particles, Extreme ultraviolet, Ion beams, Transmission electron microscopy, Silicon, Sputter deposition, Interfaces, Reflectometry

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Showing 5 of 21 publications

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